Monday 4 March 2019 14:30 - 15:15
On March 4, PDEng candidate in the Industrial Focus Group XUV Optics Arash Edrisi will defend his thesis on EUV reticle materials. Arash has been exploring new materials combinations that would accommodate the need for high absorption of EUV radiation. These will be needed to achieve adequate optical contrast while at limited thickness in order to overcome shadowing effects in the EUV imaging scheme. Doping of materials and layered configurations were successfully applied to overcome materials artefacts such as crystallization.
