Monday 13 March 2017
On 15 December, Rik van der Velde presented his MSc work on the measurement of coalescence in nanometer-thin films. He studied the coalescence of tungsten and aluminum nitride when deposited using atomic layer deposition. His work involved test structure design, prototype fabrication in the Nanolab Twente, electrical characterization and analysis. After the presentation, he received his MSc Degree in Electrical Engineering. Congratulations Rik!
