ASSIGNMENT BSC / MSC student
Developing a time-dependent temperature model for thin free-standing layers during extreme ultraviolet exposure
Contact: Duncan Ramsamoedj, d.c.ramsamoedj@utwente.nl, and Dr. Wesley van den Beld, w.t.e.vandenbeld@utwente.nl
A thin (<100 nm) free-standing layer (window) that is exposed to extreme ultraviolet (EUV) light with a synchrotron heats up to almost 1000 K inside the exposure spot. Far from the exposure spot, the window is room temperature. However, there is a transition region, the size of this region depends on the local heat conduction and radiative cooling.
In addition, the time-dependence of the temperature is of interest when starting or stopping the EUV exposure. With this knowledge it is possible to model the adsorption and desorption of species and the rate of chemical reactions at different moments during the exposure.
During this assignment, you will investigate these processes and create an analytical and numerical model to estimate the local temperature. By doing this, you will learn about physical and chemical processes, modelling and coding.
Figure 1: temperature of a free-standing layer at different amounts of radiative cooling (emissivity).
Image source: J. Appl. Phys.. 2015;118(21). doi:10.1063/1.4936851