UTFacultiesTNWResearchDept CEMCSNewsMCS publishes in ACS Applied Nano Materials

MCS publishes in ACS Applied Nano Materials

A research team led by our colleague Niels Tas reported a fabrication method to create high-density arrays of silicon wedges bound by {111} planes on silicon (100) wafers by combining convex corner lithography on a silicon dioxide hard mask with anisotropic, crystallographic etching in a repetitive, self-aligned multiplication procedure. The produced high-density arrays of wedges can serve as a promising template for the fabrication of large arrays of nanodevices in various domains with relevant details in the sub-10 nm range. The paper recently published in ACS Applied Nano Materials demonstrates the unqiue expertise of our group in nanofabrication.