MESA+ University of Twente
Industrial focus group XUV Optics


PXRNMS Workshop 2016

Thursday November 10th (Building Gallery, Erlenmeyer)



Fred Bijkerk, University of Twente


Keynote talk: Multilayer X-ray Optics, Past and Future

Eberhard Spiller


Invited: Multi-parameter Characterization of sub-nanometer Cr/Sc Multilayers based on Complementary Measurements

Anton Haase, PTB

Coffee Break


Reconstruction of interfaces of periodic multilayer structures using model independent GIXR and XSW techniques

Igor Makhotkin, University of Twente


X-ray at-wavelength metrology of multi-layered surfaces

Sébastien Bérujon, ESRF


Self-consistent optical-constants of materials for EUV multilayer coatings

Juan Larruquert, Instituto de Optica-CSIC



Poster session 1


Invited: DFT simulations of surfaces, interfaces and multilayers

Peter Blaha, Inst. Materialchemie, TU Wien


Beryllium based multilayer mirrors for the EUV spectral range

Vladimir Polkovnikov, IPM RAS


Tungsten growth on silicon oxide and boron carbide and additional role of spacer in the ultrashort period multilayer X-ray mirrors

Matej Jergel, Institute of Physics SAS, Slovakia


Normal- and grazing incidence mirrors for 6.x nm wavelength

Dmitry Kuznetsov, University of Twente

Coffee break


Invited: Neutron multilayers

Thierry Bigault, Institut Laue Langevin


The Hydrogenation Kinetics of a Magnesium Thin Film:

An in-situ Neutron-Reflection and Optical-Transmission Study of a Two-Phase System

Ad van Well, Delft University of Technology


Study of the in-plane magnetic structure of neutron polarizing multilayer mirrors

Ryuji Maruyama, Japan Atomic Energy Agency


Lab tour

XUV Optics group University of Twente


Drinks and dinner (Broeierd)

Friday November 11th (Building Gallery, Erlenmeyer)


Invited: Kossel X-ray standing-waves within a Cr/B4C/Sc multilayer

excited by protons

Karine Le Guen, Sorbonne Universités


High reflective water window collector optics

Hagen Pauer, OptiX fab


Current achievements in thin-film fabrication at HZG

Michael Störmer, Helmholtz-Zentrum Geesthacht


Development of efficient and stable Al-based multilayer reflecting coatings for the EUV range

Evgueni Meltchakov, Laboratoire Charles Fabry

Coffee break


Invited: EUV optics lifetime - radiation damage, contamination, and oxidation

Maarten van Kampen, ASML


Design, fabrication, and test of extreme ultraviolet microscope with 30-nm spatial resolution

Mitsunori Toyoda, IMRAM, Tohoku University


Hard X-ray multilayers with increased radiation resistance

Mauro Prasciolu, DESY


Stability issues in Pd/B4C multilayers

Christian Morawe, ESRF



Poster session 2


Invited: Optimization and application of attosecond multilayers

Alexander Guggenmos, Ludwig-Maximilians-Universität München


Periodic multilayers and FEL radiation

Philippe Jonnard, Sorbonne Universités


Stress optimization of multilayer Laue lens coatings

Stefan Braun, Fraunhofer IWS Dresden


X-ray nanometer focusing at the SSRF basing on multi-layer Laue lens

Jiayi Zhang, Beijing Synchrotron Radiation Facility



Invited: Multilayers on sculptured surfaces

Dmitriy Voronov, Lawrence Berkeley National Laboratory


Complete characterisation of a multilayer coated reflection grating by atomic force microscopy (AFM), X-ray diffraction (XRD) and grazing incidence X-ray fluorescence analysis (GIXRF)

Werner Jark, Elettra – Sincrotrone Trieste


Accurate computation of the X-ray diffraction efficiency of a multilayer coated grating based on a non-conformal deposition model

Francois Polack, Synchrotron SOLEIL


High Efficiency Multilayer coated Blazed Grating for tender X-rays

Andrey Sokolov, Helmholtz Zentrum Berlin


Closing remarks

Recommendations for presenters:

Invited and regular talks: 15 minutes + 5 minutes for discussion

Poster session 1 (10 November 13:10 - 14:10)


Structural and reflective characteristics of Mo/Be multilayer with barrier layers

Nikolai Chkhalo, IPM RAS


Cr/C multilayer mirror for Ni-like Ta X-ray laser application

Mingqi Cui, Beijing Synchrotron Radiation Facility


Optical Characterization of wave retarder in FUV-EUV range

Ahmed Gaballah, University of Padova


In-house X-ray Standing Wave study of LaN/B multilayer mirrors

Cedric Hendrikx, University of Twente


Development of high reflectance Cr/V multilayer mirror for water window applications

Qiushi Huang, Tongji University


Interface Growth in FeCo-Si Multilayers determined with atomic resolution

Thomas Krist, Helmholtz-Zentrum Berlin


Grazing incidence EUV surface metrology: benchmarking of DPP source table-top scatterometry versus PTB synchrotron based EUV-Radiometry

Oleksiy Maryasov, Physikalisch-Technische Bundesanstalt


In-situ stress measurement of thin film and multilayer deposition

Johan Reinink, University of Twente


Development of multilayer coated replicated neutron focusing optics

Suzanne Romaine, Smithsonian Astrophysical Observatory


The At-Wavelength Metrology facility for UV- and XUV reflection and diffraction optics at BESSY-II

Franz Schaefers, Helmholtz-Zentrum Berlin


Characterization of chemical processes and interfacial diffusion in Pd/Y multilayers using HAXPES induced by standing waves

M.-Y. Wu, Sorbonne Universités


Development of XUV multilayer coatings in IOF

Sergiy Yulin, Fraunhofer Institut Angewandte Optik und Feinmechanik


Interface engineering method for ultra-thin Cr/Ti soft x-ray multilayer

Jingtao Zhu, Tongji University

Poster session 2 (11 November 12:40 – 13:40)


EBL2: high power EUV exposure facility

Herman Bekman, TNO


Multilayer Laue lenses for hard X-ray microscopy

Nathalie Bouet, Brookhaven National Laboratory


CeMOX, a Collaborative facility for Development of High Performance Multilayer Optics

Blandine Capitanio, Groupe Optique Synchrotron Soleil


In-vacuo growth studies and thermal oxidation of ZrO2 thin films

Roger Coloma Ribera, University of Twente


The new 1 – 5 keV high efficiency alternate multilayer grating for SOLEIL SIRIUS beamline

David Dennetiere, Groupe Optique Synchrotron Soleil


Design, Development and characterization of thin film filters for high brilliance sources in the UV-X-ray Spectral range.

Kety Jimenez, Padova University


Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses

Igor Milov, University of Twente


Thermal stability and mechanical stress of B-based multilayers

Philipp Naujok, Fraunhofer Institute for Applied Optics and Precision Engineering IOF


Fabrication, characterization and application of large aperture multilayer Laue lenses

Sven Niese, AXO DRESDEN GmbH


Numerical modelling of reflective multilayer based X-ray optics

Pierre Piault, ESRF The European Synchrotron


Thin film based Optical Elements for Analytical X-ray Applications

Dr. Jörg Wiesmann, Incoatec GmbH


To be announced
Eric Ziegler, ESRF The European Synchrotron