Program | Industrial Focus Group XUV Optics

Download the full program here.
Download the abstracts of the oral contributions here.
Download the abstracts of the poster contributions here.

PXRNMS Workshop 2016

Thursday November 10^th (Building Gallery, Erlenmeyer)
10:00-10:10	Opening Fred Bijkerk, University of Twente
10:10-10:50	Keynote talk: Multilayer X-ray Optics, Past and Future Eberhard Spiller
10:50-11:10	Invited: Multi-parameter Characterization of sub-nanometer Cr/Sc Multilayers based on Complementary Measurements Anton Haase, PTB
Coffee Break
11:40-12:00	Reconstruction of interfaces of periodic multilayer structures using model independent GIXR and XSW techniques Igor Makhotkin, University of Twente
12:00-12:20	X-ray at-wavelength metrology of multi-layered surfaces Sébastien Bérujon, ESRF
12:20-12:40	Self-consistent optical-constants of materials for EUV multilayer coatings Juan Larruquert, Instituto de Optica-CSIC
Lunch
13:10-14:10	Poster session 1
14:10-14:30	Invited: DFT simulations of surfaces, interfaces and multilayers Peter Blaha, Inst. Materialchemie, TU Wien
14:30-14:50	Beryllium based multilayer mirrors for the EUV spectral range Vladimir Polkovnikov, Institute for Physics of Microstructures RAS
14:50-15:10	Tungsten growth on silicon oxide and boron carbide and additional role of spacer in the ultrashort period multilayer X-ray mirrors Matej Jergel, Institute of Physics SAS, Slovakia
15:10-15:30	Normal- and grazing incidence mirrors for 6.x nm wavelength Dmitry Kuznetsov, University of Twente
Coffee break
16:00-16:20	Invited: Neutron multilayers Thierry Bigault, Institut Laue Langevin
16:20-16:40	The Hydrogenation Kinetics of a Magnesium Thin Film: An in-situ Neutron-Reflection and Optical-Transmission Study of a Two-Phase System Ad van Well, Delft University of Technology
16:40-17:00	Study of the in-plane magnetic structure of neutron polarizing multilayer mirrors Ryuji Maruyama, Japan Atomic Energy Agency
17:00-18:00	Lab tour XUV Optics group University of Twente
18:30	Drinks and dinner (Broeierd)

Friday November 11^th (Building Gallery, Erlenmeyer)
09:00-09:20	Invited: Kossel X-ray standing-waves within a Cr/B₄C/Sc multilayer excited by protons Karine Le Guen, Sorbonne Universités
09:20-09:40	High reflective water window collector optics Hagen Pauer, OptiX fab
09:40-10:00	Current achievements in thin-film fabrication at HZG Michael Störmer, Helmholtz-Zentrum Geesthacht
10:00-10:20	Development of efficient and stable Al-based multilayer reflecting coatings for the EUV range Evgueni Meltchakov, Laboratoire Charles Fabry
Coffee break
10:50-11:10	Invited: EUV optics lifetime - radiation damage, contamination, and oxidation Maarten van Kampen, ASML
11:10-11:30	Design, fabrication, and test of extreme ultraviolet microscope with 30-nm spatial resolution Mitsunori Toyoda, IMRAM, Tohoku University
11:30-11:50	Hard X-ray multilayers with increased radiation resistance Mauro Prasciolu, DESY
11:50-12:10	Stability issues in Pd/B₄C multilayers Christian Morawe, ESRF
Lunch
12:40-13:40	Poster session 2
13:40-14:00	Invited: Optimization and application of attosecond multilayers Alexander Guggenmos, Ludwig-Maximilians-Universität München
14:00-14:20	Periodic multilayers and FEL radiation Philippe Jonnard, Sorbonne Universités
14:20-14:40	Stress optimization of multilayer Laue lens coatings Stefan Braun, Fraunhofer IWS Dresden
14:40-15:00	X-ray nanometer focusing at the SSRF basing on multi-layer Laue lens Jiayi Zhang, Beijing Synchrotron Radiation Facility
Break
15:20-15:40	Structural and reflective characteristics of Mo/Be multilayer with barrier layers Nikolai Chkhalo, Institute for Physics of Microstructures RAS
15:40-16:00	Complete characterisation of a multilayer coated reflection grating by atomic force microscopy (AFM), X-ray diffraction (XRD) and grazing incidence X-ray fluorescence analysis (GIXRF) Werner Jark, Elettra – Sincrotrone Trieste
16:00-16:20	Accurate computation of the X-ray diffraction efficiency of a multilayer coated grating based on a non-conformal deposition model Francois Polack, Synchrotron SOLEIL
16:20-16:40	High Efficiency Multilayer coated Blazed Grating for tender X-rays Andrey Sokolov, Helmholtz Zentrum Berlin
16:40-17:00	Closing remarks

Recommendations for presenters:
Invited and regular talks: 15 minutes + 5 minutes for discussion

Poster session 1 (10 November 13:10 - 14:10)

Cr/C multilayer mirror for Ni-like Ta X-ray laser application
Mingqi Cui, Beijing Synchrotron Radiation Facility
Testing of Reflective Quarter-Wave Retarder in EUV Range
Ahmed Gaballah, University of Padova
In-house X-ray Standing Wave study of LaN/B multilayer mirrors
Cedric Hendrikx, University of Twente
Development of high reflectance Cr/V multilayer mirror for water window applications
Qiushi Huang, Tongji University
Interface Growth in FeCo-Si Multilayers determined with atomic resolution
Thomas Krist, Helmholtz-Zentrum Berlin
Grazing incidence EUV surface metrology: benchmarking of DPP source table-top scatterometry versus PTB synchrotron based EUV-Radiometry
Oleksiy Maryasov, Physikalisch-Technische Bundesanstalt
In-situ stress measurement of thin film and multilayer deposition
Johan Reinink, University of Twente
Development of multilayer coated replicated neutron focusing optics
Suzanne Romaine, Smithsonian Astrophysical Observatory
The At-Wavelength Metrology facility for UV- and XUV reflection and diffraction optics at BESSY-II
Franz Schaefers, Helmholtz-Zentrum Berlin
Characterization of chemical processes and interfacial diffusion in Pd/Y multilayers using HAXPES induced by standing waves
M.-Y. Wu, Sorbonne Universités
Development of XUV multilayer coatings in IOF
Sergiy Yulin, Fraunhofer Institut Angewandte Optik und Feinmechanik
Interface engineering method for ultra-thin Cr/Ti soft x-ray multilayer
Jingtao Zhu, Tongji University

Poster session 2 (11 November 12:40 – 13:40)

EBL2: high power EUV exposure facility
Herman Bekman, TNO
Multilayer Laue lenses for hard X-ray microscopy
Nathalie Bouet, Brookhaven National Laboratory
CeMOX, a Collaborative facility for Development of High Performance Multilayer Optics
Blandine Capitanio, Groupe Optique Synchrotron Soleil
In-vacuo growth studies and thermal oxidation of ZrO₂ thin films
Roger Coloma Ribera, University of Twente
The new 1 – 5 keV high efficiency alternate multilayer grating for SOLEIL SIRIUS beamline
David Dennetiere, Groupe Optique Synchrotron Soleil
Design, Development and characterization of thin film filters for high brilliance sources in the UV-X-ray Spectral range.
Kety Jimenez, Padova University
Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses
Igor Milov, University of Twente
Thermal stability and mechanical stress of B-based multilayers
Philipp Naujok, Fraunhofer Institute for Applied Optics and Precision Engineering IOF
Fabrication, characterization and application of large aperture multilayer Laue lenses
Sven Niese, AXO DRESDEN GmbH
Numerical modelling of reflective multilayer based X-ray optics
Pierre Piault, ESRF The European Synchrotron
Thin film based Optical Elements for Analytical X-ray Applications
Jörg Wiesmann, Incoatec GmbH