On February 11, 2010 the Dutch Ellipsometry Workshop, organised by Herbert Wormeester, took place at the Drienerburght on the University of Twente.
Invited speakers:
· | Thomas Wagner / LOT-ORIEL |
· | Peter H. Thiesen / ACURION. |
· | Bruno Gompf / University of Stuttgart |
The workshop was sponsored by 
The ellipsometry workshop was well visited with an attendance of 43 persons. Many of these came from various groups within the University of Twente, but also a large delegation from the Technical University Eindhoven attended the meeting.
The large number of attendants indicates the large interest for this optical characterisation technique. The aim of the workshop was also to provide an easy access for novice and potential users.
The contribution of all speakers, and especially that of Thomas Wagner from LOT-Oriel, certainly provided a tutorial aspect. The mix of tutorial aspects and the presentation of state of the art ellipsometric results provided a fruitful basis for extended discussions.
Below you’ll find some presentations:
In situ spectroscopic ellipsometry as a versatile tool to study atomic layer deposition
by Erik Langereis – University of Eindhoven
Optical properties of Metamaterials
by Bruno Gompf – University of Stuttgart
In-situ Monitoring of Thin-Film Formation Processes bySpectroscopic Ellipsometry
by Alexey Kovalgin – University of Twente
Introduction into Spectroscopic Ellipsometry -Basics, Data Interpretation Considerations and Applicationsto Photovoltaics
by Thomas Wagner, L.O.T.-Oriel GmbH & Co. KG
