Programme

Key-note presentations will be given by internationally recognised experts from both academia and industry. The topics range from fundamental principles to simulation/modelling of processes, plasma sources, and various applications. The preliminary programme is:

Fluorine-based plasma etching

To be announced!


Chlorine/bromine-based plasma etching

To be announced!


Non-plasma-based dry etching

To be announced!


Pulsed plasma etching

To be announced!


Process modeling

To be announced!


Green manufacturing

To be announced!


Hardware design

To be announced!