On Thursday 22 May the Industrial Focus Group XUV Optics, part of the MESA+ Institute for Nanotechnology, is hosting a workshop on Low Energy Ion Scattering (LEIS). LEIS is an elemental analysis technique with ultimate surface sensitivity that can be applied for analysis of various samples, ranging from catalysts and polymers to inorganic thin films and single crystals. During this workshop, LEIS users will exchange and discuss their recent results. Scientists with interest in the application of the LEIS technique are also most welcome to register.
Keynote speaker will be Dr. Stanislav Průša from Brno University of Technology on HS-LEIS for the analysis of graphene.
Workshop venue will be Conference Hotel Drienerburght, on the campus of the university.
More information and registration is available on: www.utwente.nl/LEIS2014
