MESA+ University of Twente
Industrial focus group XUV Optics

Former PhD students

Former PhD students


Roger Coloma Ribera (2017)

Growth and thermal oxidation of Ru and ZrO2 thin films as oxidation protective layers 



Dmitry Astakhov (2016)

Numerical study of extreme-ultra-violet generated plasmas in hydrogen



Sebastiaan Huber (2016)

Illuminating the structure of borides through X-ray absorption spectroscopy



An Gao (2015)

Analysis of extreme ultraviolet induced surface defect processes



Slava Medvedev (2015)

Tailoring spectral properties of Extreme UV multilayer optics



Muharrem Bayraktar (2015)

Adaptive multilayer optics for extreme ultraviolet wavelengths



Steven Nyabero (2014)

Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers



Alexey Kuznetsov (2013)

Hydrogen particle and plasma interactions with heterogeneous structures



Jeroen Bosgra (2013)

Interlayer thermodynamics in nanoscale layered structures for reflection of EUV radiation



Igor Makhotkin (2013)

Structural and reflective characteristics of multilayers for 6.x nm wavelength



Robert van der Meer (2013)

Single-order Lamellar multilayer gratings



Eric Louis (2012)

Physics and technology development of multilayer EUV reflective optics



Toine van den Boogaard (2011)

Ion-enhanced growth in planar and structured Mo/si multilayers



Juequan Chen (2011)

Characterization of EUV induced contamination on multilayer optics



Saskia Bruijn (2011)

Diffusion phenomena in chemically stabilized multilayer structures



Véronique de Rooij-Lohmann


Nanoscale diffusion, compound formation and phase transitions in Mo/Si multilayer structures



Tim Tsarfati (2009)

Surface and interface dynamics in multilayered systems



Ileana Nedelcu (2007)

Interface structure and interdiffusion in Mo/Si multilayers



Marc Kessels (2005)

Interfaces in soft x-ray multilayer mirrors



René de Bruijn (2004)

Dynamics of laser produced XUV emitting plasmas



Remko Stuik (2002)

Characterization of XUV sources



Harm-Jan Voorma (1997)

Mo/Si multilayer optics for micro-lithography