'The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach'
Dr. Igor Makhotkin presented his work titled 'The interface study of photoresist/underlayer using hybrid X-ray reflectivity and X-ray standing wave approach' on the SPIE Advanced Lithography & Patterning Conference 2024 in San Jose, California, United States.
He reported on the application of hybrid X-ray reflectivity - X-ray standing waves metrology to understand the distribution of photo-assist generator (PAG) in photoresists - underlayer systems'.
This is a great example of solving complex thin film characterization tasks with powerful yet accessible and laboratory-suited X-ray techniqes. We would like to express our sincere appreciation to our colleague Dr. Atul Tiwari for his careful and thoughtful work on measurements, analysis, preparation of the results for the presentation and, of course, Roberto Fallica (IMEC) for formulating this challenge and preparing the samples used in this work.
This conference provides an excellent platform for interaction betweeen industry and academia.
