Publication on short-period multilayers for wavelength-dispersive X-ray fluorescence

We are very pleased to announce that the paper “Increasing soft x-ray reflectance of short-period W/Si multilayers using B4C diffusion barriers” by Dennis IJpes, Andrey Yakshin, Marko Sturm and Marcelo Ackermann, was published January 9^th 2023 in the Journal of Applied Physics.

In this work, ultra-thin 0.3 nm thick boron carbide diffusion barriers were successfully applied in sputter-deposited 2.5 nm period W/Si multilayers to inhibit W-Si interaction. A reflectivity of 45% was achieved at a wavelength of 0.84 nm wavelength. This is the result of a collaboration between Malvern-Panalytical and the University of Twente.