PXRNMS Workshop 2016
Thursday November 10th (Building Gallery, Erlenmeyer) | |
10:00-10:10 | Opening |
10:10-10:50 | Keynote talk: Multilayer X-ray Optics, Past and Future |
10:50-11:10 | |
Coffee Break | |
11:40-12:00 | Reconstruction of interfaces of periodic multilayer structures using model independent GIXR and XSW techniques |
12:00-12:20 | X-ray at-wavelength metrology of multi-layered surfaces |
12:20-12:40 | Self-consistent optical-constants of materials for EUV multilayer coatings |
Lunch | |
13:10-14:10 | Poster session 1 |
14:10-14:30 | Invited: DFT simulations of surfaces, interfaces and multilayers |
14:30-14:50 | Beryllium based multilayer mirrors for the EUV spectral range |
14:50-15:10 | Tungsten growth on silicon oxide and boron carbide and additional role of spacer in the ultrashort period multilayer X-ray mirrors |
15:10-15:30 | Normal- and grazing incidence mirrors for 6.x nm wavelength |
Coffee break | |
16:00-16:20 | Invited: Neutron multilayers |
16:20-16:40 | The Hydrogenation Kinetics of a Magnesium Thin Film: |
16:40-17:00 | Study of the in-plane magnetic structure of neutron polarizing multilayer mirrors |
17:00-18:00 | Lab tour |
18:30 | Drinks and dinner (Broeierd) |
Recommendations for presenters:
Invited and regular talks: 15 minutes + 5 minutes for discussion
Poster session 1 (10 November 13:10 - 14:10)
- Cr/C multilayer mirror for Ni-like Ta X-ray laser application
Mingqi Cui, Beijing Synchrotron Radiation Facility - Testing of Reflective Quarter-Wave Retarder in EUV Range
Ahmed Gaballah, University of Padova - In-house X-ray Standing Wave study of LaN/B multilayer mirrors
Cedric Hendrikx, University of Twente - Development of high reflectance Cr/V multilayer mirror for water window applications
Qiushi Huang, Tongji University - Interface Growth in FeCo-Si Multilayers determined with atomic resolution
Thomas Krist, Helmholtz-Zentrum Berlin - Grazing incidence EUV surface metrology: benchmarking of DPP source table-top scatterometry versus PTB synchrotron based EUV-Radiometry
Oleksiy Maryasov, Physikalisch-Technische Bundesanstalt - In-situ stress measurement of thin film and multilayer deposition
Johan Reinink, University of Twente - Development of multilayer coated replicated neutron focusing optics
Suzanne Romaine, Smithsonian Astrophysical Observatory - The At-Wavelength Metrology facility for UV- and XUV reflection and diffraction optics at BESSY-II
Franz Schaefers, Helmholtz-Zentrum Berlin - Characterization of chemical processes and interfacial diffusion in Pd/Y multilayers using HAXPES induced by standing waves
M.-Y. Wu, Sorbonne Universités - Development of XUV multilayer coatings in IOF
Sergiy Yulin, Fraunhofer Institut Angewandte Optik und Feinmechanik - Interface engineering method for ultra-thin Cr/Ti soft x-ray multilayer
Jingtao Zhu, Tongji University
Poster session 2 (11 November 12:40 – 13:40)
- EBL2: high power EUV exposure facility
Herman Bekman, TNO - Multilayer Laue lenses for hard X-ray microscopy
Nathalie Bouet, Brookhaven National Laboratory - CeMOX, a Collaborative facility for Development of High Performance Multilayer Optics
Blandine Capitanio, Groupe Optique Synchrotron Soleil - In-vacuo growth studies and thermal oxidation of ZrO2 thin films
Roger Coloma Ribera, University of Twente - The new 1 – 5 keV high efficiency alternate multilayer grating for SOLEIL SIRIUS beamline
David Dennetiere, Groupe Optique Synchrotron Soleil - Design, Development and characterization of thin film filters for high brilliance sources in the UV-X-ray Spectral range.
Kety Jimenez, Padova University - Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses
Igor Milov, University of Twente - Thermal stability and mechanical stress of B-based multilayers
Philipp Naujok, Fraunhofer Institute for Applied Optics and Precision Engineering IOF - Fabrication, characterization and application of large aperture multilayer Laue lenses
Sven Niese, AXO DRESDEN GmbH - Numerical modelling of reflective multilayer based X-ray optics
Pierre Piault, ESRF The European Synchrotron - Thin film based Optical Elements for Analytical X-ray Applications
Jörg Wiesmann, Incoatec GmbH