MESA+ University of Twente
Industrial focus group XUV Optics

Program

Download the full program here

Download the abstracts of the oral contributions here

Download the abstracts of the poster contributions here

PXRNMS Workshop 2016

Thursday November 10th (Building Gallery, Erlenmeyer)

10:00-10:10

Opening

Fred Bijkerk, University of Twente

10:10-10:50

Keynote talk: Multilayer X-ray Optics, Past and Future

Eberhard Spiller

10:50-11:10

Invited: Multi-parameter Characterization of sub-nanometer Cr/Sc Multilayers based on Complementary Measurements

Anton Haase, PTB

Coffee Break

11:40-12:00

Reconstruction of interfaces of periodic multilayer structures using model independent GIXR and XSW techniques

Igor Makhotkin, University of Twente

12:00-12:20

X-ray at-wavelength metrology of multi-layered surfaces

Sébastien Bérujon, ESRF

12:20-12:40

Self-consistent optical-constants of materials for EUV multilayer coatings

Juan Larruquert, Instituto de Optica-CSIC

Lunch

13:10-14:10

Poster session 1

14:10-14:30

Invited: DFT simulations of surfaces, interfaces and multilayers

Peter Blaha, Inst. Materialchemie, TU Wien

14:30-14:50

Beryllium based multilayer mirrors for the EUV spectral range

Vladimir Polkovnikov, Institute for Physics of Microstructures RAS

14:50-15:10

Tungsten growth on silicon oxide and boron carbide and additional role of spacer in the ultrashort period multilayer X-ray mirrors

Matej Jergel, Institute of Physics SAS, Slovakia

15:10-15:30

Normal- and grazing incidence mirrors for 6.x nm wavelength

Dmitry Kuznetsov, University of Twente

Coffee break

16:00-16:20

Invited: Neutron multilayers

Thierry Bigault, Institut Laue Langevin

16:20-16:40

The Hydrogenation Kinetics of a Magnesium Thin Film:

An in-situ Neutron-Reflection and Optical-Transmission Study of a Two-Phase System

Ad van Well, Delft University of Technology

16:40-17:00

Study of the in-plane magnetic structure of neutron polarizing multilayer mirrors

Ryuji Maruyama, Japan Atomic Energy Agency

17:00-18:00

Lab tour

XUV Optics group University of Twente

18:30

Drinks and dinner (Broeierd)

Friday November 11th (Building Gallery, Erlenmeyer)

09:00-09:20

Invited: Kossel X-ray standing-waves within a Cr/B4C/Sc multilayer

excited by protons

Karine Le Guen, Sorbonne Universités

09:20-09:40

High reflective water window collector optics

Hagen Pauer, OptiX fab

09:40-10:00

Current achievements in thin-film fabrication at HZG

Michael Störmer, Helmholtz-Zentrum Geesthacht

10:00-10:20

Development of efficient and stable Al-based multilayer reflecting coatings for the EUV range

Evgueni Meltchakov, Laboratoire Charles Fabry

Coffee break

10:50-11:10

Invited: EUV optics lifetime - radiation damage, contamination, and oxidation

Maarten van Kampen, ASML

11:10-11:30

Design, fabrication, and test of extreme ultraviolet microscope with 30-nm spatial resolution

Mitsunori Toyoda, IMRAM, Tohoku University

11:30-11:50

Hard X-ray multilayers with increased radiation resistance

Mauro Prasciolu, DESY

11:50-12:10

Stability issues in Pd/B4C multilayers

Christian Morawe, ESRF

Lunch

12:40-13:40

Poster session 2

13:40-14:00

Invited: Optimization and application of attosecond multilayers

Alexander Guggenmos, Ludwig-Maximilians-Universität München

14:00-14:20

Periodic multilayers and FEL radiation

Philippe Jonnard, Sorbonne Universités

14:20-14:40

Stress optimization of multilayer Laue lens coatings

Stefan Braun, Fraunhofer IWS Dresden

14:40-15:00

X-ray nanometer focusing at the SSRF basing on multi-layer Laue lens

Jiayi Zhang, Beijing Synchrotron Radiation Facility

Break

15:20-15:40

Structural and reflective characteristics of Mo/Be multilayer with barrier layers

Nikolai Chkhalo, Institute for Physics of Microstructures RAS

15:40-16:00

Complete characterisation of a multilayer coated reflection grating by atomic force microscopy (AFM), X-ray diffraction (XRD) and grazing incidence X-ray fluorescence analysis (GIXRF)

Werner Jark, Elettra – Sincrotrone Trieste

16:00-16:20

Accurate computation of the X-ray diffraction efficiency of a multilayer coated grating based on a non-conformal deposition model

Francois Polack, Synchrotron SOLEIL

16:20-16:40

High Efficiency Multilayer coated Blazed Grating for tender X-rays

Andrey Sokolov, Helmholtz Zentrum Berlin

16:40-17:00

Closing remarks

Recommendations for presenters:

Invited and regular talks: 15 minutes + 5 minutes for discussion

Poster session 1 (10 November 13:10 - 14:10)

·

Cr/C multilayer mirror for Ni-like Ta X-ray laser application

Mingqi Cui, Beijing Synchrotron Radiation Facility

· Testing of Reflective Quarter-Wave Retarder in EUV Range

Ahmed Gaballah, University of Padova

·

In-house X-ray Standing Wave study of LaN/B multilayer mirrors

Cedric Hendrikx, University of Twente

·

Development of high reflectance Cr/V multilayer mirror for water window applications

Qiushi Huang, Tongji University

·

Interface Growth in FeCo-Si Multilayers determined with atomic resolution

Thomas Krist, Helmholtz-Zentrum Berlin

·

Grazing incidence EUV surface metrology: benchmarking of DPP source table-top scatterometry versus PTB synchrotron based EUV-Radiometry

Oleksiy Maryasov, Physikalisch-Technische Bundesanstalt

·

In-situ stress measurement of thin film and multilayer deposition

Johan Reinink, University of Twente

·

Development of multilayer coated replicated neutron focusing optics

Suzanne Romaine, Smithsonian Astrophysical Observatory

·

The At-Wavelength Metrology facility for UV- and XUV reflection and diffraction optics at BESSY-II

Franz Schaefers, Helmholtz-Zentrum Berlin

·

Characterization of chemical processes and interfacial diffusion in Pd/Y multilayers using HAXPES induced by standing waves

M.-Y. Wu, Sorbonne Universités

·

Development of XUV multilayer coatings in IOF

Sergiy Yulin, Fraunhofer Institut Angewandte Optik und Feinmechanik

·

Interface engineering method for ultra-thin Cr/Ti soft x-ray multilayer

Jingtao Zhu, Tongji University

Poster session 2 (11 November 12:40 – 13:40)

·

EBL2: high power EUV exposure facility

Herman Bekman, TNO

·

Multilayer Laue lenses for hard X-ray microscopy

Nathalie Bouet, Brookhaven National Laboratory

·

CeMOX, a Collaborative facility for Development of High Performance Multilayer Optics

Blandine Capitanio, Groupe Optique Synchrotron Soleil

·

In-vacuo growth studies and thermal oxidation of ZrO2 thin films

Roger Coloma Ribera, University of Twente

·

The new 1 – 5 keV high efficiency alternate multilayer grating for SOLEIL SIRIUS beamline

David Dennetiere, Groupe Optique Synchrotron Soleil

·

Design, Development and characterization of thin film filters for high brilliance sources in the UV-X-ray Spectral range.

Kety Jimenez, Padova University

·

Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses

Igor Milov, University of Twente

·

Thermal stability and mechanical stress of B-based multilayers

Philipp Naujok, Fraunhofer Institute for Applied Optics and Precision Engineering IOF

·

Fabrication, characterization and application of large aperture multilayer Laue lenses

Sven Niese, AXO DRESDEN GmbH

·

Numerical modelling of reflective multilayer based X-ray optics

Pierre Piault, ESRF The European Synchrotron

·

Thin film based Optical Elements for Analytical X-ray Applications

Jörg Wiesmann, Incoatec GmbH