Title: XUV Optics
Project Type: Core science programme of the XUV Optics Focus Group  
Label: XUV
Project Leader: Prof. Dr. F. Bijkerk (
Duration: 2013-2016 (stage 1), 2017-2020 (stage 2)
Cost estimate: M€ 17
Base funding: Province of Overijssel, ASML, Carl Zeiss SMT AG, Malvern Panalytical, MESA+, FOM
Partners: Zeiss SMT, ASML, Malvern Panalytical, DEMCON, SolMateS, TNO  

The use of multilayer reflective optics is regularly providing spectacular evidence of new, advanced industrial applications. These are in the fields of:

With such applications well in place, research and development is facing new innovation requests. The goal of this focussed research programme is to address such usage-inspired research tasks through a collaborative programme, with the aim to enhance the synergy between the respective applications. The main goal is to demonstrate high reflectivity, tailored spectral response and long lifetimes for the window of applications: the wavelength range from several tens to few tenths of nanometers, labeled as XUV. Largely, the programme follows the approach and methodology for the EUV lithography optics development in the past decades. This is a parallel activity on design and fabrication of multilayer optics, numerical design methods, PVD-based deposition and thin film growth, and materials analysis at the atomic scale.

The programme is motivated by the input from the industrial partners that are applying multilayer systems, i.e. ASML Research, Carl Zeiss SMT GmbH, and PANalytical. Other partners are involved based on their expertise and field of application. The programme is composed of a number of research projects carried out in the period 2013 up to and including 2020, including a large number of satellite projects on specific multilayer topics.