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2024
Examining the influence of W thickness on the Si-on-W Interface: A comparative metrology analysis (2024)Applied surface science, 670. Article 160615. Valpreda, A., Sturm, J. M., Yakshin, A. E., Woitok, J. F., Lokhorst, H. W., Phadke, P. & Ackermann, M.https://doi.org/10.1016/j.apsusc.2024.160615Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates (2024)AIP advances, 14. Article 105021. Babenko, I., Mostafa, Y., Bouza, Z., Versolato, O. O. & Bayraktar, M.https://doi.org/10.1063/5.0226426Dewetting of Pt Nanoparticles Boosts Electrocatalytic Hydrogen Evolution Due to Electronic Metal-Support Interaction (2024)Advanced functional materials, 34(40). Article 2403628. Harsha, S., Sharma, R. K., Dierner, M., Baeumer, C., Makhotkin, I., Mul, G., Ghigna, P., Spiecker, E., Will, J. & Altomare, M.https://doi.org/10.1002/adfm.202403628Structural pathways for ultrafast melting of optically excited thin polycrystalline Palladium films (2024)Acta materialia, 276. Article 120043. Antonowicz, J., Olczak, A., Sokolowski-Tinten, K., Zalden, P., Milov, I., Dzięgielewski, P., Bressler, C., Chapman, H. N., Chojnacki, M., Dłużewski, P., Rodriguez-Fernandez, A., Fronc, K., Gawełda, W., Georgarakis, K., Greer, A. L., Jacyna, I., van de Kruijs, R. W. E., Kamiński, R., Khakhulin, D., … Sobierajski, R.https://doi.org/10.1016/j.actamat.2024.120043Electronic heat conductivity in a two-temperature state (2024)International journal of heat and mass transfer, 228. Article 125674. Medvedev, N., Akhmetov, F. & Milov, I.https://doi.org/10.1016/j.ijheatmasstransfer.2024.125674Ab initio-simulated optical response of hot electrons in gold and ruthenium (2024)Optics express, 32(11), 19117-19132. Akhmetov, F., Vorberger, J., Milov, I., Makhotkin, I. & Ackermann, M.https://doi.org/10.1364/OE.522772Electron and lattice response to ultrafast laser excitation: Exploring temperature dynamics in transition metals (2024)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Akhmetov, F.https://doi.org/10.3990/1.9789036561297The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach (2024)[Contribution to conference › Paper] SPIE Advanced Lithography + Patterning, 2024. Tiwari, A., Fallica, R., Ackermann, M. & Makhotkin, I. A.X-ray standing wave characterization of the strong metal–support interaction in Co/TiOx model catalysts (2024)Journal of applied crystallography, 57(Part 2), 481 - 491. Tiwari, A., Monai, M., Matveevskii, K., Yakunin, S. N., Mandemaker, L. D. B., Tsvetanova, M., Goodwin, M. J., Ackermann, M. & Makhotkin, I. A.https://doi.org/10.1107/S1600576724001730Macro and Nanoscale Properties of (001)-Oriented Bi0. 5Na0. 5TiO3 Lead-Free Piezoelectric Thin Films Grown by Sputtering on LaNiO3/Si Substrates (2024)Journal of alloys and compounds, 976. Article 172909. Mohandas Moolayil, S. M., Hamieh, A., Da Costa, A., Ferri, A., Desfeux, R. & Remiens, D.https://doi.org/10.1016/j.jallcom.2023.172909Nanoscale Kirkendall shift in thin films studied using x-ray waveguide structures (2024)Acta materialia, 266. Article 119694. Tiwari, A., Gupta, M., Das, G., Garreau, Y., Coati, A. & Gupta, A.https://doi.org/10.1016/j.actamat.2024.119694Dual Modulation Scanning Tunneling Microscopy: a Quest for Subnanometer Chemical Contrast on Thin Films (2024)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Oldenkotte, V. J. S.https://doi.org/10.3990/1.9789036559416Oxidation of thin film binary entropy alloys (2024)[Contribution to conference › Poster] NWO Physics 2024. Homsma, M., van den Beld, W., van de Kruijs, R. W. E. & Ackermann, M.The effect of W thickness on the interface Si-on-W, a Low-Energy Ion Scattering study (2024)[Contribution to conference › Poster] NWO Physics 2024. Valpreda, A., Sturm, J. M., Yakshin, A. E. & Ackermann, M.
2023
Interface smoothing in short-period W/B4C multilayers using neon ion beam polishing (2023)Journal of Applied Physics, 134(24). Article 245303. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0175793Role of Excess Bi on the Properties and Performance of BiFeO3 Thin-Film Photocathodes (2023)ACS Applied Energy Materials, 6(24), 12237−12248. Prasad, N. P., Rohnke, M., Verheijen, M. A., Sturm, J. M., Hofmann, J. P., Hensen, E. J. M. & Bieberle-Hütter, A.https://doi.org/10.1021/acsaem.3c01926Interface engineered ultrashort period soft X-ray multilayers: Growth, characterization, and optical response (2023)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. IJpes, D.https://doi.org/10.3990/1.9789036559270Atomic-scale insights into damage produced by swift heavy ions in polyethylene (2023)Journal of materials science, 58, 17275-17291. Babaev, P., Akhmetov, F., Gorbunov, S., Medvedev, N., Rymzhanov, R., Voronkov, R. & Volkov, A. E.https://doi.org/10.1007/s10853-023-09117-8Electron-phonon coupling in transition metals beyond Wang's approximation (2023)Physical review B: Covering condensed matter and materials physics, 108(21). Article 214301. Akhmetov, F., Milov, I., Makhotkin, I. A., Ackermann, M. & Vorberger, J.https://doi.org/10.1103/PhysRevB.108.214301Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction (2023)Plasma sources science and technology, 32(12). Article 125006. Fischer, J., Renner, M., Gudmundsson, J. T., Rudolph, M., Hajihoseini, H., Brenning, N. & Lundin, D.https://doi.org/10.1088/1361-6595/ad10efGrowth and optical performance of short-period W/Al and polished W/Si/Al/Si multilayers (2023)Journal of Applied Physics, 134(15). Article 155301. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0168377Resolving buried interfaces by Low-Energy Ion Scattering (2023)[Contribution to conference › Poster] International Conference on Physics of X-Ray and Neutron Multilayer Structures, PXRNMS 2023. Valpreda, A.Infrared emissivity of thin films based on molybdenum silicides with silicon (2023)[Contribution to conference › Poster] MESA+ Meeting 2023. Baskakov, A., Golsanamlou, Z., van de Kruijs, R. W. E., Bokdam, M., Sturm, J. M. & Ackermann, M.Oxidation of Enhanced Entropy Alloy Thin Films (2023)[Contribution to conference › Poster] MESA+ Meeting 2023. Homsma, M.EUV Source Metrology (2023)In Photon Sources for Lithography and Metrology (pp. 509-535). Bayraktar, M., Liu, F., Versolato, O. & Bijkerk, F.https://doi.org/10.1117/3.2638242.ch13Chemical Interaction of Hydrogen Radicals (H*) with Transition Metal Nitrides (2023)The Journal of physical chemistry C, 127(36), 17770-17780. Rehman, A., van de Kruijs, R. W. E., van den Beld, W. T. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.1021/acs.jpcc.3c04490Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates (2023)Optics letters, 48(16), 4316-4319. Mostafa, Y., Bouza, Z., Byers, J., Babenko, I., Ubachs, W., Versolato, O. O. & Bayraktar, M.https://doi.org/10.1364/OL.496995Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges (2023)Plasma sources science and technology, 32(7), 075016. Antunes, V. G., Rudolph, M., Kapran, A., Hajihoseini, H., Raadu, M. A., Brenning, N., Gudmundsson, J. T., Lundin, D. & Minea, T.https://doi.org/10.1088/1361-6595/ace847Resolving buried interfaces with low energy ion scattering (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(4). Article 043203. Valpreda, A., Sturm, J. M., Yakshin, A. E. & Ackermann, M.https://doi.org/10.1116/6.0002567Implementing 0.1 nm B4C barriers in ultrashort period 1.0 nm W/Si multilayers for increased soft x-ray reflectance (2023)Journal of Applied Physics, 133(24). Article 245301. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0153322Laser-induced electron dynamics and surface modification in ruthenium thin films (2023)Vacuum, 212. Article 112045. Akhmetov, F., Milov, I., Semin, S., Formisano, F., Medvedev, N., Sturm, J. M., Zhakhovsky, V. V., Makhotkin, I. A., Kimel, A. & Ackermann, M.https://doi.org/10.1016/j.vacuum.2023.112045Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(3). Article 033009. Renner, M., Fischer, J., Hajihoseini, H., Gudmundsson, J. T., Rudolph, M. & Lundin, D.https://doi.org/10.1116/6.0002555Charge exchange between He+ ions and solid targets: The dependence on target electronic structure revisited (2023)Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms, 538, 47-57. Sturm, J. M., Lokhorst, H. W., Zameshin, A. A. & Ackermann, M. D.https://doi.org/10.1016/j.nimb.2023.02.029Corrigendum to “In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers” [Appl. Surf. Sci. 258(1) (2011) 7–12] (2023)Applied surface science, 618. Article 155765. Chen, J., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., van Schaik, W., van de Kruijs, R. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2022.155765Actinic Inspection of the EUV Optical Parameters of Lithographic Materials with Lab-Based Radiometry and Reflectometry (2023)In Optical and EUV Nanolithography XXXVI. Article 1249407 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12494). SPIE. Dorney, K. M., Kissoon, N. N., Holzmeier, F., Larsen, E. W., Singh, D. P., Arvind, S., Santra, S., Fallica, R., Makhotkin, I., Philipsen, V., De Gendt, S., Fleischmann, C., van der Heide, P. A. W. & Petersen, J. S.https://doi.org/10.1117/12.2658359Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range (2023)In Metrology, Inspection, and Process Control XXXVII. Article 124963B (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12496). SPIE. Abbasirad, N., Saadeh, Q., Ciesielski, R., Gottwald, A., Philippsen, V., Makhotkin, I., Sokolov, A., Kolbe, M., Scholze, F. & Soltwisch, V.https://doi.org/10.1117/12.2659369Si transfer and self-limiting chemisorption on Ru thin film surface in hydrogen radicals environment (2023)[Contribution to conference › Poster] SPIE Optics + Optoelectronics 2023. Gaffarov, I., Sturm, J. M., Vlooswijk, A., de Heij, P., Ackermann, M. D. & Makhotkin, I. A.https://spie.org/optics-optoelectronics/presentation/Si-transfer-and-self-limiting-chemisorption-on-Ru-thin-film/12578-20Laser-induced heating and surface modifications in Ru thin films (2023)[Contribution to conference › Poster] NWO Physics 2023. Akhmetov, F., Milov, I., Semin, S., Medvedev, N., Formisano, F., Zhakhovsky, V. V., Kimel, A., Makhotkin, I. A. & Ackermann, M.The world of chips: How do you make chips? (2023)[Non-textual form › Digital or Visual Products]. Ackermann, M., Nauta, B. & Schmitz, J.https://www.utwente.nl/nl/sg/programma/2023/3/386762/de-wereld-van-chips?code=4abdccddFrontiers, challenges, and solutions in modeling of swift heavy ion effects in materials (2023)Journal of Applied Physics, 133(10). Article 100701. Medvedev, N., Volkov, A. E., Rymzhanov, R., Akhmetov, F., Gorbunov, S., Voronkov, R. & Babaev, P.https://doi.org/10.1063/5.0128774Increasing soft x-ray reflectance of short-period W/Si multilayers using B4C diffusion barriers (2023)Journal of Applied Physics, 133(2). Article 025302. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0130677Active Wafer Table Based on Piezoelectric Thin Films (2023)[Contribution to conference › Poster] NWO Physics 2023. Şimşek, E., Vries, S. E., Jansen, B., Steur, M., Bijkerk, F., Bayraktar, M. & Ackermann, M.Bottom Electrode Optimization for Piezoelectric Thin Film Based Active Wafer Tables (2023)[Contribution to conference › Poster] MESA+ Meeting 2023. Şimşek, E., Jansen, B., Bayraktar, M. & Ackermann, M.Étude de l'adhésion interfaciale dans les composites piézoélectriques à matrice fluoropolymère (2023)[Other contribution › Other contribution]. HAL. Bouad, V., Mohan, M. M. S., Fadel, A., Hamied, A., Marin, A., Tahon, J.-F., Addad, A., Ferri, A., Da Costa, A., Desfeux, R., Ponchel, F., Remiens, D., Lyskawa, J., Lefebvre, J.-M., Barrau, S. & Ladmiral, V.https://univ-artois.hal.science/hal-03956612/Guided electromagnetic discharge pulses driven by short intense laser pulses: Characterization and modeling (2023)Physics of plasmas, 30(1). Article 013105. Ehret, M., Bailly-Grandvaux, M., Korneev, P., Apiñaniz, J. I., Brabetz, C., Morace, A., Bradford, P., D'Humières, E., Schaumann, G., Bagnoud, V., Malko, S., Matveevskii, K., Roth, M., Volpe, L., Woolsey, N. C. & Santos, J. J.https://doi.org/10.1063/5.0124011Target ion and neutral spread in high power impulse magnetron sputtering (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(1), 1-11. Article 013002. Hajihoseini, H., Brenning, N., Rudolph, M., Raadu, M. A., Lundin, D., Fischer, J., Minea, T. M. & Gudmundsson, J. T.https://doi.org/10.1116/6.0002292
2022
Surface and interface diffusion processes in nanoscale thin films (2022)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Chandrasekaran, A.https://doi.org/10.3990/1.9789036554763Multiferroics perspectives on strain, structure and properties (2022)In Advances in Highly Correlated Systems. River Publishers. Ramadurai, R. & Mohandas Moolayil, S. M.Fracture behavior and characterization of free-standing metal silicide thin films (2022)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Shafikov, A.https://doi.org/10.3990/1.9789036554251Effect of Atomic-Temperature Dependence of the Electron–Phonon Coupling in Two-Temperature Model (2022)Materials, 15(15). Article 5193. Akhmetov, F., Medvedev, N., Makhotkin, I. A., Ackermann, M. & Milov, I.https://doi.org/10.3390/ma15155193Modeling Time-Resolved Kinetics in Solids Induced by Extreme Electronic Excitation (2022)Advanced Theory and Simulations, 5(8), 1-14. Article 2200091. Medvedev, N., Akhmetov, F., Rymzhanov, A., Voronkov, R. & Volkov, E.https://doi.org/10.1002/adts.202200091Influence of the Template Layer on the Structure and Ferroelectric Properties of PbZr<sub>0.52</sub>Ti<sub>0.48</sub>O<sub>3</sub> Films (2022)ACS Omega, 7(26), 22210-22220. Lucke, P., Nematollahi, M., Bayraktar, M., Yakshin, A. E., Elshof, J. E. t. & Bijkerk, F.https://doi.org/10.1021/acsomega.2c00815Operating modes and target erosion in high power impulse magnetron sputtering (2022)Journal of vacuum science & technology A: vacuum, surfaces, and films, 40(4). Article 043005. Rudolph, M., Brenning, N., Hajihoseini, H., Raadu, M. A., Fischer, J., Gudmundsson, J. T. & Lundin, D.https://doi.org/10.1116/6.0001919Characterization of Strong Metal-Support Interaction (SMSI) using X-ray Standing Waves (2022)[Contribution to conference › Poster] European Conference on X-ray Spectrometry, EXRS 2022. Tiwari, A., Monai, M., Matveevskii, K., Yakunin, S. N., Ackermann, M., Meirer, F. & Makhotkin, I. A.Sputter yields of monoatomic solids by Ar and Ne ions near the threshold: A Bayesian analysis of the Yamamura Model (2022)Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms, 520, 29-39. Phadke, P., Zameshin, A. A., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1016/j.nimb.2022.03.016LEIS analysis of thin Cu films on Ru: an unexpected result on sputter intermixing (2022)[Contribution to conference › Poster] LEIS Workshop 2022 (Unpublished). Sturm, J. M., van de Kruijs, R. W. E., Phadke, P. & Ackermann, M.Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes (2022)Intermetallics, 144. Article 107531. Shafikov, A., van de Kruijs, R. W. E., Benschop, J. P. H., Schurink, B., van den Beld, W. T. E., Houweling, Z. S., Kooi, B. J., Ahmadi, M., de Graaf, S. & Bijkerk, F.https://doi.org/10.1016/j.intermet.2022.107531Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions (2022)Coatings, 12 (5). Article 685. Schurink, B., van den Beld, W., Tiggelaar, R. M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.3390/coatings12050685Quantifying electron cascade size in various irradiated materials for free-electron laser applications (2022)Journal of synchrotron radiation, 29(2), 323-330. Lipp, V., Milov, I. & Medvedev, N.https://doi.org/10.1107/S1600577522000339Nucleation, growth and hydrogen resistance of multi-layer graphene (2022)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Kizir, S.https://doi.org/10.3990/1.9789036552820Atomic separation in Co/Cu/Co magnetic structures study by hybrid X-ray reflectivity – X-ray standing wave approach (2022)Applied surface science, 574. Article 151573. Kondratev, O. A., Makhotkin, I. A. & Yakunin, S. N.https://doi.org/10.1016/j.apsusc.2021.151573Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Method (2022)Journal of microelectromechanical systems, 31(1), 63-73. Shafikov, A., van de Kruijs, R. W. E., Benschop, J. P. H., van den Beld, W., Houweling, S. & Bijkerk, F.https://doi.org/10.1109/JMEMS.2021.3128760Simulation of LEIS spectra: use of a Monte Carlo code to calculate reionization (2022)[Contribution to conference › Poster] Physics@Veldhoven 2022. Valpreda, A., Zameshin, A., Sturm, J. M., Yakshin, A. & Ackermann, M.Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge (2022)Journal of physics D: applied physics, 55(1). Article 015202. Rudolph, M., Brenning, N., Hajihoseini, H., Raadu, M. A., Minea, T. M., Anders, A., Gudmundsson, J. T. & Lundin, D.https://doi.org/10.1088/1361-6463/ac2968Generation of 2-micrometer wavelength laser-light to drive euv-emitting plasmas (2022)In Mid-Infrared Coherent Sources, MICS 2022. Article JW5A.8 (Optics InfoBase Conference Papers). Optica Publishing Group (formerly OSA). Behnke, L., Mostafa, Y. Y., Schupp, R., Bouza, Z., Lassise, A., Bayraktar, M., Sheil, J., Hoekstra, R., Ubachs, W. & Versolato, O. O.Solid-state-laser driven plasma produced from laser-preformed tin microdroplets for high-brightness EUV (2022)In Compact EUV and X-ray Light Sources, EUVXRAY 2022. Article ETh5A.7 (Optics InfoBase Conference Papers). Optica Publishing Group (formerly OSA). Versolato, O. O., Schupp, R., Behnke, L., Mostafa, Y. Y., Bouza, Z., Lassise, A., Bayraktar, M., Sheil, J., Hoekstra, R. & Ubachs, W.Strategies applied to modify structured and smooth surfaces: A step closer to reduce bacterial adhesion and biofilm formation (2022)Colloids and Interface Science Communications, 46. Article 100560. Uneputty, A., Dávila-Lezama, A., Garibo, D., Oknianska, A., Bogdanchikova, N., Hernández-Sánchez, J. F. & Susarrey-Arce, A.https://doi.org/10.1016/j.colcom.2021.100560
2021
Hydrogen etch resistance of aluminium oxide passivated graphitic layers (2021)Journal of physics D: applied physics, 54(50). Article 505304. Kizir, S., van den Beld, W. T. E., Verbakel, J. D., Pushkarev, R., Houweling, Z. S., van de Kruijs, R. W. E., Benschop, J. P. H. & Bijkerk, F.https://doi.org/10.1088/1361-6463/ac2200Oxidation kinetics of transition metals exposed to molecular and atomic oxygen (2021)Materialia, 20. Article 101203. Stilhano Vilas Boas, C. R., Sturm, J. M., van den Beld, W. T. E. & Bijkerk, F.https://doi.org/10.1016/j.mtla.2021.101203The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5-265.5 nm wavelength range (2021)AIP advances, 11(12). Article 125003. Bouza, Z., Byers, J., Scheers, J., Schupp, R., Mostafa, Y., Behnke, L., Mazzotta, Z., Sheil, J., Ubachs, W., Hoekstra, R., Bayraktar, M. & Versolato, O. O.https://doi.org/10.1063/5.0073839Describing Hysteresis for Non-Switching Fields in Epitaxial Monoclinic PZT Films Using Polarization Rotation Model (2021)[Contribution to conference › Poster] MRS Fall Meeting 2021. Lucke, P., Bayraktar, M., Yakshin, A., Rijnders, A. J. H. M., Bijkerk, F. & Houwman, E. P.PELLICLE FOR EUV LITHOGRAPHY (2021)[Patent › Patent]. Shavikof, A., Bijkerk, F., Schurink, B., Sturm, J. M. & van de Kruijs, R. W. E.Modeling of high power impulse magnetron sputtering discharges with graphite target (2021)Plasma sources science and technology, 30(11). Article 115017. Eliasson, H., Rudolph, M., Brenning, N., Hajihoseini, H., Zanáška, M., Adriaans, M. J., Raadu, M. A., Minea, T. M., Gudmundsson, J. T. & Lundin, D.https://doi.org/10.1088/1361-6595/ac352cEUV optical constants data set (2021)[Dataset Types › Dataset]. Zenodo. Ciesielski, R., Saadeh, Q., Philipsen, V., Opsomer, K., Soulié, J.-P., Wu, M., Naujok, P., van de Kruijs, R. W. E., Detavernier, C., Kolbe, M., Scholze, F. & Soltwisch, V.https://doi.org/10.5281/zenodo.5602719Characterization of strong metal-support interaction using X-ray standing wave technique (2021)[Contribution to conference › Poster] 317th PTB-Seminar on VUV and EUV metrology 2021. Matveevskii, K., Monai, M., Meirer, F., Yakunin, S. N., Ackermann, M. D. & Makhotkin, I. A.Modeling of XUV-induced electron emission in ultrathin semiconductor films (2021)[Contribution to conference › Poster] 317th PTB-Seminar on VUV and EUV metrology 2021. Akhmetov, F., Milov, I., Medvedev, N., Makhotkin, I. A. & Ackermann, M. D.Structural stability and electron‐phonon coupling in two‐dimensional carbon allotropes at high electronic and atomic temperatures (2021)Carbon trends, 5, 1-9. Article 100121. Medvedev, N., Milov, I. & Ziaja, B.https://doi.org/10.1016/j.cartre.2021.100121Describing hysteresis for non-switching fields in epitaxial monoclinic PZT films using polarization rotation model (2021)[Contribution to conference › Poster] E-MRS Fall Meeting 2021. Lucke, P., Bayraktar, M., Yakshin, A., Rijnders, A. J. H. M., Bijkerk, F. & Houwman, E. P.Influence of DC Bias on the Hysteresis, Loss, and Nonlinearity of Epitaxial PbZr0.55 Ti0.45 O3 Films (2021)Advanced electronic materials, 7(8). Article 2100115. Lucke, P., Bayraktar, M., Schukkink, N., Yakshin, A. E., Rijnders, G., Bijkerk, F. & Houwman, E. P.https://doi.org/10.1002/aelm.202100115Dual modulation STM: Simultaneous high-resolution mapping of the differential conductivity and local tunnel barrier height demonstrated on Au(111) (2021)[Working paper › Preprint]. ArXiv.org. Oldenkotte, V. J. S., Witmans, F. J., Siekman, M. H., de Boeij, P. L., Sotthewes, K., Castenmiller, C., Ackermann, M. D., Sturm, J. M. & Zandvliet, H. J. 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2020
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M. & Bijkerk, F.https://doi.org/10.1063/1.5115112Nanoscale piezoelectric surface modulation for adaptive extreme ultraviolet and soft x-ray optics (2019)Optics letters, 44(20), 5104-5107. Nematollahi, M., Lucke, P., Bayraktar, M., Yakshin, A., Rijnders, A. J. H. M. & Bijkerk, F.https://doi.org/10.1364/OL.44.005104Hydrogenation dynamics of Ru capped y thin films (2019)Journal of Applied Physics, 126(14). Article 145301. Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Makhotkin, I. A., Nikolaev, K., Yakunin, S. N., Lee, C. J. & Bijkerk, F.https://doi.org/10.1063/1.5094592Spectral investigation of Sn laser-produced plasmas in the extreme ultraviolet range (2019)[Contribution to conference › Poster] 43rd Annual Meeting NNV AMO 2019. Bouza, Z., Scheers, J., Sheil, J., Schupp, R., Torretti, F., Bayraktar, M., Bijkerk, F., Shah, C., Bekker, H., Crespo Lopez-Urrutia, J., Ubachs, W., Hoekstra, R. & Versolato, O.In-situ studies of silicide formation during growth of molybdenum-silicon interfaces (2019)Journal of Applied Physics, 126(13). Article 135304. Reinink, J., Zameshin, A., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.5092876Increasing the catalytic activity of molybdenum carbide for graphene growth via molybdenum layer properties (2019)[Contribution to conference › Poster] MESA+ Meeting 2019. Kizir, S., van den Beld, W., van de Kruijs, R. W. E., Benschop, J. P. H. & Bijkerk, F.Multiscale modeling of damage processes in Ru thin films induced by femtosecond laser pulses (2019)[Contribution to conference › Poster] MESA+ Meeting 2019. Milov, I., Lipp, V., Ilnitsky, D., Medvedev, N., Migdal, K., Zhakhovsky, V., Khokhlov, V., Petrov, Y., Inogamov, N., Ziaja, B., Medvedev, V., Makhotkin, I. A., Louis, E. & Bijkerk, F.Improving strength of LPCDV Si3N4 freestanding thin films by nanometer thick compressive adlayer (2019)[Contribution to conference › Poster] Nanomechanical testing in materials research and development VII 2019. Shafikov, A., Schurink, B., van de Kruijs, R. W. E. & Bijkerk, F.Characterization of nitrogen doped graphene bilayers synthesized by fast, low temperature microwave plasma-enhanced chemical vapour deposition (2019)Scientific reports, 9. Article 13715. Boas, C. R. S. V., Focassio, B., Marinho Jr., E., G. Larrude, D., Salvadori, M. C., Rocha Leão, C. & dos Santos, D. J.https://doi.org/10.1038/s41598-019-49900-9Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma (2019)Applied physics letters, 115(12). Article 124101. Schupp, R., Torretti, F., Meijer, R. A., Bayraktar, M., Sheil, J., Scheers, J., Kurilovich, D., Bayerle, A., Schafgans, A. A., Purvis, M., Eikema, K. S. E., Witte, S., Ubachs, W., Hoekstra, R. & Versolato, O. O.https://doi.org/10.1063/1.5117504Atomic H diffusion and C etching in multilayer graphene monitored using a y based optical sensor (2019)Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 37(5). Article 051801. Mund, B. K., Soroka, O., Sturm, J. M., van den Beld, W. T. E., Lee, C. J. & Bijkerk, F.https://doi.org/10.1116/1.5110213Low-energy ion polishing of Si in W/Si soft X-ray multilayer structures (2019)Journal of Applied Physics, 126(4). Article 045302. Medvedev, R. V., Nikolaev, K. V., Zameshin, A. A., Ijpes, D., Makhotkin, I. A., Yakunin, S. N., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1063/1.5097378Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography (2019)[Contribution to conference › Poster] XXXIst International Conference on Photonic, Electronic, and Atomic Collisions 2019. Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., Colgan, J., Crespo Lopez-Urrutia, J., Deuzeman, M. J., Hoekstra, R., Kurilovich, D., Poirier, L., Liu, B., Meijer, R., Neukirch, A., Rai, S., Ryabtsev, A., Witte, S., Scheers, J., … Ubachs, W.Efficient Generation of Extreme Ultraviolet Light From Nd: YAG-Driven Microdroplet-Tin Plasma (2019)Physical review applied, 12(1). Article 014010. Schupp, R., Torretti, F., Meijer, R., Bayraktar, M., Scheers, J., Kurilovich, D., Bayerle, A., Eikema, K. S. E., Witte, S., Ubachs, W., Hoekstra, R. & Versolato, O. O.https://doi.org/10.1103/PhysRevApplied.12.014010Multi-dimensional analysis of nano-scale periodic structures using EUV and X-RAY characterization: theoretical concepts and applications (2019)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Nikolaev, K.https://doi.org/10.3990/1.9789036547987Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films (2019)Journal of micro/nanolithography, MEMS, and MOEMS, 18(3). Article 033501. Sturm, J. M., Liu, F., Darlatt, E., Kolbe, M., Aarnink, A. A. I., Lee, C. J. & Bijkerk, F.https://doi.org/10.1117/1.JMM.18.3.033501Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry (2019)Thin solid films, 680, 94-101. Tryus, M., Nikolaev, K. V., Makhotkin, I. A., Schubert, J., Kibkalo, L., Danylyuk, S., Giglia, A., Nicolosi, P. & Juschkin, L.https://doi.org/10.1016/j.tsf.2019.04.037Increasing the catalytic activity of molybdenum carbide for graphene growth via molybdenum layer properties (2019)[Contribution to conference › Poster] 9th Largest European Conference & Exhibition in Graphene and 2D Materials, Graphene 2019. Kizir, S., van den Beld, W., van de Kruijs, R. W. E., Benschop, J. P. H. & Bijkerk, F.EUV full-band spectrum and DUV/EUV ratio dependency on source operating conditions (2019)[Contribution to conference › Poster] 20th ASML Technology Conference 2019. Liu, F., Bayraktar, M., Lim, J.-K., Bijkerk, F., Havermans, P. & Claes, B.Adaptive piezoelectric optics for XUV wavelengths (2019)[Contribution to conference › Poster] 2019 EUVL Workshop. Bayraktar, M., Lucke, P., Nematollahi, M., Yakshin, A., Louis, E., Rijnders, A. J. H. M. & Bijkerk, F.http://www.euvlitho.com/2019/P26.pdfMatrix effect in transition metal oxide formation: neutralization by O 2s levels (2019)[Contribution to conference › Poster] Low Energy Ion Scattering workshop 2019. Stilhano Vilas Boas, C. R., Zameshin, A., Sturm, J. M. & Bijkerk, F.Method, apparatus and computer program for measuring and processing a spectrum of an xuv light source from soft x-rays to infrared wavelengths (2019)[Patent › Patent]. European Patent Office. Bayraktar, M., Bijkerk, F., Bastiaens, H. M. J. & Bruineman, C.Room temperature isotope tracing in transition metal oxides probed by LEIS (2019)[Contribution to conference › Poster] E-MRS Spring Meeting 2019. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Determining the transmission of thin foil filters for soft X-ray free-electron laser radiation: an ablation imprint approach (2019)In Optics Damage and Materials Processing by EUV/X-ray Radiation VII (SPIE conference proceedings; Vol. 11035). Burian, T., Hájková, V., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Schreiber, S., Tiedtke, K., Toleikis, S., Keitel, B., Plönjes, E., Ruiz-Lopez, M. I., Kuhlmann, M., Wodzinski, A., Enkisch, H., Hermann, M., Strobel, S., Loch, R. A., Sobierajski, R., … Chalupský, J.https://doi.org/10.1117/12.2524718Spectral Unraveling of EUV Lithography Light Sources (2019)[Contribution to conference › Poster] Joint ICTP-IAEA School on Atomic and Molecular Spectroscopy in Plasmas. Bouza, Z., Scheers, J., Sheil, J., Schupp, R., Bayraktar, M., Bijkerk, F., Shah, C., Bekker, H., Ubachs, W., Hoekstra, R. & Versolato, O.Lithography for now and the future (2019)Solid-state electronics, 155, 20-26. van de Kerkhof, M. A., Benschop, J. P. H. & Banine, V. Y.https://doi.org/10.1016/j.sse.2019.03.006Surface structure determination by x-ray standing waves at a free-electron laser (2019)New journal of physics, 21(3). Article 033031. Mercurio, G., Makhotkin, I. A., Milov, I., Kim, Y., Zaluzhnyy, I., Dziarzhytski, S., Wenthaus, L., Vartanyants, I. & Wurth, W.https://doi.org/10.1088/1367-2630/aafa47Alternative EUV absorptive materials and novel architectures for EUV reticle in nm node technology scanner (2019)[Thesis › EngD Thesis]. University of Twente. Edrisi, A.Grazing-incidence small-angle X-ray scattering study of correlated lateral density fluctuations in W/Si multilayers (2019)Acta Crystallographica Section A: Foundations and Advances, 75, 342-351. Nikolaev, K. V., Yakunin, S. N., Makhotkin, I. A., de la Rie, J., Medvedev, R. V., Rogachev, A. V., Trunckin, I. N., Vasiliev, A. L., Hendrikx, C. P., Gateshki, M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1107/S2053273318017382Mirror, in particular for a microlithographic projection exposure system (2019)[Patent › Patent]. Wylie-Van Eerd, B., Bijkerk, F., Hild, K., Gruner, T., Schulte, S. & Weyler, S.Oxygen diffusion analysis in transition metal oxides by Low Energy Ion Scattering (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Angular and spectral bandwidth of XUV multilayers near spacer material absorption edges (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Zameshin, A.Comparison of hydrogen transport through thin metal, Si and oxide layers (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Soroka, O., Sturm, J. M. & Bijkerk, F.Comparison of Sputtering of Transition Metals by Reactive Ion Bombardment (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Phadke, P., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.EUV Lithography at Threshold of High-Volume Manufacturing∗ (2019)In 2018 IEEE International Electron Devices Meeting, IEDM 2018 (pp. 11.6.1-11.6.4). Article 8614502 (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 2018-December). IEEE. Yen, A., Meiling, H. & Benschop, J.https://doi.org/10.1109/IEDM.2018.8614502Angular and spectral bandwidth of Extreme UV multilayers near spacer material absorption edges (2019)Journal of nanoscience and nanotechnology, 19(1), 602-608. Zameshin, A., Yakshin, A., Chandrasekaran, A. & Bijkerk, F.https://doi.org/10.1166/jnn.2019.16478Grazing-Incidence La/B-Based Multilayer Mirrors for 6.x nm Wavelength (2019)Journal of nanoscience and nanotechnology, 19(1), 585-592. Kuznetsov, D., Yakshin, A., Sturm, J. M. & Bijkerk, F.https://doi.org/10.1166/jnn.2019.16476
2018
Extreme UV photon and hydrogen radical interaction with graphene and ruthenium surfaces (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Mund, B. K.https://doi.org/10.3990/1.9789036546577Probing atomic scale interface processes using X-rays and ions (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Zameshin, A.https://doi.org/10.3990/1.9789036546508Structure control of La/B multilayer systems by partial nitridation (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Kuznetsov, D. S.https://doi.org/10.3990/1.9789036546546Advancing X-ray standing wave data analysis (2018)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures, PXRNMS2018. Makhotkin, I. A., Yakunin, S. N., Hendrikx, C. P., Chandrasekaran, A., van de Kruijs, R. W. E. & Bijkerk, F.Monitoring EUV and DUV spectral emission ratios of a high power EUVL source (2018)[Contribution to conference › Poster] 2018 Source Workshop. Bayraktar, M., Liu, F., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.https://www.euvlitho.com/2018/S63.pdfDamage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold (2018)Journal of the Optical Society of America. B: Optical physics, 35(11), 2799-2805. Makhotkin, I. A., Milov, I., Chalupský, J., Tiedtke, K., Enkisch, H., de Vries, G., Scholze, F., Siewert, F., Sturm, J. M., Nikolaev, K. V., van de Kruijs, R. W. E., Smithers, M. A., Van Wolferen, H. A. G. M., Keim, E. G., Louis, E., Jacyna, I., Jurek, M., Klinger, D., Pelka, J. B., … Sobierajski, R.https://doi.org/10.1364/JOSAB.35.002799Formation of H2O on a CO2 dosed Ru(0 0 0 1) surface under Extreme Ultraviolet Light and H2 (2018)Applied surface science, 456, 538-544. Mund, B. K., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2018.06.166Control of YH3 formation and stability via hydrogen surface adsorption and desorption (2018)Applied surface science, 455, 70-74. Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2018.05.134Novel EUV mask absorber evaluation in support of next-generation EUV imaging (2018)In Photomask Technology 2018. Article 108100C (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10810). SPIE. Philipsen, V., Luong, K. V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Van De Kruijs, R. W. E., Heidarnia-Fathabad, Z., Scholze, F. & Laubis, C.https://doi.org/10.1117/12.2501799Study of ultrathin Pt/Co/Pt trilayers modified by nanosecond XUV pulses from laser-driven plasma source (2018)Journal of alloys and compounds, 763, 899-908. Jacyna, I., Klinger, D., Pełka, J. B., Minikayev, R., Dłużewski, P., Dynowska, E., Jakubowski, M., Klepka, M. T., Zymierska, D., Bartnik, A., Kurant, Z., Wolska, A., Wawro, A., Sveklo, I., Plaisier, J. R., Eichert, D., Brigidi, F., Makhotkin, I., Maziewski, A. & Sobierajski, R.https://doi.org/10.1016/j.jallcom.2018.05.314Modeling of XUV-induced damage in Ru films: The role of model parameters (2018)Journal of the Optical Society of America. B: Optical physics, 35(10), B43-B53. Milov, I., Lipp, V., Medvedev, N., Makhotkin, I. A., Louis, E. & Bijkerk, F.https://doi.org/10.1364/JOSAB.35.000B43Damage processes in thin Ru films induced by single and multiple ultra-short XUV pulses (2018)[Contribution to conference › Poster] 4th FELs OF EUROPE workshop on FEL Photon Diagnostics, Instrumentation, and Beamline Design, PhotonDiag 2018. Makhotkin, I. A., Milov, I., Sobierajski, R., Medvedev, N., Lipp, V., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnitsky, D., Migdal, K., Inogamov, N., Medvedev, V., Louis, E. & Bijkerk, F.Modelling of damage in Ru thin films induced by femtosecond XUV laser pulses (2018)[Contribution to conference › Poster] 4th FELs OF EUROPE workshop on FEL Photon Diagnostics, Instrumentation, and Beamline Design, PhotonDiag 2018. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., lipp, v., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnisky, D., Migdal, K., Inogamov, N., Medvedev , V. V., Louis, E. & Bijkerk, F.Specular reflection intensity modulated by grazing-incidence diffraction in a wide angular range (2018)Acta Crystallographica Section A: Foundations and Advances, 74(5), 545-552. Nikolaev, K. V., Makhotkin, I. A., Yakunin, S. N., Van De Kruijs, R. W. E., Chuev, M. A. & Bijkerk, F.https://doi.org/10.1107/S2053273318008963In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride (2018)Journal of applied crystallography, 51, 1013-1020. Krause, B., Kuznetsov, D. S., Yakshin, A. E., Ibrahimkutty, S., Baumbach, T. & Bijkerk, F.https://doi.org/10.1107/S1600576718007367Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser (2018)Optics express, 26(15), 19665-19685. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., lipp, v., Chalupsky, J., Sturm, J. M., Tiedtke, K., de Vries, G., Störmer, M., Siewert, F., van de Kruijs, R., Louis, E., Jacyna, I., Jurek, M., Juha, L., Hájková, V., Vozda, V., Burian, T., … Bijkerk, F.https://doi.org/10.1364/OE.26.019665Metal diffusion and chemical processes of mono and bi-layer thin films (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Pachecka, M.https://doi.org/10.3990/1.9789036545686Isotopic labelling study of oxygen diffusion in oxide thin films by low energy ion scattering (2018)[Contribution to conference › Poster] 14th International Conference on Diffusion in Solids and Liquids 2018. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Source plasma emission spectrum under various operating conditions (2018)[Contribution to conference › Poster] 19th ASML Technology Conference 2018. Liu, F., Bayraktar, M., Goossens, T., Bijkerk, F., Quintana Ramirez, J. & Beenhakker, T.Sputter damage by low energy charged particle irradiation (2018)[Contribution to conference › Poster] E-MRS Spring Meeting 2018. Phadke, P., Sturm, M., van de Kruijs, R. & Bijkerk, F.Double matrix effect in Low Energy Ion Scattering from La surfaces (2018)Applied surface science, 440, 570-579. Zameshin, A. A., Yakshin, A. E., Sturm, J. M., Brongerma, H. H. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2018.01.174Self-contained in-vacuum in situ thin film stress measurement tool (2018)Review of scientific instruments, 89(5). Article 053904. Reinink, J., Van De Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.5021790Method, apparatus and computer program for measuring and processing a spectrum of an XUV light source from soft x-rays to infrared wavelengths (2018)[Patent › Patent]. Bijkerk, F., Bayraktar, M., Bastiaens, H. M. J. & Bruineman, C.https://nl.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=0&ND=3&adjacent=true&locale=nl_NL&FT=D&date=20180523&CC=NL&NR=2017729B1&KC=B1#Hydrogen induced blister formation in Mo/Si multilayer structures (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. van den Bos, R. A. J. M.https://doi.org/10.3990/1.9789036545143Plasma-assisted oxide removal from ruthenium-coated EUV optics (2018)Journal of Applied Physics, 123(15). Article 153301. Dolgov, A., Lee, C. J., Bijkerk, F., Abrikosov, A., Krivtsun, V. M., Lopaev, D., Yakushev, O. & van Kampen, M.https://doi.org/10.1063/1.5006771Plasma-assisted cleaning of extreme UV optics (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Dolgov, A. A.https://doi.org/10.3990/1.9789036545068Electrofusion of single cells in picoliter droplets (2018)Scientific reports, 8. Article 3714. Schoeman, R. M., Van Den Beld, W. T. E., Kemna, E. W. M., Wolbers, F., Eijkel, J. C. T. & Van Den Berg, A.https://doi.org/10.1038/s41598-018-21993-8Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers (2018)Journal of physics D: applied physics, 51(11). Article 115302. van den Bos, R. A. J. M., Reinink, J., Lopaev, D. V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F.https://doi.org/10.1088/1361-6463/aaad86Broadband spectrometer development based on high-density free-standing transmission gratings (2018)[Contribution to conference › Poster] ASML Networking Event 2018. Bayraktar, M., Liu, F., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.Comprehensive studies of single-shot damage of Ru thin films induced by EUV FEL fs pulses (2018)[Contribution to conference › Poster] DESY Photon Science Users' Meeting 2018. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., Lipp, V., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnitsky, D., Migdal, K., Inogamov, N., Medvedev, V., Louis, E. & Bijkerk, F.Comprehensive studies of single-shot damage of Ru thin films induced by EUV FEL fs pulses (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., Lipp, V., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnitsky, D., Migdal, K., Inogamov, N., Medvedev, V., Louis, E. & Bijkerk, F.Oxygen diffusion characterization in ultrathin films by low energy ion scattering (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light (2018)Applied surface science, 427(Part B), 1033-1040. Mund, B. K., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2017.09.098Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold (2018)Journal of synchrotron radiation, 25(1), 77-84. Makhotkin, I. A., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Störmer, M., Scholze, F., Siewert, F., van de Kruijs, R. W. E., Milov, I., Louis, E., Jacyna, I., Jurek, M., Klinger, D., Nittler, L., Syryanyy, Y., Juha, L., Hájková, V., Vozda, V., … Enkisch, H.https://doi.org/10.1107/S1600577517017362Formation of H2O on the surface of CO2 dosed Ru(0001) under Extreme Ultraviolet Light and H2 (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Mund, B. K., Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Hydrogen diffusion measurements using Y thin film monitoring (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Soroka, O., Sturm, J. M., Lee, C. J. & Bijkerk, F.Tip-Induced Domain Growth, Dynamics and Conductivity in Tetragonal, Rhombohedral and Mixed Phase Epitaxial BFO Thin Films (2018)[Contribution to conference › Poster] MRS Spring Meeting 2018. Mohandas Moolayil, S. M. & Ramadurai, R.
2017
Broadband spectrometer development based on high-density free-standing transmission gratings (2017)[Contribution to conference › Poster] 304. PTB-Seminar VUV and EUV Metrology. Bayraktar, M., Liu, F., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.High Reflectance Nanoscale V/Sc Multilayer for Soft X-ray Water Window Region (2017)Scientific reports, 7(1). Article 12929. Huang, Q., Yi, Q., Cao, Z., Qi, R., Loch, R. A., Jonnard, P., Wu, M., Giglia, A., Li, W., Louis, E., Bijkerk, F., Zhang, Z. & Wang, Z.https://doi.org/10.1038/s41598-017-13222-5In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering (2017)In In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering. Sturm, M., Coloma Ribera, R., van de Kruijs, R., Yakshin, A. & Bijkerk, F.Passive pumping for the parallel trapping of single neurons onto a microsieve electrode array (2017)Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 35(6). Article 06GA01. Frimat, J. P., Schurink, B. & Luttge, R.https://doi.org/10.1116/1.4991827Interface study of Mo/Si systems using LEIS and in-situ stress analysis (2017)[Contribution to conference › Poster] 304. PTB-Seminar VUV and EUV Metrology. Reinink, J., van de Kruijs, R. W. E. & Bijkerk, F.Metal diffusion properties of ultra-thin high-k Sc2O3 films (2017)AIP advances, 7(10). Article 105324. Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F.https://doi.org/10.1063/1.5000030Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers (2017)Journal of micro/nanolithography, MEMS, and MOEMS, 16(4). Article 041002. Philipsen, V., Luong, K. V., Souriau, L., Erdmann, A., Xu, D., Evanschitzky, P., Van De Kruijs, R. W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S., Reuter, C. & Hendrickx, E.https://doi.org/10.1117/1.JMM.16.4.041002Thermal stability of high-reflectance La/B-based multilayers for 6.x nm wavelength (2017)Journal of Applied Physics, 122(12). Article 125302. Kuznetsov, D. S., Yakshin, A. E., Sturm, J. M. & Bijkerk, F.https://doi.org/10.1063/1.5004128Tin etching from metallic and oxidized scandium thin films (2017)AIP advances, 7(8). Article 085107. Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F.https://doi.org/10.1063/1.4991686Adaptive mirrors - upcoming powerful technologies for wavefront correction (2017)[Contribution to conference › Poster] 18th ASML Technology Conference 2017. Pollak, T., Finken, R., Hild, K., Wylie- Van Eerd, B., Jurgens, D. & Spengler, D.Smart multilayer interactive optics for lithography at extreme UV wavelengths (2017)[Thesis › EngD Thesis]. University of Twente. Antonov, O.Blister formation in Mo/Si multilayered structures induced by hydrogen ions (2017)Journal of physics D: applied physics, 50(26). Article 265302. van den Bos, R. A. J. M., Lee, C. J., Benschop, J. P. H. & Bijkerk, F.https://doi.org/10.1088/1361-6463/aa7323Characterization of self-assembled monolayers on a ruthenium surface (2017)Langmuir, 33(25), 6419-6429. Shaheen, A., Sturm, J. M., Ricciardi, R., Huskens, J., Lee, C. J. & Bijkerk, F.https://doi.org/10.1021/acs.langmuir.7b01068Crystal surface characterization (2017)[Contribution to conference › Poster] Symposium on Analytical techniques for precise characterization of nano materials, ALTECH 2017. Nikolaev, K., Makhotkin, I., Yakunin, S., van de Kruijs, R. & Bijkerk, F.Oxygen diffusion characterization by depth-resolved low energy ion spectroscopy (2017)[Contribution to conference › Poster] LEIS Workshop 2017. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.EUV source spectroscopic measurement (2017)[Contribution to conference › Poster] 18th ASML Technology Conference 2017. Liu, F., Bayraktar, M., Frijns, O., Bijkerk, F., Goossens, T. & Rommers, J.Ion-Selective Ionic Polymer Metal Composite (IPMC) Actuator Based on Crown Ether Containing Sulfonated Poly(Arylene Ether Ketone) (2017)Macromolecular materials and engineering, 302(4). Article 1600381. Tas, S., Zoetebier, B., Sardan Sukas, Ö., Bayraktar, M., Hempenius, M., Vancso, G. J. & Nijmeijer, K.https://doi.org/10.1002/mame.201600381Adsorption and Dissociation of CO2 on Ru (0001) (2017)Journal of physical chemistry, 6729-6735. Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1021/acs.jpcc.7b00021In-situ Raman spectroscopy to elucidate the influence of adsorption in graphene electrochemistry (2017)Scientific reports, 7. Article 45080. van den Beld, W. T. E., Odijk, M., Vervuurt, R. H. J., Weber, J.-W., Bol, A. A., van den Berg, A. & Eijkel, J. C. T.https://doi.org/10.1038/srep45080Reducing EUV mask 3D effects by alternative metal absorbers (2017)In Extreme Ultraviolet (EUV) Lithography VIII. Article 1014310. SPIE. Philipsen, V., Luong, K. V., Souriau, L., Hendrickx, E., Erdmann, A., Xu, D., Evanschitzky, P., Van De Kruijs, R. W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S. & Reuter, C.https://doi.org/10.1117/12.2257929Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics (2017)Applied physics reviews, 4(1). Article 011104. Huang, Q., Medvedev, V., van de Kruijs, R. W. E., Yakshin, A., Louis, E. & Bijkerk, F.https://doi.org/10.1063/1.4978290Numerical simulations based on probe measurements in EUV-induced hydrogen plasma (2017)Plasma sources science and technology, 26(4). Article 045011. Abrikosov, A., Reshetnyak, V., Astakhov, D., Dolgov, A., Yakushev, O., Lopaev, D. & Krivtsun, V.https://doi.org/10.1088/1361-6595/aa5fe8Growth and thermal oxidation of Ru and ZrO2 thin films as oxidation protective layers (2017)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Coloma Ribera, R.https://doi.org/10.3990/1.9789036543101X-ray standing wave experiments at FLASH (2017)[Contribution to conference › Poster] DESY Photon Science Users' meeting. Mercurio, G., Makhotkin, I. A., Milov, I., Kim, Y., Zaluzhnyy, I., Dziarzhytski, S., Wenthaus, L., Vartanyants, I. & Wurth, W.Narrowband and tunable anomalous transmission filters for special monitoring in the extreme ultraviolet wavelength region (2017)Optics express, 25(3), 1993-2008. Barreaux, J. L. P., Kozhevnikov, I. V., Bayraktar, M., van de Kruijs, R. W. E., Bastiaens, H. M. J., Bijkerk, F. & Boller, K.-J.https://doi.org/10.1364/OE.25.001993Two-octave spanning supercontinuum generation in stoichiometric silicon nitride waveguides pumped at telecom wavelengths (2017)Optics express, 25(2), 1542-1554. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Heideman, R. G., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K.-J.https://doi.org/10.1364/OE.25.001542A model for hydrogen induced blister growth in Mo/Si multilayer mirror structures (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. van den Bos, R., Benschop, J., Bijkerk, F. & Lee, C. J.Advanced crystal surface characterization with asymmetrical X-ray diffraction (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Nikolaev, K., Yakunin, S. N., Makhotkin, I. A., van de Kruijs, R. W. E. & Bijkerk, F.Anomalous transmission filters for spectral monitoring in the extreme ultraviolet wavelength region (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Barreaux, J. L. P., Kozhevnikov, I. V., Bayraktar, M., van de Kruijs, R. W. E., Bastiaens, H. M. J., Bijkerk, F. & Boller, K. J.Grazing-incidence La/B-based mirrors with “La surface nitridation” for 6.x nm wavelength (2017)[Contribution to conference › Poster] Physics. Kuznetsov, D., Yakshin, A., Sturm, J. M., van de Kruijs, R. W. E., Louis, E. & Bijkerk, F.In-vacuo growth studies and thermal oxidation of ZrO2 thin films (2017)[Contribution to conference › Abstract] Physics@Veldhoven 2017. Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.In-vacuo growth studies and thermal oxidation of ZrO2 thin films (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Milov, I., Makhotkin, I., Semin, S., Lee, C., Louis, E., Kimel, A. & Bijkerk, F.Small period multilayer structures for X-ray spectroscopic applications (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Medvedev, R., Yakshin, A. & Bijkerk, F.Visible to mid-infrared supercontinuum generation in disperion engineered stoichiometric silicon nitride waveguides drive by 120-fs, 1560-nm laser pulses (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Heideman, R., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J.Visible to mid-infrared supercontinuum generation in dispersion engineered stoichiometric silicon nitride waveguides driven by 120-fs, 1560-nm laser pulses (2017)[Contribution to conference › Poster] Physics@Veldhoven 2017. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hoekman, M., Heideman, R., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J.Accelerated ageing of molybdenum oxide (2017)Materials Research Express, 4(11), 115502. Jorge, M., Cooil, S., Edmonds, M. T., Thomsen, L., Nematollahi, M., Mazzola, F. & Wells, J. W.https://doi.org/10.1088/2053-1591/aa9287Coexistence of ice clusters and liquid-like water clusters on the Ru(0001) surface (2017)Physical chemistry chemical physics, 19(12), 8288-8299. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1039/C6CP07369GDetection of defect populations in superconductor boron subphosphide B12P2 through X-ray absorption spectroscopy (2017)Journal of Materials Chemistry A, 5(12), 5737-5749. Huber, S., Gullikson, E., Meyer-Ilse, J., Frye, C. D., Edgar, J. H., van de Kruijs, R. W. E., Bijkerk, F. & Prendergast, D.https://doi.org/10.1039/C6TA10935GDetermining crystal phase purity in c-BP through X-ray absorption spectroscopy (2017)Physical chemistry chemical physics, 19(12), 8174-8187. Huber, S., Medvedev, V., Gullikson, E., Padavala, B., Edgar, J. H., van de Kruijs, R. W. E., Bijkerk, F. & Prendergast, D.https://doi.org/10.1039/c6cp06967cIntermixing and thermal oxidation of ZrO2 thin films grown on a-Si, SiN, and SiO2 by metallic and oxidic mode magnetron sputtering (2017)Journal of Applied Physics, 121(11). Article 115303. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, M., Yakshin, A. & Bijkerk, F.https://doi.org/10.1063/1.4978367Pellicle films supporting the ramp to HVM with EUV (2017)In Photomask Technology 2017. Article 104510O (Proceedings of SPIE; Vol. 10451). SPIE. van Zwol, P. J., Nasalevich, M., Voorthuijzen, W. P., Kurganova, E., Notenboom, A., Vles, D. F., Peter, M., Symens, W., Giesbers, A. J. M., Klootwijk, J. H., van de Kruijs , R. W. E. & van der Zande, W. J.https://doi.org/10.1117/12.2280560Template Assisted Strain Tuning and Phase Stabilization in Epitaxial BiFeO3 Thin Films (2017)[Contribution to conference › Poster] 62nd DAE Solid State Physics Symposium 2017. Mohandas Moolayil, S. M. & Ramadurai, R.Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates (2017)Scientific reports, 7. Article 251. Chopra, A., Bayraktar, M., Nijland, M., ten Elshof, J. E., Bijkerk, F. & Rijnders, A. J. H. M.https://doi.org/10.1038/s41598-017-00333-2
2016
EUV-mirror, optical system with EUV-mirror and associated operating method (2016)[Patent › Patent] (Submitted). Dinger, U., Bijkerk, F., Bayraktar, M. & Dier, O.https://worldwide.espacenet.com/publicationDetails/biblio?II=0&ND=3&adjacent=true&locale=en_EP&FT=D&date=20161229&CC=US&NR=2016379730A1&KC=A1#On-chip broadband supercontinuum generation at telecom wavelengths using silicon nitride waveguides (2016)[Contribution to conference › Poster] International MicroNanoConference, iMNC 2016. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J.In-vacuo growth studies of ZrO2 thin films (2016)[Contribution to conference › Poster] International Symposium on Reactive Sputter Deposition 2016 (RSD 2016). Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.Self-healing in B12P2 through mediated defect recombination (2016)Chemistry of materials, 28(22), 8415-8428. Huber, S. P., Gullikson, E., Frye, C. D., Edgar, J. H., van de Kruijs, R. W. E., Bijkerk, F. & Prendergast, D.https://doi.org/10.1021/acs.chemmater.6b04075In-house X-ray Standing Wave study of LaN/B multilayer mirrors (2016)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures workshop 2016. Hendrikx, C. P., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E. & Bijkerk, F.In-vacuo growth studies and thermal oxidation of ZrO2 thin films (2016)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures workshop 2016. Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses (2016)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures workshop 2016. Milov, I., Makhotkin, I. A., Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Scholze, F., Siewert, F., Störmer, M., van de Kruijs, R. W. E., Keim, R., van Wolferen, H. A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., … Bijkerk, F.Single-shot damage of Ru thin film induced by FEL fs pulses (2016)[Contribution to conference › Poster] LEELIS-II workshop 2016 (Low-energy electrons: Lithography, Imaging, and Soft Matter). Milov, I., Makhotkin, I. A., Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Scholze, F., Siewert, F., Störmer, M., van de Kruijs, R. W. E., Keim, E. G., van Wolferen, H. A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., … Bijkerk, F.Transmission grating spectrometer for broadband characterization of EUV sources (2016)[Contribution to conference › Poster] 2016 International Workshop on EUV and Soft X-Ray Sources. Bayraktar, M., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.Reflectivity tuning through controlled hydrogenation (2016)[Patent › Patent] (Submitted). Lee, C. J. & Bijkerk, F.Illuminating the structure of borides through X-ray absorption spectroscopy (2016)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Huber, S.https://doi.org/10.3990/1.9789036541824Compact Anomalous Transmission Filters for EUV Spectral Monitoring (2016)[Contribution to conference › Poster] 40th Annual Meeting NNV AMO Lunteren 2016. Barreaux, J. L. P., Kozhevnikov, I. V., Bayraktar, M., van de Kruijs, R. W. E., Bastiaens, H. M. J., Bijkerk, F. & Boller, K. J.Two-octave spanning on-chip supercontinuum generation at telecom wavelengths using silicon nitride waveguides (2016)[Contribution to conference › Poster] 40th Annual Meeting NNV AMO Lunteren 2016. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J.EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror (2016)[Patent › Patent] (Submitted). Huang, Q., Louis, E., Bijkerk, F., de Boer, M. J. & von Blanckenhagen, G.https://worldwide.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=0&ND=3&adjacent=true&locale=en_EP&FT=D&date=20160818&CC=WO&NR=2016128029A1&KC=A1#Electronegativity-dependent tin etching from thin films (2016)AIP advances, 6(7). Article 075222. Pachecka, M., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J. & Bijkerk, F.https://doi.org/10.1063/1.4960429Study of crystal surface with asymmetrical X-Ray diffraction (2016)[Contribution to conference › Poster] 14th International Conference on Surface X-ray and Neutron Scattering, SXNS 2016. Nikolaev, K., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E. & Bijkerk, F.Role of heat accumulation in the multi-shot damage of silicon irradiated with femtosecond XUV pulses at a 1 Mhz repetition rate (2016)Optics express, 24(14), 15468-15477. Sobierajski, R., Jacyna, I., Dluzewski, P., Klepka, M., Klinger, D., Pelka, J. B., Burian, T., Hajkova, V., Juha, L., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Faatz, B., Tiedtke, K., Toleikis, S., Enkisch, H., Hermann, M., Strobel, S., … Chalupsky, J.https://doi.org/10.1364/OE.24.015468Experimental Demonstration of Multilayer Anomalous-Transmission Filters for Narrow-Band Transmission at 13.5 nm (2016)[Contribution to conference › Poster] Nano City. Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J.Flying Circus Spectrometer for characterization of EUV light sources from UV to soft x-ray wavelengths (2016)[Contribution to conference › Poster] NanoCity 2016. Bayraktar, M., Bruineman, C., Vratzov, B., Bastiaens, H. M. J. & Bijkerk, F.Ultra-broadband Supercontinuum Generation at Telecommunication Wavelengths in Dispersion Engineered Stoichiometric Si3N4 Waveguides (2016)In CLEO: Applications and Technology, CLEO AT 2016. Article AM3J.5 (Optics InfoBase Conference Papers). Optica Publishing Group (formerly OSA). Schepers, F., Garcia Porcel, M. A., Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Boller, K.-J. & Fallnich, C.https://doi.org/10.1364/CLEO_AT.2016.AM3J.5Research in the Industrial Focus Group XUV Optics (2016)[Other contribution › Other contribution]. Sturm, J. M. & Bijkerk, F.Numerical study of extreme-ultra-violet generated plasmas in hydrogen (2016)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Astakhov, D.https://doi.org/10.3990/1.9789036541114Spectroscopic ellipsometry for H diffusion (2016)[Contribution to conference › Poster] SPIE Photonics Europe 2016. Soroka, O., Jose, A. A., van de Kruijs, R. W. E., Bijkerk, F. & Lee, C. J.Influence of the surface oxide content of a boron capping layer on UV photodetector performance (2016)In 2015 9th International Conference on Sensing Technology, ICST 2015 (pp. 656-660). Article 7438479. IEEE. Mohammadi, V., Van De Kruijs, R. W. E., Rao, P. R., Sturm, J. M. & Nihtianov, S.https://doi.org/10.1109/ICSensT.2015.7438479Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage (2016)[Patent › Patent] (Submitted). Medvedev, V., Yakshin, A. & Bijkerk, F.http://www.freepatentsonline.com/DE102015204631.htmlKombinierter Reflektor und Filter für Licht underschiedlicher Wellenlängen (2016)[Patent › Patent] (Submitted). Medvedev, V., Yakshin, A., Krivtsun, V. M. & Bijkerk, F.Spectral control of high-harmonic generation via drive laser pulse shaping in a wide-diameter capillary (2016)Optics express, 24(2), 1604-1605. Goh, S. J., Reinink, J., Tao, Y., van der Slot, P. J. M., Bastiaens, H. M. J., Herek, J. L., Biedron, S. G., Milton, S. V. & Boller, K. J.https://doi.org/10.1364/OE.24.001604Wavefront correction at Angstom length scales (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Wylie- Van Eerd, B., Bayraktar, M., Chopra, A. R., Krijnen, B., Rijnders, A. J. H. M. & Bijkerk, F.Elastic modulus of extreme ultraviolet exposed single layer graphene (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F.Growth kinetics of Ru on Si, SiN and SiO2 studied by in-vacuo low energy ion scattering (LEIS) (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, J. M., Yakshin, A. & Bijkerk, F.Hydrogen induced blister formation in multilayer mirror structures (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Insitu stress measurement of thin film and multilayer growth (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Reinink, J., van de Kruijs, R. W. E. & Bijkerk, F.Low Energy Ion Scattering from La surfaces (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Zameshin, A., Yakshin, A., Sturm, M., Brongersma, H. H. & Bijkerk, F.Ultra-wideband supercontinuum generation in Si3N4-based waveguides (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. van der Slot, P. J. M., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., Mateman, R., van Rees, A., Lee, C. J., Fallnich, C. & Boller, K. J.A model for pressurized hydrogen induced thin film blisters (2016)Journal of Applied Physics, 120(23), 235304-. Article 235304. van den Bos, R. A. J. M., Reshetniak, V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F.https://doi.org/10.1063/1.4972221Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources (2016)NEVAC blad, 54(1), 14-19. Bayraktar, M., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.https://nevac.nl/archief_pdf/pdf_62.pdfExploiting the P L2,3 absorption edge for optics: spectroscopic and structural characterization of cubic boron phosphide thin films (2016)Optical materials express, 6(12), 3946-3959. Article 12. Huber, S., Medvedev, V., Meyer-Ilse, J., Gullikson, E., Padavala, B., Edgar, J. H., Sturm, J. M., van de Kruijs, R. W. E., Prendergast, D. & Bijkerk, F.https://doi.org/10.1364/ome.6.003946Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen (2016)Journal of physics D: applied physics, 49(29). Article 295204. Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Koshelev, K. N., Lopaev, D. V., van der Horst, R. M., Beckers, J., Osorio, E. A. & Bijkerk, F.https://doi.org/10.1088/0022-3727/49/29/295204Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen (2016)Journal of physics D: applied physics, 49(14). Article 145203. van der Horst, R. M., Beckers, J., Osorio, E. A., Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsum, V. M., Koshelev, K. N. & Lopaev, D. V.https://doi.org/10.1088/0022-3727/49/14/145203Extreme UV induced dissociation of amorphous solid water and crystalline water bilayers on Ru(0001) (2016)Surface science, 646, 101-107. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.susc.2015.09.009Highly efficient blazed grating with multilayer coating for tender X-ray energies (2016)Optics express, 24(12), 13220-13230. Senf, F., Bijkerk, F., Eggenstein, F., Gwalt, G., Huang, Q., van de Kruijs, R. W. E., Kutz, O., Lemke, S., Louis, E., Mertin, M., Packe, I., Rudolph, I., Schafers, F., Siewert, F., Sokolov, A., Sturm, J. M., Waberski, C., Wang, Z., Wolf, J., … Erko, A.https://doi.org/10.1364/OE.24.013220In depth study of molybdenum silicon compound formation at buried interfaces (2016)Journal of Applied Physics, 120(11). Article 115303. Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1063/1.4962541In vacuo growth studies of Ru thin films on Si, SiN, and SiO2 by high-sensitivity low energy ion scattering (2016)Journal of Applied Physics, 120(6). Article 065303. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, J. M., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1063/1.4960577In-situ study of the YH2-YH3+x transition during hydrogenation by GI-DAFS and HAXPEX (2016)[Book/Report › Report]. Universiteit Twente, XUV Optics. Makhotkin, I. A., Soroka, O., Yakunin, S. N., Nikolaev, K., Hendrikx, S. P. & Lee, C. J.Numerical and experimental studies of the carbon etching in EUV-induced plasma (2016)[Working paper › Working paper]. ArXiv.org. Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Yakushev, O., Koshelev, K. N., Lopaev, D. V. & Bijkerk, F.https://doi.org/10.48550/arXiv.1507.02705Oxygen-stabilized triangular defects in hexagonal boron nitride (2016)Physical review B: Condensed matter and materials physics, 92(245310), 1-7. Article 245310. Huber, S., Gullikson, E., van de Kruijs, R. W. E., Bijkerk, F. & Prendergast, D.https://doi.org/10.1103/PhysRevB.92.245310Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts (2016)[Contribution to conference › Abstract] SPIE Advanced Lithography 2015. Bayraktar, M., Chopra, A., Rijnders, A. J. H. M., Boller, K. J. & Bijkerk, F.Polarization recovery in lead zirconate titanate thin films deposited on nanosheets-buffered Si (001) (2016)AIP advances, 6(125209). Article 125209. Chopra, A., Bayraktar, M., Nijland, M., ten Elshof, J. E., Bijkerk, F. & Rijnders, A. J. H. M.https://doi.org/10.1063/1.4971373Recommended reading list of early publications on atomic layer deposition-outcome of the "virtual project on the history of ALD" (2016)Journal of vacuum science & technology A: vacuum, surfaces, and films, 35(1). Article 010801. Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., … Yurkevich, O.https://doi.org/10.1116/1.4971389Reconstruction of interfaces of periodic multilayers from X-ray reflectivity using a free-form approach (2016)Journal of applied crystallography, 49(4), 1300-1307. Zameshin, A., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1107/S160057671601044XStructure of high-reflectance La/B-based multilayer mirrors with partial La nitridation (2016)AIP advances, 6. Article 115117. Kuznetsov, D., Yakshin, A., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.4968175Versailles Project on Advanced Materials and Standards Interlaboratory Study on Measuring the Thickness and Chemistry of Nanoparticle Coatings Using XPS and LEIS (2016)The Journal of physical chemistry C, 120(42), 24070-24079. Belsey, N. A., Cant, D. J. H., Minelli, C., Araujo, J. R., Bock, B., Brüner, P., Castner, D. G., Ceccone, C., Counsell, J. D. P., Dietrich, P. M., Engelhard, M. H., Fearn, S., Galhardo, C. E., Kalbe, H., Kim, J. W., Lartundo-Rojas, L., Luftman, H. S., Nunney, T. S., Pseiner, J., … Shard, A. G.https://doi.org/10.1021/acs.jpcc.6b06713
2015
Emissivity of freestanding membranes with thin metal coatings (2015)Journal of Applied Physics, 118(21). Article 213107 (E-pub ahead of print/First online). van Zwol, P. J., Vles, D. F., Voorthuijzen, W. P., Péter, M., Vermeulen, H., Zande, W. J., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.4936851EUV induced secondary electron emission on HfO2, SnO2 and Ru thin films (2015)[Contribution to conference › Poster] PTB workshop Metrology. Liu, F., Sturm, J. M., Darlatt, E., Kolbe, M., Bijkerk, F. & Lee, C. J.Tailoring spectral properties of Extreme UV multilayer optics (2015)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Medvedev, V. V.https://doi.org/10.3990/1.6051304Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source (2015)Applied surface science, 353, 708-713. Dolgov, A., Lopaev, D., Lee, C. J., Zoethout, E., Medvedev, V., Yakushev, O. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2015.06.079Analysis of extreme ultraviolet induced surface defect processes (2015)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Gao, A.https://doi.org/10.3990/1.9789036539852A wide band transmission mode spectrometer for diagnosis of EUV sources (2015)[Contribution to conference › Poster] 2015 International Symposium on Extreme Ultraviolet Lithography. Barreaux, J. L. P., Bayraktar, M., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.Controlling interface chemistry in 6.x nm La/B multilayer optics (2015)[Contribution to conference › Poster] 2015 International Symposium on Extreme Ultraviolet Lithography. Kuznetsov, D., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A., Louis, E. & Bijkerk, F.Narrow-band, 13.5 nm Zr-coated Ni/Si multilayer Borrmann filter (2015)[Contribution to conference › Paper] NanoCity 2015. Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J.Accurate determination of oxygen diffusion kinetics for thin film ruthenium oxidation (2015)[Contribution to conference › Poster] X-Ray Metrology Workshop 2015. Coloma Ribera, R.GISAXS analysis of “delayed nitridation” 6.x nm multilayers (2015)[Contribution to conference › Poster] X-Ray Metrology Workshop 2015. Kuznetsov, D., Yakshin, A., Makhotkin, I. A., Bijkerk, F., Mukharamova, N., Yakunin, S. N. & Subbotin, I. A.https://www.utwente.nl/mesaplus/xuv/xrayworkshop/Plasma probe characteristics in low density hydrogen pulsed plasmas (2015)Plasma sources science and technology, 24(5). Article 055018. Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Zotovich, A. I., Zyryanov, S. M., Lopaev, D. & Bijkerk, F.https://doi.org/10.1088/0963-0252/24/5/055018Elastic modulus of Extreme Ultraviolet exposed single-layer graphene (2015)[Contribution to conference › Poster] MESA+ Meeting 2015. Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://www.utwente.nl/mesaplus/meeting/Electronegativity-dependent removal of tin from different surfact materials (2015)[Contribution to conference › Poster] MESA+ Meeting 2015. Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Translating the Borrmann effect into narrow-band EUV transmission windows (2015)[Contribution to conference › Poster] MESA+ Meeting 2015. Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J.Elastic modulus of Extreme Ultraviolet exposed single-layer graphene (2015)[Contribution to conference › Poster] Ameland Workshop 2015. Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F.http://www.rug.nl/research/zernike/news/otherevents/ameland2015/Electronegativity-dependent removal of tin from different surface materials (2015)[Contribution to conference › Poster] Ameland PhD students Workshop 2015, Structure/Function relationships in Materials. Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Blister mechanism in extreme ultraviolet multilayer mirrors (2015)[Contribution to conference › Poster] 31st European Conference on Surface Science, ECOSS 2015. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Controlled growth of PbZr0.52Ti0.48O3 using nanosheet coated Si (001) (2015)Thin solid films, 589, 13-16. Chopra, A., Bayraktar, M., Bijkerk, F. & Rijnders, G.https://doi.org/10.1016/j.tsf.2015.04.039Elastic modulus of Extreme Ultraviolet exposed single-layer graphene (2015)[Contribution to conference › Poster] 31st European Conference on Surface Science, ECOSS 2015. Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F.http://ecoss2015.org/Electronegativity-dependent removal of tin from different surface materials (2015)[Contribution to conference › Poster] 31st European Conference on Surface Science, ECOSS 2015. Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Determination of oxygen diffusion kinetics during thin film ruthenium oxidation (2015)Journal of Applied Physics, 118(5). Article 055303. Coloma Ribera, R., van de Kruijs, R. W. E., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1063/1.4928295High-reflectance La/B-based multilayer mirror for 6.x nm wavelength (2015)Optics letters, 40(16), 3378-3781. Kuznetsov, D. S., Yakshin, A. E., Sturm, J. M., van de Kruijs, R. W. E., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OL.40.003778Surface oxide content examination of capping boron layers in UV photodetectors (2015)In 73rd Annual Device Research Conference, DRC 2015 (pp. 73-74). Article 7175562. IEEE. Mohammadi, V., Rao, P. R., Van De Kruijs, R. W. E. & Nihtianov, S.https://doi.org/10.1109/DRC.2015.7175562PEALD AlN: Controlling growth and film crystallinity (2015)Physica Status Solidi. C: Current Topics in Solid State Physics, 12(7), 1036-1042. Banerjee, S., Aarnink, A. A. I., van de Kruijs, R., Kovalgin, A. Y. & Schmitz, J.https://doi.org/10.1002/pssc.201510039Simultaneous supercontinuum and third harmonic generation in Si3N4 waveguides (2015)[Contribution to conference › Abstract] European Conference on Lasers and Electro-Optics, CLEO/EUROPE-EQEC 2015. Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., Van Der Slot, P. J. M., Lee, C. J., Fallnich, C., Boller, K. J. & van Rees, A.https://www.osapublishing.org/abstract.cfm?uri=CLEO_Europe-2015-CK_5_4Phosphorus-based compounds for EUV multilayer optics materials (2015)Optical materials express, 5(6), 1450-1459 (E-pub ahead of print/First online). Medvedev, V. V., Yakshin, A. E., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1364/OME.5.001450Characterization of nanoscale multilayer structures upon thermal annealing (2015)Proceedings of SPIE - the international society for optical engineering, 9510(95100V). Article 95100V. Makhotkin, I. A., Zameshin, A., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1117/12.2182256Co-existence of 2D and 3D growth in thermally oxidized ruthenium thin films (2015)[Contribution to conference › Poster] E-MRS Spring Meeting 2015. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, J. M., Yakshin, A. & Bijkerk, F.Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes (2015)Plasma sources science and technology, 24(3). Article 035003. Dolgov, A., Yakushev, O., Abrikosov, A., Snegirev, E., Krivtsun, V. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1088/0963-0252/24/3/035003Multi-layered structure for an EUV Mirror (2015)[Patent › Patent] (Submitted). Medvedev, V., Yakshin, A., Krivtsun, V. M. & Bijkerk, F.EUV induced surface chemistry of water on clean and p(2x1) O covered Ru(0001): a RAIRS and TPD study (2015)[Contribution to conference › Poster] ISSC 20 Conference. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Hydrogen induced blisters on extreme ultraviolet multilayer mirror surfaces (2015)[Contribution to conference › Poster] 27th NNV-Symposium Plasma Physics & Radiation Technology 2015. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Adaptive multilayer optics for extreme ultraviolet wavelengths (2015)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Bayraktar, M.https://doi.org/10.3990/1.9789036538459High confinement, high yield Si3N4 waveguides for nonlinear optical applications (2015)Optics express, 23(2), 642-648. Epping, J. P., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van Rees, A., van der Slot, P. J. M., Lee, C. J. & Boller, K.-J.https://doi.org/10.1364/OE.23.000642Ab-initio simulated X-ray Absorption Spectroscopy of hexagonal Boron Nitride (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. Huber, S., van de Kruijs, R. W. E., Bijkerk, F., Gullikson, E. M. & Prendergast, D.Electonegativity-dependent cleaning of tin from different surface materials (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Electron density profile determination for multilayers (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. Zameshin, A., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.EUV collector design for spectral purification and infrared light recycling (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. Bayraktar, M., van Goor, F. A., Boller, K. J. & Bijkerk, F.Hydrogen induced blisters on extreme ultraviolet multilayer mirror surfaces (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Narrow-band multilayer Borrmann filters for monitoring of EUV sources (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. Barreaux, J. L. P., Bastiaens, H. M. J., Kozhevnikov, I. V., Bijkerk, F. & Boller, K. J.Ultra-narrow-linewidth tunable hybrid laser (2015)[Contribution to conference › Poster] Physics@FOM Veldhoven 2015. Fan, Y., Oldenbeuving, R., Klein, E. J., Lee, C. J., Offerhaus, H. L., van der Slot, P. J. M. & Boller, K. J.Anisotropy of heat conduction in Mo/Si multilayers (2015)Journal of Applied Physics, 118(8). Article 085101. Medvedev, V. V., Yang, J., Schmidt, A. J., Yakshin, A. E., van de Kruijs, R. W. E., Zoethout, E. & Bijkerk, F.https://doi.org/10.1063/1.4928958Fabrication and characterization of free-standing, high-line-density transmission gratings for the vacuum UV to soft X-ray range (2015)Optics express, 23(4), 4421-4434. Goh, S. J., Bastiaens, H. M. J., Vratzov, B., Huang, Q., Bijkerk, F. & Boller, K. J.https://doi.org/10.1364/OE.23.004421Fabrication and characterization of free-standing, high-line-density transmission gratings for the vacuum UV to soft X-ray range (2015)Optics express, 23(4), 4421-4434. Goh, S. J., Bastiaens, H. M. J., Vratzov, B., Huang, Q., Bijkerk, F. & Boller, K. J.https://doi.org/10.1364/OE.23.004421High reflectance La/B based multilayer mirrors for 6.x nm wavelength (2015)In Advances in X-Ray/EUV Optics and Components X. Article 958806 (Proceedings of SPIE; Vol. 9588). SPIE. Kuznetsov, D., Yakshin, A., Sturm, M., Van De Kruijs, R., Louis, E. & Bijkerk, F.https://doi.org/10.1117/12.2199427On-chip visible-to-infrared supercontinuum generation with more than 495 THz spectral bandwidth (2015)Optics express, 23(15), 19596-19604. Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van Rees, A., van der Slot, P. J. M., Lee, C. J., Fallnich, C. & Boller, K.-J.https://doi.org/10.1364/OE.23.019596Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles (2015)Review of scientific instruments, 86(6). Article 063109. Gao, A., Rizo, P. J., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.https://doi.org/10.1063/1.4922883Steam reforming of acetic acid - A major component in the volatiles formed during gasification of humin (2015)Applied catalysis B: environmental, 163, 74-82. Hoang, T. M. C., Geerdink, B., Sturm, J. M., Lefferts, L. & Seshan, K.https://doi.org/10.1016/j.apcatb.2014.07.046Wideband multilayer mirrors with minimal layer thicknesses variation (2015)Optics express, 23(7), 9276-9283. Kozhevnikov, I. V., Yakshin, A. & Bijkerk, F.https://doi.org/10.1364/OE.23.009276
2014
Control over the Microstructure and Doping of Nanocrystalline Tin Oxide Films through Pulsed Laser Ablation for Gas Sensor Applications (2014)[Contribution to conference › Poster]. Mohandas Moolayil, S. M., Fujiwara, K., Ramadurai, R. & Tanaka, H.Optical element comprising a multilayer coating, and optical arrangement comprising same (2014)[Patent › Patent] (Submitted). van de Kruijs, R. W. E., Nyabero, S. L., Yakshin, A. & Bijkerk, F.Electronegativity-dependent cleaning of tin from metal capping layers (2014)[Contribution to conference › Poster] NanoCity 2014. Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Narrow-band Borrmann multilayer filters for monitoring of EUV sources (2014)[Contribution to conference › Poster] NanoCity 2014. Barreaux, J. L. P., Bastiaens, H. M. J., Kozhevnikov, I. V., Bijkerk, F. & Boller, K. J.Narrow-band Borrmann multilayer filters for monitoring of EUV sources (2014)[Contribution to conference › Abstract] NanoCity 2014. Barreaux, J. L. P., Bastiaens, H. M. J., Kozhevnikov, I. V., Bijkerk, F. & Boller, K. J.http://www.nanocity2014.com/jonathan-barreauxInjection locking of a hybrid diode-glass waveguide laser (2014)[Contribution to conference › Poster] 38th Annual meeting NNV AMO Lunteren 2014. Fan, Y., Oldenbeuving, R., Klein, E. J., Lee, C. J., van der Slot, P. J. M. & Boller, K. J.Assumption-independent approach for GIXRR data analysis for periodic structures (2014)[Contribution to conference › Poster] PANalytical X-ray scattering workshop. Zameshin, A., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.Water dissociation on Ru(0001) by EUV A TOF, RAIRS and TPD study (2014)[Contribution to conference › Poster] 30th European Conference on Surface Science, ECOSS 2014. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Graphene defect formation by extreme ultraviolet generated photoelectrons (2014)Journal of Applied Physics, 116(5), -. Article 054312. Gao, A., Lee, C. J. & Bijkerk, F.https://doi.org/10.1063/1.4892485Multilayer filter using the borrmann effect for EUV source monitoring (2014)In European Conference on Lasers and Electro-Optics, CLEO 2015 (Optics InfoBase Conference Papers). Optical Society of America. Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J.Method for producing a reflective optical element for EUV-lithography (2014)[Patent › Patent] (In preparation). Kuznetsov, A., Gleeson, M. A., van de Kruijs, R. W. E. & Bijkerk, F.Surface and sub-surface oxidation of thin films using Low Energy Ion Scattering (2014)[Contribution to conference › Poster] LEIS Workshop 2014. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, J. M., Yakshin, A. & Bijkerk, F.Spectral purification and infrared light recycling in extreme ultraviolet lithography sources (2014)Optics express, 22(7), 8633-8639. Bayraktar, M., van Goor, F. A., Boller, K. J. & Bijkerk, F.https://doi.org/10.1364/OE.22.008633Q-factor measurements through injection locking of a semiconductor-glass hybrid laser with unknown intracavity losses (2014)Optics letters, 39(7), 1748-1751. Fan, Y., Oldenbeuving, R., Khan, M. R. H., Roeloffzen, C. G. H., Klein, E. J., Lee, C. J., Offerhaus, H. L. & Boller, K. J.https://doi.org/10.1364/OL.39.001748Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers (2014)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Nyabero, S. L.https://doi.org/10.3990/1.9789462590700Advanced metrology for multilayer mirrors (2014)[Contribution to conference › Poster] Physics@FOM Veldhoven 2014. Makhotkin, I. A., van de Kruijs, R. W. E., Yakunin, S. N., Zoethout, E., Louis, E., Yakshin, A. & Bijkerk, F.Degradation of extreme ultraviolet multilayer mirrors due to H-induced blistering (2014)[Contribution to conference › Poster] Physics@FOM Veldhoven 2014. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Electronegativity-dependent cleaning of tin and tin hydride containing contamination of EUV optics (2014)[Contribution to conference › Poster] Physics@FOM Veldhoven 2014. Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F.Surface and sub-surface thermal oxidation of ruthenium thin films (2014)[Contribution to conference › Poster] Physics@FOM Veldhoven 2014. Coloma Ribera, R., van de Kruijs, R. W. E., Zoethout, E., Yakshin, A. & Bijkerk, F.Subwavelength single layer absorption resonance antireflection coatings (2014)Optics express, 22(1), 490-497. Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E., Boller, K. J. & Bijkerk, F.https://doi.org/10.1364/OE.22.000490Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures (2014)Optics express, 22(17), 20076-20086. Yakunin, S. N., Makhotkin, I. A., Nikolaev, K. V., van de Kruijs, R. W. E., Chuev, M. A. & Bijkerk, F.https://doi.org/10.1364/OE.22.020076Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas (2014)Journal of physics D: applied physics, 47(6), -. Article 065205. Dolgov, A., Lopaev, D., Rachimova, T., Kovalev, A., Vasilyeva, A., Lee, C. J., Krivtsun, V. M., Yakushev, O. & Bijkerk, F.https://doi.org/10.1088/0022-3727/47/6/065205Defect formation in single layer graphene under extreme ultraviolet irradiation (2014)Applied surface science, 317, 745-751. Gao, A., Zoethout, E., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2014.08.177Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation (2014)Journal of micro/nanolithography, MEMS, and MOEMS, 13(1), 013014-013014-5. Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A., Makhotkin, I. A., Bosgra, J. & Bijkerk, F.https://doi.org/10.1117/1.JMM.13.1.013014High efficiency structures EUV multilayer mirror for spectral filtering of long wavelengths (2014)Optics express, 22(16), 19365-19374. Huang, Q., de Boer, M., Barreaux, J., van der Meer, R., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OE.22.019365Model independent X-ray standing wave analysis of periodic multilayer structures (2014)Journal of Applied Physics, 115(13), -. Article 134303. Yakunin, S. N., Makhotkin, I. A., van de Kruijs, R. W. E., Chuev, M. A., Pashaev, E. M., Zoethout, E., Louis, E., Seregin, S. Y., Subbotin, I. A., Novikov, D., Bijkerk, F. & Kovalchuk, M. V.https://doi.org/10.1063/1.4869540Nanosheet controlled epitaxial growth of PbZr0.52Ti0.48O3 thin films on glass substrates (2014)Applied physics letters, 105(13), 132904-. Article 132904. Bayraktar, M., Chopra, A., Bijkerk, F. & Rijnders, A. J. H. M.https://doi.org/10.1063/1.4896991Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers (2014)In Extreme Ultraviolet (EUV) Lithography V. Article 90480G (Proceedings of SPIE; Vol. 9048). SPIE. Huang, Q., de Boer, M., Barreaux, J., Paardekooper, D. M., van den Boogaard, T., van de Kruijs, R., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1117/12.2046415Surface and sub-surface thermal oxidation of thin ruthenium films (2014)Applied physics letters, 105(13), 131601-. Article 131601. Coloma Ribera, R., van de Kruijs, R. W. E., Kokke, S., Zoethout, E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1063/1.4896993Temperature dependencies of hydrogen-induced blistering of thin film multilayers (2014)Journal of Applied Physics, 115(17), -. Article 173510. Kuznetsov, A. S., Gleeson, M. A. & Bijkerk, F.https://doi.org/10.1063/1.4875484UV spectral filtering by surface structures multilayer mirrors (2014)Optics letters, 39(5), 1185-1188. Huang, Q., Paardekooper, D. M., Zoethout, E., Medvedev, V., van de Kruijs, R. W. E., Bosgra, J., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OL.39.001185Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films (2014)Optics express, 22(25), 30623-30632. Bayraktar, M., Chopra, A., Rijnders, G., Boller, K. & Bijkerk, F.https://doi.org/10.1364/OE.22.030623XUV Optics: from deposition to application (2014)[Contribution to conference › Poster] Presentaties voor studenten over vakgroep XUV Optics. Makhotkin, I. A., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A., Kuznetsov, D. & Bijkerk, F.
2013
25 kHz narrow spectral bandwidth of a wavelength tunable diode laser with a short waveguide-based external cavity (2013)Laser physics letters, 10(1), 015804-1-015804-8. Article 015804. Oldenbeuving, R., Klein, E. J., Offerhaus, H. L., Lee, C. J., Song, H. & Boller, K. J.https://doi.org/10.1088/1612-2011/10/1/015804Oxidation and metal contamination of EUV optics (2013)[Contribution to conference › Poster] M2I Conference 2013. Sturm, J. M., Liu, F., Pachecka, M., Lee, C. J. & Bijkerk, F.Short period La/B and LaN/B multilayer mirrors for ~6.8 nm wavelength (2013)Optics express, 21(24), 29894-29904. Makhotkin, I. A., Zoethout, E., van de Kruijs, R., Yakunin, S. N., Louis, E., Yakunin, A. M., Banine, V., Müllender, S. & Bijkerk, F.https://doi.org/10.1364/OE.21.029894Structural and reflective characteristics of multilayers for 6.x nm wavelength (2013)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Makhotkin, I. A.https://doi.org/10.3990/1.9789461919120Smart Multilayer Interactive Optics for Lithography at Extreme Ultraviolet Wavelengths (2013)[Contribution to conference › Poster] 4th Annual Meeting on Smart Optics Systems 2013. Bayraktar, M., Chopra, A., Wessels, W. A., van Goor, F. A., Rijnders, A. J. H. M. & Bijkerk, F.Waveguide-based External Cavity Semiconductor Laser Arrays (2013)[Contribution to conference › Poster] 4th Annual Meeting on Smart Optics Systems 2013. Oldenbeuving, R. M., Fan, Y., Song, H., Verhaegen, M. H. G., Agbana, T., Schitter, G., Klein, E. J., Lee, C. J., Offerhaus, H. L., van Voorst, P. D., van der Slot, P. J. M. & Boller, K.-J.MULTILAYER REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY DEVICE COMPRISING FIRST AND SECOND ADDITIONAL INTERMEDIATE LAYERS (2013)[Patent › Patent]. Yakshin, A. E., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I.https://patents.google.com/patent/JP2013219383A/Hydrogen particle and plasma interactions with heterogeneous structures (2013)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Kuznetsov, A.https://doi.org/10.3990/1.9789090278063Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors (2013)[Contribution to conference › Poster] 2013 International Symposium on Extreme Ultraviolet Lithography. Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F.Transmission grating spectroscopy in the EUV and VUV (2013)[Contribution to conference › Poster] Sematech. Bastiaens, H. M. J., Bruineman, C., Vratzov, B., Louis, E. & Bijkerk, F.Engineering optical constants for broadband single layer antireflection coatings (2013)In Advances in X-Ray/EUV Optics and Components VIII. Article 884814 (Proceedings of SPIE; Vol. 8848). SPIE. Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. & Bijkerk, F.https://doi.org/10.1117/12.2026546Deposition and Oxidation Studies by Low-Energy Ion Scattering (LEIS) (2013)[Contribution to conference › Poster] MESA+ Meeting 2013. Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.The Industrial Focus Group XUV Optics (2013)[Contribution to conference › Poster] MESA+ Meeting 2013. Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A., Lee, C. J., Louis, E. & Bijkerk, F.Engineering optical constants for broadband single layer anti-reflection coatings (2013)[Contribution to conference › Poster] SPIE Optics + Photonics 2013. Huber, S., van de Kruijs, R. W. E., Yakshin, A., Zoethout, E. & Bijkerk, F.Optimization of LaN/B multilayer mirrors for 6.x nm wavelength (2013)In Advances in X-Ray/EUV Optics and Components VIII (pp. 1-5) (Proceedings of SPIE; Vol. 8848). SPIE. Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1117/12.2024199Suppression of long wavelength reflection from extreme-UV multilayer optics (2013)In Advances in X-Ray/EUV Optics and Components VIII (pp. 5-) (Proceedings of SPIE; Vol. 8848). SPIE. Huang, Q., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Medvedev, V., Louis, E. & Bijkerk, F.https://doi.org/10.1117/12.2023889Interlayer thermodynamics in nanoscale layered structures for reflection of EUV radiation (2013)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Bosgra, J.https://doi.org/10.3990/1.9789461917942Blister formation on multilayer mirrors due to the exposure of hydrogen (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001) (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Metal Hydride assited contamination on Ru/Si surfaces (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F.Multilayer development for the generation beyond EUV: 6.x nm (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Makhotkin, I. A., Zoethout, E., Nyabero, S. L., Medvedev, V., van de Kruijs, R. W. E., Louis, E., Yakunin, A. M., Banine, V., Muellender, S. & Bijkerk, F.Multilayer development for the generation beyond EUVL: 6.x nm (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Makhotkin, I. A., Zoethout, E., Nyabero, S. L., Medvedev, V., van de Kruijs, R. W. E., Yakshin, A., Louis, E., Yakunin, A. M., Banine, V., Muellender, S. & Bijkerk, F.Suppression of long wavelength reflection from Extreme UV multilayer optics (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Huang, Q., Medvedev, V., van den Boogaard, T., van der Meer, R., van de Kruijs, R. W. E., Huber, S., Bastiaens, H. M. J., Bruineman, C., Vratsov, B., Louis, E. & Bijkerk, F.Reactions of ethanol on Ru(0001) (2013)Surface science, 612, 42-47. Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.susc.2013.02.009Multiple pulse damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs (2013)[Contribution to conference › Poster] SPIE ‘Damage to VUV, EUV, and X-ray Optics’ conference. Sobierajski, R., Loch, R. A., Louis, E., Klinger, D., Dluizewski, P., Klepka, M., Bijkerk, F., Burian, T., Chalupsky, J., Coppola, N., Dastjani Farahani, S., Galasso, G., Hajkova, V., Harmand, M., Krzywinski, J., Juha, L., Jurek, M., Möller, S., Nagasono, M., … Gaudin, J.Comparison of carbon cleaning mechanisms in EUV-induced and SWD plasmas in H2 and He environments (2013)[Contribution to conference › Poster] 40th IOP Annual Spring Conference on Plasma Physics 2013. Dolgov, A., Lopaev, D., Lee, C. J., Krivtsun, V. M., Yakushev, O. & Bijkerk, F.Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas (2013)[Contribution to conference › Poster] 40th IOP Annual Spring Conference on Plasma Physics 2013. Dolgov, A., Lopaev, D., Lee, C. J., Krivtsun, V. M., Yakushev, O. & Bijkerk, F.Single-order lamellar multilayer gratings (2013)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. van der Meer, R.https://doi.org/10.3990/1.97890365352362D PIC modeling of the EUV induced hydrogen plasma and comparison to the observed carbon etching rate (2013)[Contribution to conference › Poster] Plasma and fusion physics. Astakhov, D., Goedheer, W. J., Lopaev, D., Ivanov, V., Krivtsun, V. M., Yakushev, O., Koshelev, K. & Bijkerk, F.Comparison of carbon cleaning mechanisms in EUV-induced and SWD plasmas in H2 and He environments (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Dolgov, A., Lopaev, D., Lee, C. J., Krivtsun, V. M., Koshelev, K., Yakushev, O. & Bijkerk, F.Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001) (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Liu, F., Sturm, J. M., Osorio, E., van Kampen, M., Lee, C. J. & Bijkerk, F.Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Medvedev, V., Yakshin, A., Louis, E., van de Kruijs, R. W. E., van den Boogaard, T., Krivtsun, V. M., Yakinun, A. M. & Bijkerk, F.Hydrogen uptake and distribution in a multi-layered systems and related effects (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Gleeson, M., Kuznetsov, A. & Bijkerk, F.Reflective Pyramid Wavefront Sensor for Extreme Ultraviolet Radiation (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Bayraktar, M., van Goor, F. A., Bijkerk, F. & Boller, K. J.Study of EUV induced defects on few-layer graphene (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.Enhanced thermal stability of extreme ultraviolet multilayers by balancing diffusion-induced structural changes (2013)Applied physics letters, 103(9), -. Article 093105. Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1063/1.4819851EUV optical elements with enhanced spectral selectivity for IR radiation (2013)In 2013 International Workshop in EUV and Soft X-ray Sources (pp. -). EUV Litho, Inc.. Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F.Experimental set-up and procedures for the investigation of XUV free electron laser interactions with solids (2013)Journal of instrumentation, 8(2), 1-14. Article P02010. Sobierajski, R., Jurek, M., Chalupsky, J., Krzywinski, J., Burian, T., Dastjani Farahani, S., Hajkova, V., Harmand, M., Juha, L., Klinger, D., Loch, R. A., Ozkan, C., Pelka, J. B., Sokolowski-Tinten, K., Sinn, H., Toleikis, S., Tiedtke, K., Tschentscher, T., Wabnitz, H. & Gaudin, J.https://doi.org/10.1088/1748-0221/8/02/P02010Extended theory of soft x-ray reflection for realistic lamellar multilayer gratings (2013)Optics express, 21(11), 13105-13117. van der Meer, R., Kozhevnikov, I. V., Bastiaens, H. M. J., Boller, K.-J. & Bijkerk, F.https://doi.org/10.1364/OE.21.013105Extreme Ultraviolet (EUV) induced defects on few-layer graphene (2013)Journal of Applied Physics, 114(4), -. Article 044313. Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.https://doi.org/10.1063/1.4817082Hydrogen-induced blistering of Mo/Si multilayers: Uptake and distribution (2013)Thin solid films, 545, 571-579. Kuznetsov, A. S., Gleeson, M. A. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2013.07.039Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors (2013)Optics express, 21(14), 16964-16974. Medvedev, V. V., van den Boogaard, A. J. R., van der Meer, R., Yakshin, A. E., Louis, E., Krivtsun, V. M. & Bijkerk, F.https://doi.org/10.1364/OE.21.016964Integrated CARS source based on seeded four-wave mixing in silicon nitride (2013)Optics express, 21(26), 32123-32129. Epping, J. P., Kues, M., van der Slot, P. J. M., Lee, C. J., Fallnich, C. & Boller, K.-J.https://doi.org/10.1364/OE.21.032123Interactions of C in layered Mo–Si structures (2013)Thin solid films, 542, 210-213. Bosgra, J., Veldhuizen, L. W., Zoethout, E., Verhoeven, J., Loch, R. A., Yakshin, A. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2013.06.082Interlayer growth in Mo/B4C multilayered structures upon thermal annealing (2013)Journal of Applied Physics, 113(14), 144310-1-144310-6. Article 144310. Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A., Zoethout, E., von Blanckenhage, G., Bosgra, J., Loch, R. A. & Bijkerk, F.https://doi.org/10.1063/1.4800910Ion effects in hydrogen-induced blistering of Mo/Si multilayers (2013)Journal of Applied Physics, 114(11). Article 113507. Kuznetsov, A., Gleeson, M. A. & Bijkerk, F.https://doi.org/10.1063/1.4821844Mo/Si multilayer-coated amplitude division beam splitters for XUV radiation sources (2013)Journal of synchrotron radiation, 20(2), 249-257. Sobierajski, R., Loch, R. A., van de Kruijs, R. W. E., Louis, E., von Blanckenhagen, G., Gullikson, E. M., Siewert, F., Wawro, A. & Bijkerk, F.https://doi.org/10.1107/S0909049512049990Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography (2013)Applied physics letters, 103(22), 221114-1-21114-4. Article 221114. Medvedev, V., van de Kruijs, R. W. E., Yakshin, A., Novikova, N. N., Krivtsun, V. M., Yakunin, A. M. & Bijkerk, F.https://doi.org/10.1063/1.4837335Nitrogen Scattering at Ru(0001) Surfaces (2013)Zeitschrift für physikalische Chemie, 227(11), 1511-1522. Zaharia, T., Ueta, H., Kleyn, A. W. & Gleeson, M. A.https://doi.org/10.1524/zpch.2013.0415Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer films (2013)Applied surface science, 285(Part B), 293-299. Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2013.08.053UHV-opstelling voor het bestuderen van de contaminatie van EUV-spiegels (2013)NEVAC blad, 51(1), 12-15. Sturm, J. M., Liu, F., Grecea, M. L., Gleeson, M. A., Lee, C. J. & Bijkerk, F.http://www.nevac.nl/418/nevac-blad.html
2012
Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors (2012)Applied Optics, 51(36), 8541-8548. Bosgra, J., Zoethout, E., Eerden, A. M. J., Verhoeven, J., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1364/AO.51.008541Ethanol decomposition on Ru(0001) (2012)[Contribution to conference › Poster] M2I Conference 2012. Sturm, J. M., Liu, F., Lee, C. J. & Bijkerk, F.Extreme ultraviolet induced oxidation of Ru(0001) (2012)[Contribution to conference › Poster] Netherlands MicroNanoConference 2012. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Multilayer optics for 6.7 nm wavelength (2012)[Contribution to conference › Poster] Netherlands MicroNanoConference 2012. Makhotkin, I. A., Zoethout, E., Louis, E. & Bijkerk, F.Physics and technology development of multilayer EUV reflective optics (2012)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Louis, E.https://doi.org/10.3990/1.9789090271637Multilayers for 6.8 nm Wavelength (2012)[Contribution to conference › Poster] 2012 International Workshop on EUV and Soft X-ray Sources. Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M., Banine, V., Muellender, S. & Bijkerk, F.Simultaneous analysis of Grazing Incidence X-Ray reflectivity and X-ray standing waves from periodic multilayer systems (2012)[Contribution to conference › Abstract] 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, XTOP 2012, St. Petersburg, Russia. Yakunin, S. N., Makhotkin, I. A., Chuyev, M. A., Seregin, A. Y., Pashayev, E. M., Louis, E., van de Kruijs, R. W. E., Bijkerk, F. & Kovalchuk, M. V.Solid state diffusion in multilayered structures on a picometer lengthscale (2012)[Contribution to conference › Poster] The 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging. van de Kruijs, R. W. E., Bosgra, J., Bruijn, S., Yakshin, A. & Bijkerk, F.The X-ray Standing Waves analysis of short period La/B- based multilayers (2012)[Contribution to conference › Poster] 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging (X-Top 2012). Makhotkin, I. A., Yakunin, S. N., Chuev, M. A., Zoethout, E., Louis, E., van de Kruijs, R. W. E., Bijkerk, F. & Kovalchuk, M. V.Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth (2012)Thin solid films, 522, 228-232. Bosgra, J., Verhoeven, J., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2012.08.051Reactions of ethanol on Ru(0001) (2012)[Contribution to conference › Poster] 29th European Conference On Surface Science, ECOSS 2012. Sturm, J. M., Liu, F., Lee, C. J. & Bijkerk, F.Multilayer development for the generation beyond EUV: 6.x nm (2012)[Contribution to conference › Poster] 13th ASML Technology Conference 2012. Makhotkin, I. A., Zoethout, E., van de Kruijs, R. W. E., Louis, E., Yakunin, A. M., Muellender, S. & Bijkerk, F.Photo-induced chemistry of EUV multilayer mirror surfaces: experimental set up for in situ studeis (2012)[Contribution to conference › Poster] 13th ASML TC Conference. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Reconstruction of the structure of La/B4C and LaN/B4C multilayer mirrors using X-ray Standing Waves (2012)[Contribution to conference › Poster] 14th European Conference on X-Ray Spectrometry, EXRS 2012. Makhotkin, I. A., Yakunin, S. N., Chuev, M., Zoethout, E., Louis, E., Novikov, D., Seregin, A. Y., Pashayev, I. M. & Bijkerk, F.Study of EUV induced defects on few-layer graphene (2012)[Contribution to conference › Poster] Graphene International Conference. Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors (2012)Optics letters, 37(7), 1169-1171. Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, A. M., Koshelev, K. N. & Bijkerk, F.https://doi.org/10.1364/OL.37.001169Wavelength selection for multilayer coatings for the lithography generation beyond EUVL (2012)In Extreme Ultraviolet (EUV) Lithography III. Article 832213 (Proceedings of SPIE; Vol. 8322). SPIE. Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, S. N., Muellender, S. & Bijkerk, F.https://doi.org/10.1117/12.918036Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (EUV) or soft X-Ray (Soft X) and the infrared (IR) wavelength range (2012)[Patent › Patent] (Submitted). van Goor, F. A., Bijkerk, F., van den Boogaard, T. & van der Meer, R.Modelling of shot damage tresholds of multilayer optics for short-wavelength FELs (2012)[Contribution to conference › Poster] European XFEL User Meeting / HASYLAB User Meeting 2012. Loch, R. A., Sobierajski, R., Louis, E., Bosgra, J., van de Kruijs, R. W. E., Makhotkin, I. A., Zoethout, E. & Bijkerk, F.Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Medvedev, V., Yakshin, A., Louis, E., van de Kruijs, R. W. E., van den Boogaard, T., Krivtsun, V. M., Yakunin, A. M. & Bijkerk, F.Evolution of diffusion characteristics during nanoscopic Mo-Si interlayer growth (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Bosgra, J., Verhoeven, J., Yakshin, A. & Bijkerk, F.Nitrogen interface passivation of La/B layeren structures (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Makhotkin, I. A., Zoethout, E., Louis, E. & Bijkerk, F.Roughness development during growth and ion beam polishing of molybdenum silicon mulitlayer films (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Zoethout, E., Louis, E. & Bijkerk, F.Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection (2012)Optics letters, 37(2), 160-162. van den Boogaard, T., van Goor, F. A., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OL.37.000160Deposition and Etching of SiF2 on Si Surface: MD Study (2012)Physics procedia, 32, 885-890. Chen, X., Lu, X. D., He, P. N., Zhao, C. L., Sun, W., Zhang, P. & Gou, F.https://doi.org/10.1016/j.phpro.2012.03.652Electrical conductivity of nanostructured and C60-modified aluminum (2012)Applied physics A: Materials science and processing, 107(4), 863-869. Zameshin, A., Popov, M., Medvedev, V., Perfilov, S., Lomakin, R., Buga, S., Denisov, V., Kirichenko, A., Skryleva, E., Tatyanin, E., Aksenenkov, V. & Blank, V.https://doi.org/10.1007/s00339-012-6805-xEmploying a cylindrical single crystal in gas-surface dynamics (2012)The Journal of chemical physics, 136(11), -. Article 114201. Hahn, C., Shan, J., Liu, Y., van den Berg, O., Kleijn, A. W. & Juurlink, L. B. F.https://doi.org/10.1063/1.3692686Evidence of stable high-temperature Dx-CO intermediates on the Ru(0001) surface (2012)The Journal of chemical physics, 136, 114710-1-114710-6. Ueta, H., Groot, I. M. N., Kleijn, A. W. & Gleeson, M. A.https://doi.org/10.1063/1.3689553Influence of noble gas ion polishing species on extreme ultraviolet mirrors (2012)Journal of Applied Physics, 112(12), -. Article 123502. van den Boogaard, T., Zoethout, E., Makhotkin, I. A., Louis, E. & Bijkerk, F.https://doi.org/10.1063/1.4768915Investigating the interaction of x-ray free electron laser radiation with grating structure (2012)Optics letters, 37(15), 3033-3035. Gaudin, J., Ozkan, C., Chalupsky, J., Bajt, S., Burian, T., Vysin, L., Coppola, N., Dastjani Farahani, S., Chapman, H., Galasso, G., Hajkova, V., Harmand, M., Juha, L., Jurek, M., Loch, R. A., Möller, S., Nagasono, M., Störmer, M., Sinn, H., … Krzywinski, J.https://doi.org/10.1364/OL.37.003033Molecular Dynamics Simulations of Atomic H Etching SiC Surface (2012)Physics procedia, 32, 539-544. Sun, W., Liu, H., Lin, L., Zhao, C., Lu, X. & Gou, F.https://doi.org/10.1016/j.phpro.2012.03.598New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes (2012)Journal of micro/nanolithography, MEMS, and MOEMS, 11(2), 021103-1-021103-6. Koshelev, K. N., Krivtsun, V. M., Ivanov, V., Yakushev, O., Chekmarev, A., Koloshnikov, V., Snegirev, E. & Medvedev, V.https://doi.org/10.1117/1.JMM.11.2.021103RZLINE code modelling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation (2012)Journal of micro/nanolithography, MEMS, and MOEMS, 11(2), 021112-1-021112-6. Article 021112. Koshelev, K., Noivkov, V. G., Medvedev, V., Grushin, A. S. & Krivtsun, V. M.https://doi.org/10.1117/1.JMM.11.2.021112Spiegeling en Daad (2012)Magazine voor alumni en relaties, 2012(2), 32-33. Veen, W. & Bijkerk, F.http://www.utwente.nl/magazine/artikelen/spiegelingendaad.pdfSurface modifications by gas plasma control osteogenic differentiation of MC3T3-E1 cells (2012)Acta biomaterialia, 8(8), 2969-2977. Barradas, A. M. C., Lachmann, K., Hlawacek, G., Frielink, C., Truckenmüller, R. K., Boerman, O. C., van Gastel, R., Garritsen, H. S. P., Thomas, M., Moroni, L., van Blitterswijk, C. & de Boer, J.https://doi.org/10.1016/j.actbio.2012.04.021The noise-limited-resolution for stimulated emission depletion microscopy of diffusing particles (2012)Optics express, 20(12), 12793-12798. Lee, C. J. & Boller, K. J.https://doi.org/10.1364/OE.20.012793Thermoelectric properties of Bi0.5Sb1.5Te3/C60 nanocomposites (2012)Physical review B: Condensed matter and materials physics, 86(7), 075426-1-075426-8. Blank, V. D., Buga, S. G., Kulbachinskii, V. A., Kytin, V. G., Medvedev, V., Popov, Y. M., Stepanov, P. B. & Skok, V. F.https://doi.org/10.1103/PhysRevB.86.075426
2011
Ion-enhanced growth in planar and structured Mo/Si multilayers (2011)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. van den Boogaard, T.https://doi.org/10.3990/1.9789461911209Characterization of EUV induced contamination on multilayer optics (2011)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Chen, J.https://doi.org/10.3990/1.9789053354254Reflective optical element and method for the production thereof (2011)[Patent › Patent]. Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F.Diffusion phenomena in chemically stabilized multilayer structures (2011)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Bruijn, S.https://doi.org/10.3990/1.9789491211225Atomic quantum scattering and molecular diffraction (2011)Progress in surface science, 86(9-10), 163-168. Kleijn, A.https://doi.org/10.1016/j.progsurf.2011.09.001Chemical interaction of B4C diffusion barriers with Mo/Si layered nanostructures (2011)[Other contribution › Other contribution]. Nyabero, S. L.Damage threshold of amorphous carbon mirror for 177 eV FEL radiation (2011)Nuclear instruments & methods in physics research. Section A : Accelerators, spectrometers, detectors and associated equipment, 635(1, Suppl. 11), S39-S42. Dastjani Farahani, S., Chalupsky, J., Burian, T., Chapman, H., Gleeson, A. J., Hajkoya, V., Juha, L., Jurek, M., Klinger, D., Sinn, H., Sobierajski, R., Störmer, M., Tiedtke, K., Toleikis, S., Tschentscher, T., Wabnitz, H. & Gaudin, J.https://doi.org/10.1016/j.nima.2010.10.133Decay of crystalline order and equilibration during solid-to-plasma transition induced by 20-fs microfocused 92 eV Free Electron Laser pulses (2011)Physical review letters, 106(16), 1-4. Article 164801. Galtier, E., Rosmej, F. B., Dzelzainis, T., Riley, D., Khattak, F. Y., Heimann, P., Lee, R. W., Nelson, A. J., Vinko, S. M., Whitcher, T., Wark, J. S., Tschentscher, T., Toleikis, S., Faustlin, R. R., Sobierajski, R., Jurek, M., Juha, L., Chalupsky, J., Hajkova, V., … Nagler, B.https://doi.org/10.1103/PhysRevLett.106.164801In-situ study of the diffusion-reaction mechanism in nanometer scale layered films (2011)Applied surface science, 257(7), 2707-2711. Bruijn, S., van de Kruijs, R. W. E., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2010.10.049Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers (2011)[Other contribution › Other contribution]. Bosgra, J., Yakshin, A. & Bijkerk, F.Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance (2011)[Other contribution › Other contribution]. Bosgra, J., van de Kruijs, R. W. E., Zoethout, E., Verhoeven, J., Yakshin, A. & Bijkerk, F.The Energy Dependence of the Ratio of Step and Terrace Reactivity for H(2) Dissociation on Stepped Platinum (2011)Angewandte Chemie (international edition), 50(22), 5174-5177. Groot, I. M. N., Kleyn, A. W. & Juurlink, L. B. F.https://doi.org/10.1002/anie.201007093The Interaction of Hyperthermal Argon Atoms with CO-covered Ru(0001): Scattering and Collision-Induced Desorption (2011)[Other contribution › Other contribution]. Gleeson, M., Ueta, H. & Kleyn, A. W.The interaction of Hyperthermal Argon Atoms with CO-covered Ru(0001): Scattering and Collision-Induced Desorption (2011)The Journal of chemical physics, 134(6), 1-10. Article 064706. Ueta, H., Gleeson, M. & Kleijn, A.https://doi.org/10.1063/1.3545974The interaction of hyperthermal nitrogen with N-covered Ag(111) (2011)The Journal of chemical physics, 135(7), 1-10. Article 074702. Ueta, H., Gleeson, M. & Kleijn, A.https://doi.org/10.1063/1.3615520TOF-OFF: A method for determining focal positions in tightly focused free-electron laser experiments by measurement of ejected ions (2011)High energy density physics, 7(4), 336-342. Iwan, B., Andreasson, J., Andrejczuk, A., Abreu, E., Bergh, M., Caleman, C., Nelson, A. J., Bajt, S., Chalupsky, J., Chapman, H. N., Fäustlin, R. R., Hájková, V., Heimann, P. A., Hjörvarsson, B., Juha, L., Klinger, D., Krzywinski, J., Nagler, B., Pálsson, G. K., … Timneanu, N.https://doi.org/10.1016/j.hedp.2011.06.008
2010
Nanoscale diffusion, compound formation and phase transitions in Mo/Si multilayer structures (2010)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. de Rooij-Lohmann, V. I. T. A.https://doi.org/10.3990/1.9789053353141ZFEL: a compact, soft X-ray FEL in the Netherlands (2010)In Free Electron Laser (FEL) Conference 2010, Malmö, Sweden (pp. 163-164). Beijers, J. P. M., Brandenburg, S., Eikema, K. S. E., Hoekstra, S., Jungmann, K., Schlathölter, T., Timmermans, R. G. E., Willmann, R., Hoekstra, R., van Loosdrecht, P. H. M., Noheda, B., Palstra, T. T. M., Rudolf, P., Luiten, O. J. & Bijkerk, F.https://www.researchgate.net/publication/228368290_ZFEL_A_COMPACT_SOFT_X-RAY_FEL_IN_THE_NETHERLANDSElectronic Structure of an XUV Photogenerated Solid-Density Aluminum Plasma (2010)Physical review letters, 104(22). Article 225001. Vinko, S. M., Zastrau, U., Mazevet, S., Andreasson, J., Bajt, S., Burian, T., Chalupsky, J., Chapman, H. N., Cihelka, J., Doria, D., Döppner, T., Düsterer, S., Dzelzainis, T., Faustlin, R. R., Fortmann, C., Förster, E., Galtier, E. J., Glenzer, S. H., Göde, S., … Wark, J.https://doi.org/10.1103/PhysRevLett.104.225001High reflectance multilayers for EUVL HVM-projection optics (2010)In Extreme Ultraviolet (EUV) Lithography. Article 76362T (Proceedings of SPIE; Vol. 7636). SPIE. Louis, E., van Hattum, E. D., Alonso van der Westen, S., Sallé, P., Grootkarzijn, K., Zoethout, E., Bijkerk, F., von Blanckenhagen, G. & Müllender, S.https://doi.org/10.1117/12.846566Nitridated B4C/La multilayer optics for 6.7nm (2010)[Contribution to conference › Poster] 10th International Conference on the Physics of X-Ray Multilayer Structures (PXRMS). Tsarfati, T., Makhotkin, I., Louis, E., van de Kruijs, R. W. E. & Bijkerk, F.http://www.rxollc.com/pxrms/advance_program.htmlEUV-multilayers on grating-like topographies (2010)In Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States (Proceedings of SPIE; Vol. 7636). SPIE. van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I. & Bijkerk, F.https://doi.org/10.1117/12.846564Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing (2010)Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms, 268(6), 560-567. Dobrovolskiy, S., Yakshin, A., Tichelaar, F. D., Verhoeven, J., Louis, E. & Bijkerk, F.https://doi.org/10.1016/j.nimb.2009.12.022High-resolution, high-reflective operation of lamellar multilayer amplitude gratings: identification of the single-order regime (2010)Optics express, 18(15), 16234-16242. Kozhevnikov, I. V., van der Meer, R., Bastiaens, H. M. J., Boller, K.-J. & Bijkerk, F.https://doi.org/10.1364/OE.18.016234Hydrogen interaction with EUVL-relevant optical materials (2010)Journal of surface investigation. X-ray, synchrotron and neutron techniques, 4(4), 563-566. Kuznetsov, A., van de Kruijs, R. W. E., Gleeson, M. A., Schmid, K. & Bijkerk, F.https://doi.org/10.1134/S1027451010040026Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser (2010)Optics express, 18(23), 23933-23938. Hau-Riege, S. P., London, R. A., Graf, A., Baker, S. L., Soufli, R., Sobierajski, R., Burian, T., Chalupsky, J., Juha, L., Gaudin, J., Krzywinski, J., Moeller, S., Messerschmidt, M., Bozek, J. & Bostedt, C.https://doi.org/10.1364/OE.18.023933Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method (2010)[Patent › Patent] (Submitted). Bijkerk, F., van der Wiel, W. G., van der Meer, R. & Hegeman, P. E.Molecular dynamics simulation of the effects of the samples' temperature on Ar+ interactions with SiC surface (2010)Nuclear fusion and plasma physics = Hejubian yu Denglizitiwuli, 30(4), 317-322. Sun, W.-Z., Zhao, C. L., Liu, H.-m., Zhang, J.-y., Lu, X. D., Pan, Y.-d. & Gou, F.https://www.researchgate.net/publication/289206284_Molecular_dynamics_simulation_of_the_effects_of_the_samples'_temperature_on_Ar_interactions_with_SiC_surfaceNitridation and contrast of B4C/La interfaces and multilayer optics (2010)Thin solid films, 518(24), 7249-7252. Tsarfati, T., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2010.04.088Oppervlaktechemie van nanolaagspiegels (2010)Nederlands tijdschrift voor natuurkunde, 76(8), 8-10. Tsarfati, T., Zoethout, E., van de Kruijs, R. W. E. & Bijkerk, F.https://www.ntvn.nl/archief/pdf/29/8/Properties of broadband depth-graded multilayer mirrors for EUV optical systems (2010)Optics express, 18(7), 6957-6971. Yakshin, A. E., Kozhevnikov, I. V., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OE.18.006957Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby (2010)[Patent › Patent] (In preparation). Koshelev, K. N., Bijkerk, F., Zukavishvili, G. G., Korop, E. D. & Ivanov, V. V.Reflective element for EUV lithography device (2010)[Patent › Patent] (Submitted). Yakshin, A., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I.Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge (2010)[Patent › Patent] (Submitted). Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F.Roughness evolution of Si surfaces upon Ar ion erosion (2010)Applied surface science, 256(16), 5011-5014. de Rooij-Lohmann, V. I. T. A., Kozhevnikov, I. V., Peverini, L., Ziegler, E., Cuerno, R., Bijkerk, F. & Yakshin, A.https://doi.org/10.1016/j.apsusc.2010.03.045Secondary electron yield measurements of carbon covered multilayer optics (2010)Applied surface science, 257(2), 354-361. Chen, J., Louis, E., Verhoeven, J., Harmsen, R., Lee, C. J., Lubomska, M., van Kampen, M., van Schaik, W. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2010.06.075Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposures (2010)Optics express, 18(2), 700-712. Khorsand, A. R., Sobierajski, R., Louis, E., Bruijn, S., van de Kruijs, R. W. E., Krzywinski, J., Hau-Riege, S., Gleeson, A., Gullikson, E. M. & Bijkerk, F.https://doi.org/10.1364/OE.18.000700Spot size characterization of focused non-Gaussian beams (2010)Optics express, 18(26), 27836-27845. Chalupský, J., Krzywinski, J., Juha, L., Hájková, V., Cihelka, J., Burian, T., Vyšín, L., Gaudin, J., Gleeson, A. J., Jurek, M., Khorsand, A. R., Klinger, D., Wabnitz, H., Sobierajski, R., Störmer, M., Tiedtke, K. & Toleikis, S.https://doi.org/10.1364/OE.18.027836Surface morphology of Kr+-polished amorphous Si layers (2010)Journal of vacuum science & technology A: vacuum, surfaces, and films, 28(4), 552-558. van den Boogaard, T., Louis, E., Zoethout, E., Müllender, S. & Bijkerk, F.https://doi.org/10.1116/1.3428545
2009
Coating of silicon pore optics (2009)In Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV (Proceedings of the SPIE; Vol. 7437). SPIE. Jensen, C. P., Ackermann, M., Christensen, F. E., Collon, M. J. & Krumrey, M.https://doi.org/10.1117/12.826432Surface and interface dynamics in multilayered systems (2009)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Tsarfati, T.https://doi.org/10.3990/1.9789053351970
2008
Smoothing properties of single- and multilayer coatings, a method to smoothen substrates (2008)In Emerging Lithographic Technologies XII. Article 69210R (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921). Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F. & Müllender, S.https://doi.org/10.1117/12.772479Reflective optical element for EUV lithography devices (2008)[Patent › Patent]. Yakshin, A. E., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I.https://patents.google.com/patent/TW200835943A/Stralingsbron voor elektromagnetische straling met een golflengte in het extreem ultraviolet (XUV) golflengtegebied. (2008)[Patent › Patent]. Frederik, B., Andrey, E. Y., Mohamed, R. A. & Aart, W. K.Spectral-purity-enhancing layer for multilayer mirrors (2008)Optics letters, 33(6), 560-562. van Herpen, M. M. J. W., van de Kruijs, R. W. E., Klunder, D. J. W., Louis, E., Yakshin, A. E., Alonso van der Westen, S., Bijkerk, F. & Banine, V.https://doi.org/10.1364/OL.33.000560
2007
Interface structure and interdiffusion in Mo/Si multilayers (2007)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Nedelcu, I.
2005
Interfaces in soft X-ray multilayer mirrors (2005)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Kessels, M. J. H.Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device (2005)[Patent › Patent]. Klein, R., Stietz, F., Wedowski, M., Louis, E., Bijkerk, F., Yakshin, A. E. & Klein Roman,stietz Frank,wedowski Marco,louis Eric,bijkerk Frederik, Y. A. E.
2003
Optical broad band element and process for its production (2003)[Patent › Patent]. Yakshin, E. A., Kojevnikov, I. V., Bijkerk, F. & Louis, E.https://patents.google.com/patent/AU2003226726A1/
2001
Integrating e-mail use in design & technology lessons (2001)In New media in Technology Education: Proceedings PATT-11 Conference, March 8-13 2001 (pp. 153-168). Eindhoven University of Technology. van der Meij, H., van Graft, M. & Boersma, K.