Since the discovery of graphene in 2004, there has been a growing attention for this carbon material thanks to its unique properties. The organic layer is synthesized on the surface of metals like copper and nickel. Therefore it is crucial to have a clean metal surface for letting the catalytic reaction take place. In the conventional synthesizing process impurities are often present which lead to defects in the graphene layer.
The Organic Metal Deposition System solves this problem, since it is capable of evaporating metals and growing graphene without breaking the vacuum. The cluster system is composed of an ultra-high vacuum (UHV) evaporator and a chemical vapor deposition (CVD) reactor. In the evaporator up to four different materials can be deposited using e-gun evaporation and two organic materials using Knudsen cells. In the CVD reactor graphene growth is possible by using hydrogen and methane gas and heating the wafer to temperatures up to 1100 degrees Celsius.