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2025

Oriented 2D Ruddlesden-Popper metal halides by pulsed laser deposition (2025)npj 2D Materials and Applications, 9(1). Article 50. Solomon, J. S., Mrkyvkova, N., Kliner, V., Soto-Montero, T., Fernandez-Guillen, I., Ledinský, M., Boix, P. P., Siffalovic, P. & Morales-Masis, M.https://doi.org/10.1038/s41699-025-00571-3Resolving the W-on-Si interface by non-destructive low energy ion scattering (2025)Surfaces and Interfaces, 70. Article 106879. Valpreda, A., Christenhusz, M., Sturm, J. M., Yakshin, A. E. & Ackermann, M.https://doi.org/10.1016/j.surfin.2025.106879Diving into thin-film interfaces using low energy ion scattering (2025)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Valpreda, A.https://doi.org/10.3990/1.9789036565844Calcium Niobate nanosheets: a 2D model system for investigating LEIS surface and tail signals (2025)[Contribution to conference › Poster] LEIS Workshop 2025. Valpreda, A., Sturm, J. M., Yakshin, A. & Ackermann, M.Characterization of Plasma-Induced Atomic Diffusion in Thin Films (2025)[Contribution to conference › Poster] International Workshop on X-Ray and Neutron Multilayer Structures, PXRNMS 2025. Gerlach, L., Shafikov, A., Tsvetanova, M., Sturm, J. M. & Ackermann, M.Hydrogen radical induced Zn transfer to Ru film surfaces and influence of ambient atmosphere exposure on Zn adsorbates on Ru (2025)Vacuum, 238. Article 114316 (E-pub ahead of print/First online). Gaffarov, I., Sturm, J. M., Ackermann, M. & Makhotkin, I. A.https://doi.org/10.1016/j.vacuum.2025.114316Characterization of Plasma-Induced Atomic Diffusion in Thin Films (2025)[Contribution to conference › Poster] 1st NNV Plasma Physics Symposium 2025. Gerlach, L., Shafikov, A., Tsvetanova, M., Sturm, J. M. & Ackermann, M.A Universal Model for Hydrogen−Induced Reduction of Transition Metal Compounds (2025)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Rehman, A.https://doi.org/10.3990/1.9789036565288Engineering Work Function to Stabilize Metal Oxides in Reactive Hydrogen (2025)The journal of physical chemistry letters, 16(10), 2592-2598. Rehman, A., van de Kruijs, R. W. E., van den Beld, W. T. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.1021/acs.jpclett.4c03404Relation between electronic structure and emissivity of MoSi₂-based thin membranes for radiative cooling (2025)Journal of alloys and compounds, 1018. Article 179277. Baskakov, A., van de Kruijs, R. W. E., Houweling, S., Colombi, G., Akhmetov, F., Sturm, J. M. & Ackermann, M.https://doi.org/10.1016/j.jallcom.2025.179277Metallic molybdenum obtained by atomic layer deposition from Mo(CO)₆ (2025)Journal of vacuum science & technology A: vacuum, surfaces, and films, 43(2). Article 022407. van der Zouw, K., van der Wel, B. Y., Sturm, J. M., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0004244Cu-based transparent conductive materials with enhanced conductivity (2025)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Mirza, A. S.https://doi.org/10.3990/1.9789036563772TEM observations of plasma - thin film interaction (2025)[Contribution to conference › Poster] NWO Physics 2025. Gerlach, L., Shafikov, A., Tsvetanova, M., Sturm, J. M. & Ackermann, M.Grazing emission X-ray fluorescence characterization of a thin-film waveguide with laboratory equipment (2025)Thin solid films, 809. Article 140588. Terentev, T. N., Gateshki, M., Tiwari, A., de Vries, R., Jovanovic, V., Ackermann, M. D. & Makhotkin, I. A.https://doi.org/10.1016/j.tsf.2024.140588

2024

Oxidation induced amorphicity and subsequent delayed crystallization in binary transition metal alloy NbMo (2024)Journal of Applied Physics, 136(22). Article 225301. Homsma, M. D., van den Beld, W. T. E., van de Kruijs, R. W. E. & Ackermann, M. D.https://doi.org/10.1063/5.0232077Investigating EUV degradation with in-situ EUV transmission measurements (2024)[Contribution to conference › Poster] 16th BESSY@HZB User Meeting 2024. Ramsamoedj, D. C., Ackermann, M. & van den Beld, W.Engineering Work Function to Stabilize Metal Oxides in Reactive Hydrogen (2024)[Working paper › Preprint]. American Chemical Society. Rehman, A., van de Kruijs, R. W. E., van den Beld, W. T. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.48550/arXiv.2411.17276Work-Function-Dependent Reduction of Transition Metal Nitrides in Hydrogen Environments (2024)The journal of physical chemistry letters, 15(46), 11462-11467. Rehman, A., van de Kruijs, R. W. E., van den Beld, W. T. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.1021/acs.jpclett.4c02259Chemically Stable Group IV–V Transition Metal Carbide Thin Films in Hydrogen Radical Environments (2024)The Journal of physical chemistry C, 128(43), 18524–18533. Rehman, A., van de Kruijs, R. W. E., van den Beld, W. T. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.1021/acs.jpcc.4c04822Investigating EUV degradation with in-situ EUV transmission measurements (2024)[Contribution to conference › Poster] EUV Source Workshop 2024. Ramsamoedj, D. C., Ackermann, M. & van den Beld, W.Examining the influence of W thickness on the Si-on-W Interface: A comparative metrology analysis (2024)Applied surface science, 670. Article 160615. Valpreda, A., Sturm, J. M., Yakshin, A. E., Woitok, J. F., Lokhorst, H. W., Phadke, P. & Ackermann, M.https://doi.org/10.1016/j.apsusc.2024.160615Dewetting of Pt Nanoparticles Boosts Electrocatalytic Hydrogen Evolution Due to Electronic Metal-Support Interaction (2024)Advanced functional materials, 34(40). Article 2403628. Harsha, S., Sharma, R. K., Dierner, M., Baeumer, C., Makhotkin, I., Mul, G., Ghigna, P., Spiecker, E., Will, J. & Altomare, M.https://doi.org/10.1002/adfm.202403628Laboratory-based 3D X-ray standing-wave analysis of nanometre-scale gratings (2024)Journal of applied crystallography, 57(Part 5), 1288-1298. Matveevskii, K., Nikolaev, K. V., Fallica, R., Beckers, D., Gateshki, M., Kharchenko, A., Spanjer, B., Rogachev, A., Yakunin, S., Ackermann, M. & Makhotkin, I. A.https://doi.org/10.1107/S1600576724007179Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates (2024)AIP advances, 14(10). Article 105021. Babenko, I., Mostafa, Y., Bouza, Z., Versolato, O. O. & Bayraktar, M.https://doi.org/10.1063/5.0226426Investigating EUV degradation with in-situ EUV transmission measurements (2024)[Contribution to conference › Poster] ASML PhD and Postdoc networking event 2024. Ramsamoedj, D. C., van den Beld, W. & Ackermann, M.TEM observations of plasma - thin film interaction (2024)[Contribution to conference › Poster] ASML PhD and Postdoc networking event 2024. Gerlach, L., Shafikov, A., Sturm, J. M. & Ackermann, M.TEM observations of plasma - thin film interaction (2024)[Contribution to conference › Poster] MESA+ Day 2024. Gerlach, L., Shafikov, A., Sturm, J. M. & Ackermann, M.Structural pathways for ultrafast melting of optically excited thin polycrystalline Palladium films (2024)Acta materialia, 276. Article 120043. Antonowicz, J., Olczak, A., Sokolowski-Tinten, K., Zalden, P., Milov, I., Dzięgielewski, P., Bressler, C., Chapman, H. N., Chojnacki, M., Dłużewski, P., Rodriguez-Fernandez, A., Fronc, K., Gawełda, W., Georgarakis, K., Greer, A. L., Jacyna, I., van de Kruijs, R. W. E., Kamiński, R., Khakhulin, D., … Sobierajski, R.https://doi.org/10.1016/j.actamat.2024.120043Electronic heat conductivity in a two-temperature state (2024)International journal of heat and mass transfer, 228. Article 125674. Medvedev, N., Akhmetov, F. & Milov, I.https://doi.org/10.1016/j.ijheatmasstransfer.2024.125674Atomic level mechanism of disorder-order transformation kinetics at nanoscale in FePt based systems (2024)Physica Scripta, 99(6). Article 0659b8. Kumar, S., Tiwari, A., Gupta, M., Sharma, G., Srihari, V., Gupta, A., Reddy, V. R., Gome, A. & Sharma, K.https://doi.org/10.1088/1402-4896/ad4b74Ab initio-simulated optical response of hot electrons in gold and ruthenium (2024)Optics express, 32(11), 19117-19132. Akhmetov, F., Vorberger, J., Milov, I., Makhotkin, I. & Ackermann, M.https://doi.org/10.1364/OE.522772Electron and lattice response to ultrafast laser excitation: Exploring temperature dynamics in transition metals (2024)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Akhmetov, F.https://doi.org/10.3990/1.9789036561297Publisher's Note: "Growth and optical performance of short-period W/Al and polished W/Si/Al/Si multilayers" (vol 134, 155301, 2023) (2024)Journal of Applied Physics, 135(14). Article 149901. Ijpes, D., Yakshin, A. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0209743The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach (2024)[Contribution to conference › Paper] SPIE Advanced Lithography + Patterning, 2024. Tiwari, A., Fallica, R., Ackermann, M. & Makhotkin, I. A.X-ray standing wave characterization of the strong metal–support interaction in Co/TiOx model catalysts (2024)Journal of applied crystallography, 57(Part 2), 481 - 491. Tiwari, A., Monai, M., Matveevskii, K., Yakunin, S. N., Mandemaker, L. D. B., Tsvetanova, M., Goodwin, M. J., Ackermann, M. & Makhotkin, I. A.https://doi.org/10.1107/S1600576724001730Highly conductive p-type nc-SiO_X:H thin films deposited at 130°C via efficient incorporation of plasma synthesized silicon nanocrystals and their application in SHJ solar cells (2024)Solar Energy Materials and Solar Cells, 266. Article 112675. Olivares, A. J., Seif, J. P., Repecaud, P. A., Longeaud, C., Morales-Masis, M., Bivour, M. & Roca i Cabarrocas, P.https://doi.org/10.1016/j.solmat.2023.112675Nanoscale Kirkendall shift in thin films studied using x-ray waveguide structures (2024)Acta materialia, 266. Article 119694. Tiwari, A., Gupta, M., Das, G., Garreau, Y., Coati, A. & Gupta, A.https://doi.org/10.1016/j.actamat.2024.119694Dual Modulation Scanning Tunneling Microscopy: a Quest for Subnanometer Chemical Contrast on Thin Films (2024)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Oldenkotte, V. J. S.https://doi.org/10.3990/1.9789036559416Oxidation of thin film binary entropy alloys (2024)[Contribution to conference › Poster] NWO Physics 2024. Homsma, M., van den Beld, W., van de Kruijs, R. W. E. & Ackermann, M.The effect of W thickness on the interface Si-on-W, a Low-Energy Ion Scattering study (2024)[Contribution to conference › Poster] NWO Physics 2024. Valpreda, A., Sturm, J. M., Yakshin, A. E. & Ackermann, M.

2023

Interface smoothing in short-period W/B4C multilayers using neon ion beam polishing (2023)Journal of Applied Physics, 134(24). Article 245303. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0175793Role of Excess Bi on the Properties and Performance of BiFeO₃ Thin-Film Photocathodes (2023)ACS Applied Energy Materials, 6(24), 12237−12248. Prasad, N. P., Rohnke, M., Verheijen, M. A., Sturm, J. M., Hofmann, J. P., Hensen, E. J. M. & Bieberle-Hütter, A.https://doi.org/10.1021/acsaem.3c01926Interface engineered ultrashort period soft X-ray multilayers: Growth, characterization, and optical response (2023)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. IJpes, D.https://doi.org/10.3990/1.9789036559270Atomic-scale insights into damage produced by swift heavy ions in polyethylene (2023)Journal of materials science, 58, 17275-17291. Babaev, P., Akhmetov, F., Gorbunov, S., Medvedev, N., Rymzhanov, R., Voronkov, R. & Volkov, A. E.https://doi.org/10.1007/s10853-023-09117-8Electron-phonon coupling in transition metals beyond Wang's approximation (2023)Physical review B: Covering condensed matter and materials physics, 108(21). Article 214301. Akhmetov, F., Milov, I., Makhotkin, I. A., Ackermann, M. & Vorberger, J.https://doi.org/10.1103/PhysRevB.108.214301Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction (2023)Plasma sources science and technology, 32(12). Article 125006. Fischer, J., Renner, M., Gudmundsson, J. T., Rudolph, M., Hajihoseini, H., Brenning, N. & Lundin, D.https://doi.org/10.1088/1361-6595/ad10efGrowth and optical performance of short-period W/Al and polished W/Si/Al/Si multilayers (2023)Journal of Applied Physics, 134(15). Article 155301. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0168377Resolving buried interfaces by Low-Energy Ion Scattering (2023)[Contribution to conference › Poster] International Conference on Physics of X-Ray and Neutron Multilayer Structures, PXRNMS 2023. Valpreda, A.Infrared emissivity of thin films based on molybdenum silicides with silicon (2023)[Contribution to conference › Poster] MESA+ Meeting 2023. Baskakov, A., Golsanamlou, Z., van de Kruijs, R. W. E., Bokdam, M., Sturm, J. M. & Ackermann, M.Oxidation of Enhanced Entropy Alloy Thin Films (2023)[Contribution to conference › Poster] MESA+ Meeting 2023. Homsma, M.EUV Source Metrology (2023)In Photon Sources for Lithography and Metrology (pp. 509-535). Bayraktar, M., Liu, F., Versolato, O. & Bijkerk, F.https://doi.org/10.1117/3.2638242.ch13Chemical Interaction of Hydrogen Radicals (H*) with Transition Metal Nitrides (2023)The Journal of physical chemistry C, 127(36), 17770-17780. Rehman, A., van de Kruijs, R. W. E., van den Beld, W. T. E., Sturm, J. M. & Ackermann, M.https://doi.org/10.1021/acs.jpcc.3c04490Extreme ultraviolet broadband imaging spectrometer using dispersion-matched zone plates (2023)Optics letters, 48(16), 4316-4319. Mostafa, Y., Bouza, Z., Byers, J., Babenko, I., Ubachs, W., Versolato, O. O. & Bayraktar, M.https://doi.org/10.1364/OL.496995Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges (2023)Plasma sources science and technology, 32(7), 075016. Antunes, V. G., Rudolph, M., Kapran, A., Hajihoseini, H., Raadu, M. A., Brenning, N., Gudmundsson, J. T., Lundin, D. & Minea, T.https://doi.org/10.1088/1361-6595/ace847Resolving buried interfaces with low energy ion scattering (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(4). Article 043203. Valpreda, A., Sturm, J. M., Yakshin, A. E. & Ackermann, M.https://doi.org/10.1116/6.0002567Implementing 0.1 nm B₄C barriers in ultrashort period 1.0 nm W/Si multilayers for increased soft x-ray reflectance (2023)Journal of Applied Physics, 133(24). Article 245301. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0153322Laser-induced electron dynamics and surface modification in ruthenium thin films (2023)Vacuum, 212. Article 112045. Akhmetov, F., Milov, I., Semin, S., Formisano, F., Medvedev, N., Sturm, J. M., Zhakhovsky, V. V., Makhotkin, I. A., Kimel, A. & Ackermann, M.https://doi.org/10.1016/j.vacuum.2023.112045Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(3). Article 033009. Renner, M., Fischer, J., Hajihoseini, H., Gudmundsson, J. T., Rudolph, M. & Lundin, D.https://doi.org/10.1116/6.0002555Charge exchange between He⁺ ions and solid targets: The dependence on target electronic structure revisited (2023)Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms, 538, 47-57. Sturm, J. M., Lokhorst, H. W., Zameshin, A. A. & Ackermann, M. D.https://doi.org/10.1016/j.nimb.2023.02.029Corrigendum to “In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers” [Appl. Surf. Sci. 258(1) (2011) 7–12] (2023)Applied surface science, 618. Article 155765. Chen, J., Louis, E., Harmsen, R., Tsarfati, T., Wormeester, H., van Kampen, M., van Schaik, W., van de Kruijs, R. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2022.155765Actinic Inspection of the EUV Optical Parameters of Lithographic Materials with Lab-Based Radiometry and Reflectometry (2023)In Optical and EUV Nanolithography XXXVI. Article 1249407 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12494). SPIE. Dorney, K. M., Kissoon, N. N., Holzmeier, F., Larsen, E. W., Singh, D. P., Arvind, S., Santra, S., Fallica, R., Makhotkin, I., Philipsen, V., De Gendt, S., Fleischmann, C., van der Heide, P. A. W. & Petersen, J. S.https://doi.org/10.1117/12.2658359Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range (2023)In Metrology, Inspection, and Process Control XXXVII. Article 124963B (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12496). SPIE. Abbasirad, N., Saadeh, Q., Ciesielski, R., Gottwald, A., Philippsen, V., Makhotkin, I., Sokolov, A., Kolbe, M., Scholze, F. & Soltwisch, V.https://doi.org/10.1117/12.2659369Si transfer and self-limiting chemisorption on Ru thin film surface in hydrogen radicals environment (2023)[Contribution to conference › Poster] SPIE Optics + Optoelectronics 2023. Gaffarov, I., Sturm, J. M., Vlooswijk, A., de Heij, P., Ackermann, M. D. & Makhotkin, I. A.https://spie.org/optics-optoelectronics/presentation/Si-transfer-and-self-limiting-chemisorption-on-Ru-thin-film/12578-20Laser-induced heating and surface modifications in Ru thin films (2023)[Contribution to conference › Poster] NWO Physics 2023. Akhmetov, F., Milov, I., Semin, S., Medvedev, N., Formisano, F., Zhakhovsky, V. V., Kimel, A., Makhotkin, I. A. & Ackermann, M.The world of chips: How do you make chips? (2023)[Non-textual form › Digital or Visual Products]. Ackermann, M., Nauta, B. & Schmitz, J.https://www.utwente.nl/nl/sg/programma/2023/3/386762/de-wereld-van-chips?code=4abdccddFrontiers, challenges, and solutions in modeling of swift heavy ion effects in materials (2023)Journal of Applied Physics, 133(10). Article 100701. Medvedev, N., Volkov, A. E., Rymzhanov, R., Akhmetov, F., Gorbunov, S., Voronkov, R. & Babaev, P.https://doi.org/10.1063/5.0128774Increasing soft x-ray reflectance of short-period W/Si multilayers using B₄C diffusion barriers (2023)Journal of Applied Physics, 133(2). Article 025302. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0130677Active Wafer Table Based on Piezoelectric Thin Films (2023)[Contribution to conference › Poster] NWO Physics 2023. Şimşek, E., Vries, S. E., Jansen, B., Steur, M., Bijkerk, F., Bayraktar, M. & Ackermann, M.Bottom Electrode Optimization for Piezoelectric Thin Film Based Active Wafer Tables (2023)[Contribution to conference › Poster] MESA+ Meeting 2023. Şimşek, E., Jansen, B., Bayraktar, M. & Ackermann, M.Étude de l'adhésion interfaciale dans les composites piézoélectriques à matrice fluoropolymère (2023)[Other contribution › Other contribution]. HAL. Bouad, V., Mohan, M. M. S., Fadel, A., Hamied, A., Marin, A., Tahon, J.-F., Addad, A., Ferri, A., Da Costa, A., Desfeux, R., Ponchel, F., Remiens, D., Lyskawa, J., Lefebvre, J.-M., Barrau, S. & Ladmiral, V.https://univ-artois.hal.science/hal-03956612/Guided electromagnetic discharge pulses driven by short intense laser pulses: Characterization and modeling (2023)Physics of plasmas, 30(1). Article 013105. Ehret, M., Bailly-Grandvaux, M., Korneev, P., Apiñaniz, J. I., Brabetz, C., Morace, A., Bradford, P., D'Humières, E., Schaumann, G., Bagnoud, V., Malko, S., Matveevskii, K., Roth, M., Volpe, L., Woolsey, N. C. & Santos, J. J.https://doi.org/10.1063/5.0124011Target ion and neutral spread in high power impulse magnetron sputtering (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(1), 1-11. Article 013002. Hajihoseini, H., Brenning, N., Rudolph, M., Raadu, M. A., Lundin, D., Fischer, J., Minea, T. M. & Gudmundsson, J. T.https://doi.org/10.1116/6.0002292

2022

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2019

Nanoscale Transition Metal Thin Films: Growth Characteristics and Scaling Law for Interlayer Formation (2019)ACS applied materials & interfaces, 11(49), 46311−46326. Chandrasekaran, A., van de Kruijs, R. W. E., Sturm, J. M., Zameshin, A. & Bijkerk, F.https://doi.org/10.1021/acsami.9b14414In-depth structural analysis of swift heavy ion irradiation in KY(WO4)2 for the fabrication of planar optical waveguides (2019)Optical materials express, 9(12), 4796-4810. Frentrop, R., Subbotin, I., Segerink, F., Keim, R., Tormo-marquez, V., Olivares, J., Shcherbachev, K., Yakunin, S., Makhotkin, I. & Garcia-Blanco, S. M.https://doi.org/10.1364/OME.9.004796Spectral characterization of an industrial EUV light source for nanolithography (2019)Journal of physics D: applied physics, 53(5). Article 055204. Torretti, F., Liu, F., Bayraktar, M., Scheers, J., Bouza, Z., Ubachs, W., Hoekstra, R. & Versolato, O.https://doi.org/10.1088/1361-6463/ab56d4In-situ stress analytics at sub-nanoscale thin film growth (2019)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Reinink, J.https://doi.org/10.3990/1.9789036549028Calibrated broadband spectroscopy using transmission gratings in the EUV to DUV wavelengths (2019)[Contribution to conference › Poster] EUV Source Workshop 2019. Bayraktar, M., Bastiaens, H. M. J. & Bijkerk, F.http://www.euvlitho.com/2019/S35.pdfSpectroscopic Measurements of Sn Laser-Produced Plasmas (2019)[Contribution to conference › Poster] EUV Source Workshop 2019. Behnke, L., Schupp, R., Bouza, Z., Scheers, J., Sheil, J., Torretti, F., Bayraktar, M., Shah, C., Crespo Lopez-Urrutia, J. R., Ubachs, W., Hoekstra, R. & Versolato, O. O.http://www.euvlitho.com/2019/S84.pdfNear-threshold sputter yields of ruthenium under argon and nitrogen ion bombardment (2019)Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms, 458, 169-173. Phadke, P., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1016/j.nimb.2018.10.001Multiscale modeling of damage processes in Ru thin films induced by femtosecond laser pulses (2019)[Contribution to conference › Poster] Applied Computational Sciences, ACOS 2019. Milov, I., Lipp, V., Ilnitsky, D., Medvedev, N., Migdal, K., Zhakhovsky, V., Khokhlov, V., Petrov, Y., Inogamov, N., Ziaja, B., Medvedev, V., Makhotkin, I. A., Louis, E. & Bijkerk, F.Oxidation of metal thin films by atomic oxygen: A low energy ion scattering study (2019)Journal of Applied Physics, 126(15). Article 155301. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.https://doi.org/10.1063/1.5115112Nanoscale piezoelectric surface modulation for adaptive extreme ultraviolet and soft x-ray optics (2019)Optics letters, 44(20), 5104-5107. Nematollahi, M., Lucke, P., Bayraktar, M., Yakshin, A., Rijnders, A. J. H. M. & Bijkerk, F.https://doi.org/10.1364/OL.44.005104Hydrogenation dynamics of Ru capped y thin films (2019)Journal of Applied Physics, 126(14). Article 145301. Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Makhotkin, I. A., Nikolaev, K., Yakunin, S. N., Lee, C. J. & Bijkerk, F.https://doi.org/10.1063/1.5094592Spectral investigation of Sn laser-produced plasmas in the extreme ultraviolet range (2019)[Contribution to conference › Poster] 43rd Annual Meeting NNV AMO 2019. Bouza, Z., Scheers, J., Sheil, J., Schupp, R., Torretti, F., Bayraktar, M., Bijkerk, F., Shah, C., Bekker, H., Crespo Lopez-Urrutia, J., Ubachs, W., Hoekstra, R. & Versolato, O.In-situ studies of silicide formation during growth of molybdenum-silicon interfaces (2019)Journal of Applied Physics, 126(13). Article 135304. Reinink, J., Zameshin, A., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.5092876Increasing the catalytic activity of molybdenum carbide for graphene growth via molybdenum layer properties (2019)[Contribution to conference › Poster] MESA+ Meeting 2019. Kizir, S., van den Beld, W., van de Kruijs, R. W. E., Benschop, J. P. H. & Bijkerk, F.Multiscale modeling of damage processes in Ru thin films induced by femtosecond laser pulses (2019)[Contribution to conference › Poster] MESA+ Meeting 2019. Milov, I., Lipp, V., Ilnitsky, D., Medvedev, N., Migdal, K., Zhakhovsky, V., Khokhlov, V., Petrov, Y., Inogamov, N., Ziaja, B., Medvedev, V., Makhotkin, I. A., Louis, E. & Bijkerk, F.Improving strength of LPCDV Si3N4 freestanding thin films by nanometer thick compressive adlayer (2019)[Contribution to conference › Poster] Nanomechanical testing in materials research and development VII 2019. Shafikov, A., Schurink, B., van de Kruijs, R. W. E. & Bijkerk, F.Characterization of nitrogen doped graphene bilayers synthesized by fast, low temperature microwave plasma-enhanced chemical vapour deposition (2019)Scientific reports, 9. Article 13715. Boas, C. R. S. V., Focassio, B., Marinho Jr., E., G. Larrude, D., Salvadori, M. C., Rocha Leão, C. & dos Santos, D. J.https://doi.org/10.1038/s41598-019-49900-9Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma (2019)Applied physics letters, 115(12). Article 124101. Schupp, R., Torretti, F., Meijer, R. A., Bayraktar, M., Sheil, J., Scheers, J., Kurilovich, D., Bayerle, A., Schafgans, A. A., Purvis, M., Eikema, K. S. E., Witte, S., Ubachs, W., Hoekstra, R. & Versolato, O. O.https://doi.org/10.1063/1.5117504Atomic H diffusion and C etching in multilayer graphene monitored using a y based optical sensor (2019)Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 37(5). Article 051801. Mund, B. K., Soroka, O., Sturm, J. M., van den Beld, W. T. E., Lee, C. J. & Bijkerk, F.https://doi.org/10.1116/1.5110213Low-energy ion polishing of Si in W/Si soft X-ray multilayer structures (2019)Journal of Applied Physics, 126(4). Article 045302. Medvedev, R. V., Nikolaev, K. V., Zameshin, A. A., Ijpes, D., Makhotkin, I. A., Yakunin, S. N., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1063/1.5097378Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography (2019)[Contribution to conference › Poster] XXXIst International Conference on Photonic, Electronic, and Atomic Collisions 2019. Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., Colgan, J., Crespo Lopez-Urrutia, J., Deuzeman, M. J., Hoekstra, R., Kurilovich, D., Poirier, L., Liu, B., Meijer, R., Neukirch, A., Rai, S., Ryabtsev, A., Witte, S., Scheers, J., … Ubachs, W.Efficient Generation of Extreme Ultraviolet Light From Nd: YAG-Driven Microdroplet-Tin Plasma (2019)Physical review applied, 12(1). Article 014010. Schupp, R., Torretti, F., Meijer, R., Bayraktar, M., Scheers, J., Kurilovich, D., Bayerle, A., Eikema, K. S. E., Witte, S., Ubachs, W., Hoekstra, R. & Versolato, O. O.https://doi.org/10.1103/PhysRevApplied.12.014010Multi-dimensional analysis of nano-scale periodic structures using EUV and X-RAY characterization: theoretical concepts and applications (2019)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Nikolaev, K.https://doi.org/10.3990/1.9789036547987Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films (2019)Journal of micro/nanolithography, MEMS, and MOEMS, 18(3). Article 033501. Sturm, J. M., Liu, F., Darlatt, E., Kolbe, M., Aarnink, A. A. I., Lee, C. J. & Bijkerk, F.https://doi.org/10.1117/1.JMM.18.3.033501Optical and structural characterization of orthorhombic LaLuO₃ using extreme ultraviolet reflectometry (2019)Thin solid films, 680, 94-101. Tryus, M., Nikolaev, K. V., Makhotkin, I. A., Schubert, J., Kibkalo, L., Danylyuk, S., Giglia, A., Nicolosi, P. & Juschkin, L.https://doi.org/10.1016/j.tsf.2019.04.037Increasing the catalytic activity of molybdenum carbide for graphene growth via molybdenum layer properties (2019)[Contribution to conference › Poster] 9th Largest European Conference & Exhibition in Graphene and 2D Materials, Graphene 2019. Kizir, S., van den Beld, W., van de Kruijs, R. W. E., Benschop, J. P. H. & Bijkerk, F.EUV full-band spectrum and DUV/EUV ratio dependency on source operating conditions (2019)[Contribution to conference › Poster] 20th ASML Technology Conference 2019. Liu, F., Bayraktar, M., Lim, J.-K., Bijkerk, F., Havermans, P. & Claes, B.Adaptive piezoelectric optics for XUV wavelengths (2019)[Contribution to conference › Poster] 2019 EUVL Workshop. Bayraktar, M., Lucke, P., Nematollahi, M., Yakshin, A., Louis, E., Rijnders, A. J. H. M. & Bijkerk, F.http://www.euvlitho.com/2019/P26.pdfMatrix effect in transition metal oxide formation: neutralization by O 2s levels (2019)[Contribution to conference › Poster] Low Energy Ion Scattering workshop 2019. Stilhano Vilas Boas, C. R., Zameshin, A., Sturm, J. M. & Bijkerk, F.Method, apparatus and computer program for measuring and processing a spectrum of an xuv light source from soft x-rays to infrared wavelengths (2019)[Patent › Patent]. European Patent Office. Bayraktar, M., Bijkerk, F., Bastiaens, H. M. J. & Bruineman, C.Room temperature isotope tracing in transition metal oxides probed by LEIS (2019)[Contribution to conference › Poster] E-MRS Spring Meeting 2019. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Determining the transmission of thin foil filters for soft X-ray free-electron laser radiation: an ablation imprint approach (2019)In Optics Damage and Materials Processing by EUV/X-ray Radiation VII (SPIE conference proceedings; Vol. 11035). Burian, T., Hájková, V., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Schreiber, S., Tiedtke, K., Toleikis, S., Keitel, B., Plönjes, E., Ruiz-Lopez, M. I., Kuhlmann, M., Wodzinski, A., Enkisch, H., Hermann, M., Strobel, S., Loch, R. A., Sobierajski, R., … Chalupský, J.https://doi.org/10.1117/12.2524718Spectral Unraveling of EUV Lithography Light Sources (2019)[Contribution to conference › Poster] Joint ICTP-IAEA School on Atomic and Molecular Spectroscopy in Plasmas. Bouza, Z., Scheers, J., Sheil, J., Schupp, R., Bayraktar, M., Bijkerk, F., Shah, C., Bekker, H., Ubachs, W., Hoekstra, R. & Versolato, O.Lithography for now and the future (2019)Solid-state electronics, 155, 20-26. van de Kerkhof, M. A., Benschop, J. P. H. & Banine, V. Y.https://doi.org/10.1016/j.sse.2019.03.006Surface structure determination by x-ray standing waves at a free-electron laser (2019)New journal of physics, 21(3). Article 033031. Mercurio, G., Makhotkin, I. A., Milov, I., Kim, Y., Zaluzhnyy, I., Dziarzhytski, S., Wenthaus, L., Vartanyants, I. & Wurth, W.https://doi.org/10.1088/1367-2630/aafa47Alternative EUV absorptive materials and novel architectures for EUV reticle in nm node technology scanner (2019)[Thesis › EngD Thesis]. University of Twente. Edrisi, A.Grazing-incidence small-angle X-ray scattering study of correlated lateral density fluctuations in W/Si multilayers (2019)Acta Crystallographica Section A: Foundations and Advances, 75, 342-351. Nikolaev, K. V., Yakunin, S. N., Makhotkin, I. A., de la Rie, J., Medvedev, R. V., Rogachev, A. V., Trunckin, I. N., Vasiliev, A. L., Hendrikx, C. P., Gateshki, M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1107/S2053273318017382Mirror, in particular for a microlithographic projection exposure system (2019)[Patent › Patent]. Wylie-Van Eerd, B., Bijkerk, F., Hild, K., Gruner, T., Schulte, S. & Weyler, S.Oxygen diffusion analysis in transition metal oxides by Low Energy Ion Scattering (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Angular and spectral bandwidth of XUV multilayers near spacer material absorption edges (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Zameshin, A.Comparison of hydrogen transport through thin metal, Si and oxide layers (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Soroka, O., Sturm, J. M. & Bijkerk, F.Comparison of Sputtering of Transition Metals by Reactive Ion Bombardment (2019)[Contribution to conference › Poster] Physics@Veldhoven 2019. Phadke, P., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.EUV Lithography at Threshold of High-Volume Manufacturing∗ (2019)In 2018 IEEE International Electron Devices Meeting, IEDM 2018 (pp. 11.6.1-11.6.4). Article 8614502 (Technical Digest - International Electron Devices Meeting, IEDM; Vol. 2018-December). IEEE. Yen, A., Meiling, H. & Benschop, J.https://doi.org/10.1109/IEDM.2018.8614502Angular and spectral bandwidth of Extreme UV multilayers near spacer material absorption edges (2019)Journal of nanoscience and nanotechnology, 19(1), 602-608. Zameshin, A., Yakshin, A., Chandrasekaran, A. & Bijkerk, F.https://doi.org/10.1166/jnn.2019.16478Grazing-Incidence La/B-Based Multilayer Mirrors for 6.x nm Wavelength (2019)Journal of nanoscience and nanotechnology, 19(1), 585-592. Kuznetsov, D., Yakshin, A., Sturm, J. M. & Bijkerk, F.https://doi.org/10.1166/jnn.2019.16476

2018

Extreme UV photon and hydrogen radical interaction with graphene and ruthenium surfaces (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Mund, B. K.https://doi.org/10.3990/1.9789036546577Probing atomic scale interface processes using X-rays and ions (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Zameshin, A.https://doi.org/10.3990/1.9789036546508Structure control of La/B multilayer systems by partial nitridation (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Kuznetsov, D. S.https://doi.org/10.3990/1.9789036546546Advancing X-ray standing wave data analysis (2018)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures, PXRNMS2018. Makhotkin, I. A., Yakunin, S. N., Hendrikx, C. P., Chandrasekaran, A., van de Kruijs, R. W. E. & Bijkerk, F.Monitoring EUV and DUV spectral emission ratios of a high power EUVL source (2018)[Contribution to conference › Poster] 2018 Source Workshop. Bayraktar, M., Liu, F., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.https://www.euvlitho.com/2018/S63.pdfDamage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold (2018)Journal of the Optical Society of America. B: Optical physics, 35(11), 2799-2805. Makhotkin, I. A., Milov, I., Chalupský, J., Tiedtke, K., Enkisch, H., de Vries, G., Scholze, F., Siewert, F., Sturm, J. M., Nikolaev, K. V., van de Kruijs, R. W. E., Smithers, M. A., Van Wolferen, H. A. G. M., Keim, E. G., Louis, E., Jacyna, I., Jurek, M., Klinger, D., Pelka, J. B., … Sobierajski, R.https://doi.org/10.1364/JOSAB.35.002799Formation of H₂O on a CO₂ dosed Ru(0 0 0 1) surface under Extreme Ultraviolet Light and H₂ (2018)Applied surface science, 456, 538-544. Mund, B. K., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2018.06.166Control of YH₃ formation and stability via hydrogen surface adsorption and desorption (2018)Applied surface science, 455, 70-74. Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2018.05.134Novel EUV mask absorber evaluation in support of next-generation EUV imaging (2018)In Photomask Technology 2018. Article 108100C (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10810). SPIE. Philipsen, V., Luong, K. V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Van De Kruijs, R. W. E., Heidarnia-Fathabad, Z., Scholze, F. & Laubis, C.https://doi.org/10.1117/12.2501799Study of ultrathin Pt/Co/Pt trilayers modified by nanosecond XUV pulses from laser-driven plasma source (2018)Journal of alloys and compounds, 763, 899-908. Jacyna, I., Klinger, D., Pełka, J. B., Minikayev, R., Dłużewski, P., Dynowska, E., Jakubowski, M., Klepka, M. T., Zymierska, D., Bartnik, A., Kurant, Z., Wolska, A., Wawro, A., Sveklo, I., Plaisier, J. R., Eichert, D., Brigidi, F., Makhotkin, I., Maziewski, A. & Sobierajski, R.https://doi.org/10.1016/j.jallcom.2018.05.314Modeling of XUV-induced damage in Ru films: The role of model parameters (2018)Journal of the Optical Society of America. B: Optical physics, 35(10), B43-B53. Milov, I., Lipp, V., Medvedev, N., Makhotkin, I. A., Louis, E. & Bijkerk, F.https://doi.org/10.1364/JOSAB.35.000B43Damage processes in thin Ru films induced by single and multiple ultra-short XUV pulses (2018)[Contribution to conference › Poster] 4th FELs OF EUROPE workshop on FEL Photon Diagnostics, Instrumentation, and Beamline Design, PhotonDiag 2018. Makhotkin, I. A., Milov, I., Sobierajski, R., Medvedev, N., Lipp, V., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnitsky, D., Migdal, K., Inogamov, N., Medvedev, V., Louis, E. & Bijkerk, F.Modelling of damage in Ru thin films induced by femtosecond XUV laser pulses (2018)[Contribution to conference › Poster] 4th FELs OF EUROPE workshop on FEL Photon Diagnostics, Instrumentation, and Beamline Design, PhotonDiag 2018. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., lipp, v., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnisky, D., Migdal, K., Inogamov, N., Medvedev , V. V., Louis, E. & Bijkerk, F.Specular reflection intensity modulated by grazing-incidence diffraction in a wide angular range (2018)Acta Crystallographica Section A: Foundations and Advances, 74(5), 545-552. Nikolaev, K. V., Makhotkin, I. A., Yakunin, S. N., Van De Kruijs, R. W. E., Chuev, M. A. & Bijkerk, F.https://doi.org/10.1107/S2053273318008963In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride (2018)Journal of applied crystallography, 51, 1013-1020. Krause, B., Kuznetsov, D. S., Yakshin, A. E., Ibrahimkutty, S., Baumbach, T. & Bijkerk, F.https://doi.org/10.1107/S1600576718007367Mechanism of single-shot damage of Ru thin films irradiated by femtosecond extreme UV free-electron laser (2018)Optics express, 26(15), 19665-19685. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., lipp, v., Chalupsky, J., Sturm, J. M., Tiedtke, K., de Vries, G., Störmer, M., Siewert, F., van de Kruijs, R., Louis, E., Jacyna, I., Jurek, M., Juha, L., Hájková, V., Vozda, V., Burian, T., … Bijkerk, F.https://doi.org/10.1364/OE.26.019665Metal diffusion and chemical processes of mono and bi-layer thin films (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Pachecka, M.https://doi.org/10.3990/1.9789036545686Isotopic labelling study of oxygen diffusion in oxide thin films by low energy ion scattering (2018)[Contribution to conference › Poster] 14th International Conference on Diffusion in Solids and Liquids 2018. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Source plasma emission spectrum under various operating conditions (2018)[Contribution to conference › Poster] 19th ASML Technology Conference 2018. Liu, F., Bayraktar, M., Goossens, T., Bijkerk, F., Quintana Ramirez, J. & Beenhakker, T.Sputter damage by low energy charged particle irradiation (2018)[Contribution to conference › Poster] E-MRS Spring Meeting 2018. Phadke, P., Sturm, M., van de Kruijs, R. & Bijkerk, F.Double matrix effect in Low Energy Ion Scattering from La surfaces (2018)Applied surface science, 440, 570-579. Zameshin, A. A., Yakshin, A. E., Sturm, J. M., Brongerma, H. H. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2018.01.174Self-contained in-vacuum in situ thin film stress measurement tool (2018)Review of scientific instruments, 89(5). Article 053904. Reinink, J., Van De Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.5021790Method, apparatus and computer program for measuring and processing a spectrum of an XUV light source from soft x-rays to infrared wavelengths (2018)[Patent › Patent]. Bijkerk, F., Bayraktar, M., Bastiaens, H. M. J. & Bruineman, C.https://nl.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=0&ND=3&adjacent=true&locale=nl_NL&FT=D&date=20180523&CC=NL&NR=2017729B1&KC=B1#Hydrogen induced blister formation in Mo/Si multilayer structures (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. van den Bos, R. A. J. M.https://doi.org/10.3990/1.9789036545143Plasma-assisted oxide removal from ruthenium-coated EUV optics (2018)Journal of Applied Physics, 123(15). Article 153301. Dolgov, A., Lee, C. J., Bijkerk, F., Abrikosov, A., Krivtsun, V. M., Lopaev, D., Yakushev, O. & van Kampen, M.https://doi.org/10.1063/1.5006771Plasma-assisted cleaning of extreme UV optics (2018)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Dolgov, A. A.https://doi.org/10.3990/1.9789036545068Electrofusion of single cells in picoliter droplets (2018)Scientific reports, 8. Article 3714. Schoeman, R. M., Van Den Beld, W. T. E., Kemna, E. W. M., Wolbers, F., Eijkel, J. C. T. & Van Den Berg, A.https://doi.org/10.1038/s41598-018-21993-8Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers (2018)Journal of physics D: applied physics, 51(11). Article 115302. van den Bos, R. A. J. M., Reinink, J., Lopaev, D. V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F.https://doi.org/10.1088/1361-6463/aaad86Broadband spectrometer development based on high-density free-standing transmission gratings (2018)[Contribution to conference › Poster] ASML Networking Event 2018. Bayraktar, M., Liu, F., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.Comprehensive studies of single-shot damage of Ru thin films induced by EUV FEL fs pulses (2018)[Contribution to conference › Poster] DESY Photon Science Users' Meeting 2018. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., Lipp, V., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnitsky, D., Migdal, K., Inogamov, N., Medvedev, V., Louis, E. & Bijkerk, F.Comprehensive studies of single-shot damage of Ru thin films induced by EUV FEL fs pulses (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Milov, I., Makhotkin, I. A., Sobierajski, R., Medvedev, N., Lipp, V., Ziaja, B., Khokhlov, V., Zhakhovsky, V., Petrov, Y., Shepelev, V., Ilnitsky, D., Migdal, K., Inogamov, N., Medvedev, V., Louis, E. & Bijkerk, F.Oxygen diffusion characterization in ultrathin films by low energy ion scattering (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Stilhano Vilas Boas, C. R., Sturm, J. M. & Bijkerk, F.Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light (2018)Applied surface science, 427(Part B), 1033-1040. Mund, B. K., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2017.09.098Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold (2018)Journal of synchrotron radiation, 25(1), 77-84. Makhotkin, I. A., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Störmer, M., Scholze, F., Siewert, F., van de Kruijs, R. W. E., Milov, I., Louis, E., Jacyna, I., Jurek, M., Klinger, D., Nittler, L., Syryanyy, Y., Juha, L., Hájková, V., Vozda, V., … Enkisch, H.https://doi.org/10.1107/S1600577517017362Formation of H2O on the surface of CO2 dosed Ru(0001) under Extreme Ultraviolet Light and H2 (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Mund, B. K., Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F.Hydrogen diffusion measurements using Y thin film monitoring (2018)[Contribution to conference › Poster] Physics@Veldhoven 2018. Soroka, O., Sturm, J. M., Lee, C. J. & Bijkerk, F.Tip-Induced Domain Growth, Dynamics and Conductivity in Tetragonal, Rhombohedral and Mixed Phase Epitaxial BFO Thin Films (2018)[Contribution to conference › Poster] MRS Spring Meeting 2018. Mohandas Moolayil, S. M. & Ramadurai, R.

2017

2016

EUV-mirror, optical system with EUV-mirror and associated operating method (2016)[Patent › Patent] (Submitted). Dinger, U., Bijkerk, F., Bayraktar, M. & Dier, O.https://worldwide.espacenet.com/publicationDetails/biblio?II=0&ND=3&adjacent=true&locale=en_EP&FT=D&date=20161229&CC=US&NR=2016379730A1&KC=A1#On-chip broadband supercontinuum generation at telecom wavelengths using silicon nitride waveguides (2016)[Contribution to conference › Poster] International MicroNanoConference, iMNC 2016. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J.In-vacuo growth studies of ZrO2 thin films (2016)[Contribution to conference › Poster] International Symposium on Reactive Sputter Deposition 2016 (RSD 2016). Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.Self-healing in B₁₂P₂ through mediated defect recombination (2016)Chemistry of materials, 28(22), 8415-8428. Huber, S. P., Gullikson, E., Frye, C. D., Edgar, J. H., van de Kruijs, R. W. E., Bijkerk, F. & Prendergast, D.https://doi.org/10.1021/acs.chemmater.6b04075In-house X-ray Standing Wave study of LaN/B multilayer mirrors (2016)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures workshop 2016. Hendrikx, C. P., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E. & Bijkerk, F.In-vacuo growth studies and thermal oxidation of ZrO2 thin films (2016)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures workshop 2016. Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.Nonequilibrium electron-phonon dynamics in ruthenium thin films exposed to ultra-short laser pulses (2016)[Contribution to conference › Poster] Physics of X-Ray and Neutron Multilayer Structures workshop 2016. Milov, I., Makhotkin, I. A., Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Scholze, F., Siewert, F., Störmer, M., van de Kruijs, R. W. E., Keim, R., van Wolferen, H. A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., … Bijkerk, F.Single-shot damage of Ru thin film induced by FEL fs pulses (2016)[Contribution to conference › Poster] LEELIS-II workshop 2016 (Low-energy electrons: Lithography, Imaging, and Soft Matter). Milov, I., Makhotkin, I. A., Enkisch, H., Sobierajski, R., Chalupsky, J., Tiedtke, K., de Vries, G., Scholze, F., Siewert, F., Störmer, M., van de Kruijs, R. W. E., Keim, E. G., van Wolferen, H. A. G. M., Yatsyna, I., Jurek, M., Juha, L., Hajkova, V., Vozda, V., Burian, T., … Bijkerk, F.Transmission grating spectrometer for broadband characterization of EUV sources (2016)[Contribution to conference › Poster] 2016 International Workshop on EUV and Soft X-Ray Sources. Bayraktar, M., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.Reflectivity tuning through controlled hydrogenation (2016)[Patent › Patent] (Submitted). Lee, C. J. & Bijkerk, F.Illuminating the structure of borides through X-ray absorption spectroscopy (2016)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Huber, S.https://doi.org/10.3990/1.9789036541824Compact Anomalous Transmission Filters for EUV Spectral Monitoring (2016)[Contribution to conference › Poster] 40th Annual Meeting NNV AMO Lunteren 2016. Barreaux, J. L. P., Kozhevnikov, I. V., Bayraktar, M., van de Kruijs, R. W. E., Bastiaens, H. M. J., Bijkerk, F. & Boller, K. J.Two-octave spanning on-chip supercontinuum generation at telecom wavelengths using silicon nitride waveguides (2016)[Contribution to conference › Poster] 40th Annual Meeting NNV AMO Lunteren 2016. Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J.EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror (2016)[Patent › Patent] (Submitted). Huang, Q., Louis, E., Bijkerk, F., de Boer, M. J. & von Blanckenhagen, G.https://worldwide.espacenet.com/publicationDetails/biblio?DB=EPODOC&II=0&ND=3&adjacent=true&locale=en_EP&FT=D&date=20160818&CC=WO&NR=2016128029A1&KC=A1#Electronegativity-dependent tin etching from thin films (2016)AIP advances, 6(7). Article 075222. Pachecka, M., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J. & Bijkerk, F.https://doi.org/10.1063/1.4960429Study of crystal surface with asymmetrical X-Ray diffraction (2016)[Contribution to conference › Poster] 14th International Conference on Surface X-ray and Neutron Scattering, SXNS 2016. Nikolaev, K., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E. & Bijkerk, F.Role of heat accumulation in the multi-shot damage of silicon irradiated with femtosecond XUV pulses at a 1 Mhz repetition rate (2016)Optics express, 24(14), 15468-15477. Sobierajski, R., Jacyna, I., Dluzewski, P., Klepka, M., Klinger, D., Pelka, J. B., Burian, T., Hajkova, V., Juha, L., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Faatz, B., Tiedtke, K., Toleikis, S., Enkisch, H., Hermann, M., Strobel, S., … Chalupsky, J.https://doi.org/10.1364/OE.24.015468Experimental Demonstration of Multilayer Anomalous-Transmission Filters for Narrow-Band Transmission at 13.5 nm (2016)[Contribution to conference › Poster] Nano City. Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J.Flying Circus Spectrometer for characterization of EUV light sources from UV to soft x-ray wavelengths (2016)[Contribution to conference › Poster] NanoCity 2016. Bayraktar, M., Bruineman, C., Vratzov, B., Bastiaens, H. M. J. & Bijkerk, F.Highly efficient blazed grating with multilayer coating for tender X-ray energies (2016)Optics express, 24(12), 13220-13230. Senf, F., Bijkerk, F., Eggenstein, F., Gwalt, G., Huang, Q., Kruijs, R., Kutz, O., Lemke, S., Louis, E., Mertin, M., Packe, I., Rudolph, I., Schäfers, F., Siewert, F., Sokolov, A., Sturm, J. M., Waberski, C., Wang, Z., Wolf, J., … Erko, A.https://doi.org/10.1364/OE.24.013220Ultra-broadband Supercontinuum Generation at Telecommunication Wavelengths in Dispersion Engineered Stoichiometric Si3N4 Waveguides (2016)In CLEO: Applications and Technology, CLEO AT 2016. Article AM3J.5 (Optics InfoBase Conference Papers). Optica Publishing Group (formerly OSA). Schepers, F., Garcia Porcel, M. A., Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Boller, K.-J. & Fallnich, C.https://doi.org/10.1364/CLEO_AT.2016.AM3J.5Research in the Industrial Focus Group XUV Optics (2016)[Other contribution › Other contribution]. Sturm, J. M. & Bijkerk, F.Numerical study of extreme-ultra-violet generated plasmas in hydrogen (2016)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Astakhov, D.https://doi.org/10.3990/1.9789036541114Spectroscopic ellipsometry for H diffusion (2016)[Contribution to conference › Poster] SPIE Photonics Europe 2016. Soroka, O., Jose, A. A., van de Kruijs, R. W. E., Bijkerk, F. & Lee, C. J.Influence of the surface oxide content of a boron capping layer on UV photodetector performance (2016)In 2015 9th International Conference on Sensing Technology, ICST 2015 (pp. 656-660). Article 7438479. IEEE. Mohammadi, V., Van De Kruijs, R. W. E., Rao, P. R., Sturm, J. M. & Nihtianov, S.https://doi.org/10.1109/ICSensT.2015.7438479Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage (2016)[Patent › Patent] (Submitted). Medvedev, V., Yakshin, A. & Bijkerk, F.http://www.freepatentsonline.com/DE102015204631.htmlKombinierter Reflektor und Filter für Licht underschiedlicher Wellenlängen (2016)[Patent › Patent] (Submitted). Medvedev, V., Yakshin, A., Krivtsun, V. M. & Bijkerk, F.Spectral control of high-harmonic generation via drive laser pulse shaping in a wide-diameter capillary (2016)Optics express, 24(2), 1604-1605. Goh, S. J., Reinink, J., Tao, Y., van der Slot, P. J. M., Bastiaens, H. M. J., Herek, J. L., Biedron, S. G., Milton, S. V. & Boller, K. J.https://doi.org/10.1364/OE.24.001604Wavefront correction at Angstom length scales (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Wylie- Van Eerd, B., Bayraktar, M., Chopra, A. R., Krijnen, B., Rijnders, A. J. H. M. & Bijkerk, F.Elastic modulus of extreme ultraviolet exposed single layer graphene (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F.Growth kinetics of Ru on Si, SiN and SiO2 studied by in-vacuo low energy ion scattering (LEIS) (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, J. M., Yakshin, A. & Bijkerk, F.Hydrogen induced blister formation in multilayer mirror structures (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Insitu stress measurement of thin film and multilayer growth (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Reinink, J., van de Kruijs, R. W. E. & Bijkerk, F.Low Energy Ion Scattering from La surfaces (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. Zameshin, A., Yakshin, A., Sturm, M., Brongersma, H. H. & Bijkerk, F.Ultra-wideband supercontinuum generation in Si3N4-based waveguides (2016)[Contribution to conference › Poster] Physics@FOM Veldhoven 2016. van der Slot, P. J. M., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., Mateman, R., van Rees, A., Lee, C. J., Fallnich, C. & Boller, K. J.A model for pressurized hydrogen induced thin film blisters (2016)Journal of Applied Physics, 120(23), 235304-. Article 235304. van den Bos, R. A. J. M., Reshetniak, V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F.https://doi.org/10.1063/1.4972221Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources (2016)NEVAC blad, 54(1), 14-19. Bayraktar, M., Bastiaens, H. M. J., Bruineman, C., Vratzov, B. & Bijkerk, F.https://nevac.nl/archief_pdf/pdf_62.pdfExploiting the P L2,3 absorption edge for optics: spectroscopic and structural characterization of cubic boron phosphide thin films (2016)Optical materials express, 6(12), 3946-3959. Article 12. Huber, S., Medvedev, V., Meyer-Ilse, J., Gullikson, E., Padavala, B., Edgar, J. H., Sturm, J. M., van de Kruijs, R. W. E., Prendergast, D. & Bijkerk, F.https://doi.org/10.1364/ome.6.003946Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen (2016)Journal of physics D: applied physics, 49(29). Article 295204. Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Koshelev, K. N., Lopaev, D. V., van der Horst, R. M., Beckers, J., Osorio, E. A. & Bijkerk, F.https://doi.org/10.1088/0022-3727/49/29/295204Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen (2016)Journal of physics D: applied physics, 49(14). Article 145203. van der Horst, R. M., Beckers, J., Osorio, E. A., Astakhov, D. I., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsum, V. M., Koshelev, K. N. & Lopaev, D. V.https://doi.org/10.1088/0022-3727/49/14/145203Extreme UV induced dissociation of amorphous solid water and crystalline water bilayers on Ru(0001) (2016)Surface science, 646, 101-107. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.susc.2015.09.009In depth study of molybdenum silicon compound formation at buried interfaces (2016)Journal of Applied Physics, 120(11). Article 115303. Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1063/1.4962541In vacuo growth studies of Ru thin films on Si, SiN, and SiO₂ by high-sensitivity low energy ion scattering (2016)Journal of Applied Physics, 120(6). Article 065303. Coloma Ribera, R., van de Kruijs, R. W. E., Sturm, J. M., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1063/1.4960577In-situ study of the YH2-YH3+x transition during hydrogenation by GI-DAFS and HAXPEX (2016)[Book/Report › Report]. Universiteit Twente, XUV Optics. Makhotkin, I. A., Soroka, O., Yakunin, S. N., Nikolaev, K., Hendrikx, S. P. & Lee, C. J.Numerical and experimental studies of the carbon etching in EUV-induced plasma (2016)[Working paper › Working paper]. ArXiv.org. Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Yakushev, O., Koshelev, K. N., Lopaev, D. V. & Bijkerk, F.https://doi.org/10.48550/arXiv.1507.02705Oxygen-stabilized triangular defects in hexagonal boron nitride (2016)Physical review B: Condensed matter and materials physics, 92(245310), 1-7. Article 245310. Huber, S., Gullikson, E., van de Kruijs, R. W. E., Bijkerk, F. & Prendergast, D.https://doi.org/10.1103/PhysRevB.92.245310Piezoelectric Based Adaptive Optics for Extreme Ultraviolet Wavelenghts (2016)[Contribution to conference › Abstract] SPIE Advanced Lithography 2015. Bayraktar, M., Chopra, A., Rijnders, A. J. H. M., Boller, K. J. & Bijkerk, F.Polarization recovery in lead zirconate titanate thin films deposited on nanosheets-buffered Si (001) (2016)AIP advances, 6(125209). Article 125209. Chopra, A., Bayraktar, M., Nijland, M., ten Elshof, J. E., Bijkerk, F. & Rijnders, A. J. H. M.https://doi.org/10.1063/1.4971373Recommended reading list of early publications on atomic layer deposition-outcome of the "virtual project on the history of ALD" (2016)Journal of vacuum science & technology A: vacuum, surfaces, and films, 35(1). Article 010801. Ahvenniemi, E., Akbashev, A. R., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D. C., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D. M., Hwang, C. S., Jen, S. H., Kallio, T., … Yurkevich, O.https://doi.org/10.1116/1.4971389Reconstruction of interfaces of periodic multilayers from X-ray reflectivity using a free-form approach (2016)Journal of applied crystallography, 49(4), 1300-1307. Zameshin, A., Makhotkin, I. A., Yakunin, S. N., van de Kruijs, R. W. E., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1107/S160057671601044XStructure of high-reflectance La/B-based multilayer mirrors with partial La nitridation (2016)AIP advances, 6. Article 115117. Kuznetsov, D., Yakshin, A., Sturm, J. M., van de Kruijs, R. W. E. & Bijkerk, F.https://doi.org/10.1063/1.4968175Versailles Project on Advanced Materials and Standards Interlaboratory Study on Measuring the Thickness and Chemistry of Nanoparticle Coatings Using XPS and LEIS (2016)The Journal of physical chemistry C, 120(42), 24070-24079. Belsey, N. A., Cant, D. J. H., Minelli, C., Araujo, J. R., Bock, B., Brüner, P., Castner, D. G., Ceccone, C., Counsell, J. D. P., Dietrich, P. M., Engelhard, M. H., Fearn, S., Galhardo, C. E., Kalbe, H., Kim, J. W., Lartundo-Rojas, L., Luftman, H. S., Nunney, T. S., Pseiner, J., … Shard, A. G.https://doi.org/10.1021/acs.jpcc.6b06713

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2013

25 kHz narrow spectral bandwidth of a wavelength tunable diode laser with a short waveguide-based external cavity (2013)Laser physics letters, 10(1), 015804-1-015804-8. Article 015804. Oldenbeuving, R., Klein, E. J., Offerhaus, H. L., Lee, C. J., Song, H. & Boller, K. J.https://doi.org/10.1088/1612-2011/10/1/015804Oxidation and metal contamination of EUV optics (2013)[Contribution to conference › Poster] M2I Conference 2013. Sturm, J. M., Liu, F., Pachecka, M., Lee, C. J. & Bijkerk, F.Short period La/B and LaN/B multilayer mirrors for ~6.8 nm wavelength (2013)Optics express, 21(24), 29894-29904. Makhotkin, I. A., Zoethout, E., van de Kruijs, R., Yakunin, S. N., Louis, E., Yakunin, A. M., Banine, V., Müllender, S. & Bijkerk, F.https://doi.org/10.1364/OE.21.029894Structural and reflective characteristics of multilayers for 6.x nm wavelength (2013)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Makhotkin, I. A.https://doi.org/10.3990/1.9789461919120Smart Multilayer Interactive Optics for Lithography at Extreme Ultraviolet Wavelengths (2013)[Contribution to conference › Poster] 4th Annual Meeting on Smart Optics Systems 2013. Bayraktar, M., Chopra, A., Wessels, W. A., van Goor, F. A., Rijnders, A. J. H. M. & Bijkerk, F.Waveguide-based External Cavity Semiconductor Laser Arrays (2013)[Contribution to conference › Poster] 4th Annual Meeting on Smart Optics Systems 2013. Oldenbeuving, R. M., Fan, Y., Song, H., Verhaegen, M. H. G., Agbana, T., Schitter, G., Klein, E. J., Lee, C. J., Offerhaus, H. L., van Voorst, P. D., van der Slot, P. J. M. & Boller, K.-J.MULTILAYER REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY DEVICE COMPRISING FIRST AND SECOND ADDITIONAL INTERMEDIATE LAYERS (2013)[Patent › Patent]. Yakshin, A. E., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I.https://patents.google.com/patent/JP2013219383A/Hydrogen particle and plasma interactions with heterogeneous structures (2013)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Kuznetsov, A.https://doi.org/10.3990/1.9789090278063Infrared antireflective filtering for 6.x nm multilayer Bragg reflectors (2013)[Contribution to conference › Poster] 2013 International Symposium on Extreme Ultraviolet Lithography. Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F.Transmission grating spectroscopy in the EUV and VUV (2013)[Contribution to conference › Poster] Sematech. Bastiaens, H. M. J., Bruineman, C., Vratzov, B., Louis, E. & Bijkerk, F.Engineering optical constants for broadband single layer antireflection coatings (2013)In Advances in X-Ray/EUV Optics and Components VIII. Article 884814 (Proceedings of SPIE; Vol. 8848). SPIE. Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. & Bijkerk, F.https://doi.org/10.1117/12.2026546Deposition and Oxidation Studies by Low-Energy Ion Scattering (LEIS) (2013)[Contribution to conference › Poster] MESA+ Meeting 2013. Coloma Ribera, R., Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.The Industrial Focus Group XUV Optics (2013)[Contribution to conference › Poster] MESA+ Meeting 2013. Sturm, J. M., van de Kruijs, R. W. E., Yakshin, A., Lee, C. J., Louis, E. & Bijkerk, F.Engineering optical constants for broadband single layer anti-reflection coatings (2013)[Contribution to conference › Poster] SPIE Optics + Photonics 2013. Huber, S., van de Kruijs, R. W. E., Yakshin, A., Zoethout, E. & Bijkerk, F.Optimization of LaN/B multilayer mirrors for 6.x nm wavelength (2013)In Advances in X-Ray/EUV Optics and Components VIII (pp. 1-5) (Proceedings of SPIE; Vol. 8848). SPIE. Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1117/12.2024199Suppression of long wavelength reflection from extreme-UV multilayer optics (2013)In Advances in X-Ray/EUV Optics and Components VIII (pp. 5-) (Proceedings of SPIE; Vol. 8848). SPIE. Huang, Q., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Medvedev, V., Louis, E. & Bijkerk, F.https://doi.org/10.1117/12.2023889Interlayer thermodynamics in nanoscale layered structures for reflection of EUV radiation (2013)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Bosgra, J.https://doi.org/10.3990/1.9789461917942Blister formation on multilayer mirrors due to the exposure of hydrogen (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F.Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001) (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Metal Hydride assited contamination on Ru/Si surfaces (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F.Multilayer development for the generation beyond EUV: 6.x nm (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Makhotkin, I. A., Zoethout, E., Nyabero, S. L., Medvedev, V., van de Kruijs, R. W. E., Louis, E., Yakunin, A. M., Banine, V., Muellender, S. & Bijkerk, F.Multilayer development for the generation beyond EUVL: 6.x nm (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Makhotkin, I. A., Zoethout, E., Nyabero, S. L., Medvedev, V., van de Kruijs, R. W. E., Yakshin, A., Louis, E., Yakunin, A. M., Banine, V., Muellender, S. & Bijkerk, F.Suppression of long wavelength reflection from Extreme UV multilayer optics (2013)[Contribution to conference › Poster] 14th ASML Technology Conference 2013. Huang, Q., Medvedev, V., van den Boogaard, T., van der Meer, R., van de Kruijs, R. W. E., Huber, S., Bastiaens, H. M. J., Bruineman, C., Vratsov, B., Louis, E. & Bijkerk, F.Reactions of ethanol on Ru(0001) (2013)Surface science, 612, 42-47. Sturm, J. M., Lee, C. J. & Bijkerk, F.https://doi.org/10.1016/j.susc.2013.02.009Multiple pulse damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs (2013)[Contribution to conference › Poster] SPIE ‘Damage to VUV, EUV, and X-ray Optics’ conference. Sobierajski, R., Loch, R. A., Louis, E., Klinger, D., Dluizewski, P., Klepka, M., Bijkerk, F., Burian, T., Chalupsky, J., Coppola, N., Dastjani Farahani, S., Galasso, G., Hajkova, V., Harmand, M., Krzywinski, J., Juha, L., Jurek, M., Möller, S., Nagasono, M., … Gaudin, J.Comparison of carbon cleaning mechanisms in EUV-induced and SWD plasmas in H2 and He environments (2013)[Contribution to conference › Poster] 40th IOP Annual Spring Conference on Plasma Physics 2013. Dolgov, A., Lopaev, D., Lee, C. J., Krivtsun, V. M., Yakushev, O. & Bijkerk, F.Comparison of H2 and He carbon cleaning mechanisms in extreme ultraviolet induced and surface wave discharge plasmas (2013)[Contribution to conference › Poster] 40th IOP Annual Spring Conference on Plasma Physics 2013. Dolgov, A., Lopaev, D., Lee, C. J., Krivtsun, V. M., Yakushev, O. & Bijkerk, F.Single-order lamellar multilayer gratings (2013)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. van der Meer, R.https://doi.org/10.3990/1.97890365352362D PIC modeling of the EUV induced hydrogen plasma and comparison to the observed carbon etching rate (2013)[Contribution to conference › Poster] Plasma and fusion physics. Astakhov, D., Goedheer, W. J., Lopaev, D., Ivanov, V., Krivtsun, V. M., Yakushev, O., Koshelev, K. & Bijkerk, F.Comparison of carbon cleaning mechanisms in EUV-induced and SWD plasmas in H2 and He environments (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Dolgov, A., Lopaev, D., Lee, C. J., Krivtsun, V. M., Koshelev, K., Yakushev, O. & Bijkerk, F.Extreme Ultraviolet (EUV) induced surface chemistry on Ru(0001) (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Liu, F., Sturm, J. M., Osorio, E., van Kampen, M., Lee, C. J. & Bijkerk, F.Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Medvedev, V., Yakshin, A., Louis, E., van de Kruijs, R. W. E., van den Boogaard, T., Krivtsun, V. M., Yakinun, A. M. & Bijkerk, F.Hydrogen uptake and distribution in a multi-layered systems and related effects (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Gleeson, M., Kuznetsov, A. & Bijkerk, F.Reflective Pyramid Wavefront Sensor for Extreme Ultraviolet Radiation (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Bayraktar, M., van Goor, F. A., Bijkerk, F. & Boller, K. J.Study of EUV induced defects on few-layer graphene (2013)[Contribution to conference › Poster] Physics@FOM Veldhoven 2013. Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.Enhanced thermal stability of extreme ultraviolet multilayers by balancing diffusion-induced structural changes (2013)Applied physics letters, 103(9), -. Article 093105. Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1063/1.4819851EUV optical elements with enhanced spectral selectivity for IR radiation (2013)In 2013 International Workshop in EUV and Soft X-ray Sources (pp. -). EUV Litho, Inc.. Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F.Experimental set-up and procedures for the investigation of XUV free electron laser interactions with solids (2013)Journal of instrumentation, 8(2), 1-14. Article P02010. Sobierajski, R., Jurek, M., Chalupsky, J., Krzywinski, J., Burian, T., Dastjani Farahani, S., Hajkova, V., Harmand, M., Juha, L., Klinger, D., Loch, R. A., Ozkan, C., Pelka, J. B., Sokolowski-Tinten, K., Sinn, H., Toleikis, S., Tiedtke, K., Tschentscher, T., Wabnitz, H. & Gaudin, J.https://doi.org/10.1088/1748-0221/8/02/P02010Extended theory of soft x-ray reflection for realistic lamellar multilayer gratings (2013)Optics express, 21(11), 13105-13117. van der Meer, R., Kozhevnikov, I. V., Bastiaens, H. M. J., Boller, K.-J. & Bijkerk, F.https://doi.org/10.1364/OE.21.013105Extreme Ultraviolet (EUV) induced defects on few-layer graphene (2013)Journal of Applied Physics, 114(4), -. Article 044313. Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.https://doi.org/10.1063/1.4817082Hydrogen-induced blistering of Mo/Si multilayers: Uptake and distribution (2013)Thin solid films, 545, 571-579. Kuznetsov, A. S., Gleeson, M. A. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2013.07.039Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors (2013)Optics express, 21(14), 16964-16974. Medvedev, V. V., van den Boogaard, A. J. R., van der Meer, R., Yakshin, A. E., Louis, E., Krivtsun, V. M. & Bijkerk, F.https://doi.org/10.1364/OE.21.016964Integrated CARS source based on seeded four-wave mixing in silicon nitride (2013)Optics express, 21(26), 32123-32129. Epping, J. P., Kues, M., van der Slot, P. J. M., Lee, C. J., Fallnich, C. & Boller, K.-J.https://doi.org/10.1364/OE.21.032123Interactions of C in layered Mo–Si structures (2013)Thin solid films, 542, 210-213. Bosgra, J., Veldhuizen, L. W., Zoethout, E., Verhoeven, J., Loch, R. A., Yakshin, A. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2013.06.082Interlayer growth in Mo/B4C multilayered structures upon thermal annealing (2013)Journal of Applied Physics, 113(14), 144310-1-144310-6. Article 144310. Nyabero, S. L., van de Kruijs, R. W. E., Yakshin, A., Zoethout, E., von Blanckenhage, G., Bosgra, J., Loch, R. A. & Bijkerk, F.https://doi.org/10.1063/1.4800910Ion effects in hydrogen-induced blistering of Mo/Si multilayers (2013)Journal of Applied Physics, 114(11). Article 113507. Kuznetsov, A., Gleeson, M. A. & Bijkerk, F.https://doi.org/10.1063/1.4821844Mo/Si multilayer-coated amplitude division beam splitters for XUV radiation sources (2013)Journal of synchrotron radiation, 20(2), 249-257. Sobierajski, R., Loch, R. A., van de Kruijs, R. W. E., Louis, E., von Blanckenhagen, G., Gullikson, E. M., Siewert, F., Wawro, A. & Bijkerk, F.https://doi.org/10.1107/S0909049512049990Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography (2013)Applied physics letters, 103(22), 221114-1-21114-4. Article 221114. Medvedev, V., van de Kruijs, R. W. E., Yakshin, A., Novikova, N. N., Krivtsun, V. M., Yakunin, A. M. & Bijkerk, F.https://doi.org/10.1063/1.4837335Nitrogen Scattering at Ru(0001) Surfaces (2013)Zeitschrift für physikalische Chemie, 227(11), 1511-1522. Zaharia, T., Ueta, H., Kleyn, A. W. & Gleeson, M. A.https://doi.org/10.1524/zpch.2013.0415Real-space insight in the nanometer scale roughness development during growth and ion beam polishing of molybdenum silicon multilayer ﬁlms (2013)Applied surface science, 285(Part B), 293-299. Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2013.08.053UHV-opstelling voor het bestuderen van de contaminatie van EUV-spiegels (2013)NEVAC blad, 51(1), 12-15. Sturm, J. M., Liu, F., Grecea, M. L., Gleeson, M. A., Lee, C. J. & Bijkerk, F.http://www.nevac.nl/418/nevac-blad.html

2012

Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors (2012)Applied Optics, 51(36), 8541-8548. Bosgra, J., Zoethout, E., Eerden, A. M. J., Verhoeven, J., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1364/AO.51.008541Ethanol decomposition on Ru(0001) (2012)[Contribution to conference › Poster] M2I Conference 2012. Sturm, J. M., Liu, F., Lee, C. J. & Bijkerk, F.Extreme ultraviolet induced oxidation of Ru(0001) (2012)[Contribution to conference › Poster] Netherlands MicroNanoConference 2012. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Multilayer optics for 6.7 nm wavelength (2012)[Contribution to conference › Poster] Netherlands MicroNanoConference 2012. Makhotkin, I. A., Zoethout, E., Louis, E. & Bijkerk, F.Physics and technology development of multilayer EUV reflective optics (2012)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Louis, E.https://doi.org/10.3990/1.9789090271637Multilayers for 6.8 nm Wavelength (2012)[Contribution to conference › Poster] 2012 International Workshop on EUV and Soft X-ray Sources. Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M., Banine, V., Muellender, S. & Bijkerk, F.Simultaneous analysis of Grazing Incidence X-Ray reflectivity and X-ray standing waves from periodic multilayer systems (2012)[Contribution to conference › Abstract] 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging, XTOP 2012, St. Petersburg, Russia. Yakunin, S. N., Makhotkin, I. A., Chuyev, M. A., Seregin, A. Y., Pashayev, E. M., Louis, E., van de Kruijs, R. W. E., Bijkerk, F. & Kovalchuk, M. V.Solid state diffusion in multilayered structures on a picometer lengthscale (2012)[Contribution to conference › Poster] The 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging. van de Kruijs, R. W. E., Bosgra, J., Bruijn, S., Yakshin, A. & Bijkerk, F.The X-ray Standing Waves analysis of short period La/B- based multilayers (2012)[Contribution to conference › Poster] 11th Biennial Conference on High Resolution X-Ray Diffraction and Imaging (X-Top 2012). Makhotkin, I. A., Yakunin, S. N., Chuev, M. A., Zoethout, E., Louis, E., van de Kruijs, R. W. E., Bijkerk, F. & Kovalchuk, M. V.Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth (2012)Thin solid films, 522, 228-232. Bosgra, J., Verhoeven, J., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2012.08.051Reactions of ethanol on Ru(0001) (2012)[Contribution to conference › Poster] 29th European Conference On Surface Science, ECOSS 2012. Sturm, J. M., Liu, F., Lee, C. J. & Bijkerk, F.Multilayer development for the generation beyond EUV: 6.x nm (2012)[Contribution to conference › Poster] 13th ASML Technology Conference 2012. Makhotkin, I. A., Zoethout, E., van de Kruijs, R. W. E., Louis, E., Yakunin, A. M., Muellender, S. & Bijkerk, F.Photo-induced chemistry of EUV multilayer mirror surfaces: experimental set up for in situ studeis (2012)[Contribution to conference › Poster] 13th ASML TC Conference. Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F.Reconstruction of the structure of La/B4C and LaN/B4C multilayer mirrors using X-ray Standing Waves (2012)[Contribution to conference › Poster] 14th European Conference on X-Ray Spectrometry, EXRS 2012. Makhotkin, I. A., Yakunin, S. N., Chuev, M., Zoethout, E., Louis, E., Novikov, D., Seregin, A. Y., Pashayev, I. M. & Bijkerk, F.Study of EUV induced defects on few-layer graphene (2012)[Contribution to conference › Poster] Graphene International Conference. Gao, A., Rizo, P. J., Zoethout, E., Scaccabarozzi, L., Lee, C. J., Banine, V. & Bijkerk, F.Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors (2012)Optics letters, 37(7), 1169-1171. Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, A. M., Koshelev, K. N. & Bijkerk, F.https://doi.org/10.1364/OL.37.001169Wavelength selection for multilayer coatings for the lithography generation beyond EUVL (2012)In Extreme Ultraviolet (EUV) Lithography III. Article 832213 (Proceedings of SPIE; Vol. 8322). SPIE. Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, S. N., Muellender, S. & Bijkerk, F.https://doi.org/10.1117/12.918036Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (EUV) or soft X-Ray (Soft X) and the infrared (IR) wavelength range (2012)[Patent › Patent] (Submitted). van Goor, F. A., Bijkerk, F., van den Boogaard, T. & van der Meer, R.Modelling of shot damage tresholds of multilayer optics for short-wavelength FELs (2012)[Contribution to conference › Poster] European XFEL User Meeting / HASYLAB User Meeting 2012. Loch, R. A., Sobierajski, R., Louis, E., Bosgra, J., van de Kruijs, R. W. E., Makhotkin, I. A., Zoethout, E. & Bijkerk, F.Extreme Ultraviolet Bragg mirrors with suppressed infrared reflectivity properties (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Medvedev, V., Yakshin, A., Louis, E., van de Kruijs, R. W. E., van den Boogaard, T., Krivtsun, V. M., Yakunin, A. M. & Bijkerk, F.Evolution of diffusion characteristics during nanoscopic Mo-Si interlayer growth (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Bosgra, J., Verhoeven, J., Yakshin, A. & Bijkerk, F.Nitrogen interface passivation of La/B layeren structures (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Makhotkin, I. A., Zoethout, E., Louis, E. & Bijkerk, F.Roughness development during growth and ion beam polishing of molybdenum silicon mulitlayer films (2012)[Contribution to conference › Poster] Physics@FOM Veldhoven 2012. Zoethout, E., Louis, E. & Bijkerk, F.Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection (2012)Optics letters, 37(2), 160-162. van den Boogaard, T., van Goor, F. A., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OL.37.000160Deposition and Etching of SiF2 on Si Surface: MD Study (2012)Physics procedia, 32, 885-890. Chen, X., Lu, X. D., He, P. N., Zhao, C. L., Sun, W., Zhang, P. & Gou, F.https://doi.org/10.1016/j.phpro.2012.03.652Electrical conductivity of nanostructured and C60-modified aluminum (2012)Applied physics A: Materials science and processing, 107(4), 863-869. Zameshin, A., Popov, M., Medvedev, V., Perfilov, S., Lomakin, R., Buga, S., Denisov, V., Kirichenko, A., Skryleva, E., Tatyanin, E., Aksenenkov, V. & Blank, V.https://doi.org/10.1007/s00339-012-6805-xEmploying a cylindrical single crystal in gas-surface dynamics (2012)The Journal of chemical physics, 136(11), -. Article 114201. Hahn, C., Shan, J., Liu, Y., van den Berg, O., Kleijn, A. W. & Juurlink, L. B. F.https://doi.org/10.1063/1.3692686Evidence of stable high-temperature Dx-CO intermediates on the Ru(0001) surface (2012)The Journal of chemical physics, 136, 114710-1-114710-6. Ueta, H., Groot, I. M. N., Kleijn, A. W. & Gleeson, M. A.https://doi.org/10.1063/1.3689553Influence of noble gas ion polishing species on extreme ultraviolet mirrors (2012)Journal of Applied Physics, 112(12), -. Article 123502. van den Boogaard, T., Zoethout, E., Makhotkin, I. A., Louis, E. & Bijkerk, F.https://doi.org/10.1063/1.4768915Investigating the interaction of x-ray free electron laser radiation with grating structure (2012)Optics letters, 37(15), 3033-3035. Gaudin, J., Ozkan, C., Chalupsky, J., Bajt, S., Burian, T., Vysin, L., Coppola, N., Dastjani Farahani, S., Chapman, H., Galasso, G., Hajkova, V., Harmand, M., Juha, L., Jurek, M., Loch, R. A., Möller, S., Nagasono, M., Störmer, M., Sinn, H., … Krzywinski, J.https://doi.org/10.1364/OL.37.003033Molecular Dynamics Simulations of Atomic H Etching SiC Surface (2012)Physics procedia, 32, 539-544. Sun, W., Liu, H., Lin, L., Zhao, C., Lu, X. & Gou, F.https://doi.org/10.1016/j.phpro.2012.03.598New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes (2012)Journal of micro/nanolithography, MEMS, and MOEMS, 11(2), 021103-1-021103-6. Koshelev, K. N., Krivtsun, V. M., Ivanov, V., Yakushev, O., Chekmarev, A., Koloshnikov, V., Snegirev, E. & Medvedev, V.https://doi.org/10.1117/1.JMM.11.2.021103RZLINE code modelling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation (2012)Journal of micro/nanolithography, MEMS, and MOEMS, 11(2), 021112-1-021112-6. Article 021112. Koshelev, K., Noivkov, V. G., Medvedev, V., Grushin, A. S. & Krivtsun, V. M.https://doi.org/10.1117/1.JMM.11.2.021112Spiegeling en Daad (2012)Magazine voor alumni en relaties, 2012(2), 32-33. Veen, W. & Bijkerk, F.http://www.utwente.nl/magazine/artikelen/spiegelingendaad.pdfSurface modifications by gas plasma control osteogenic differentiation of MC3T3-E1 cells (2012)Acta biomaterialia, 8(8), 2969-2977. Barradas, A. M. C., Lachmann, K., Hlawacek, G., Frielink, C., Truckenmüller, R. K., Boerman, O. C., van Gastel, R., Garritsen, H. S. P., Thomas, M., Moroni, L., van Blitterswijk, C. & de Boer, J.https://doi.org/10.1016/j.actbio.2012.04.021The noise-limited-resolution for stimulated emission depletion microscopy of diffusing particles (2012)Optics express, 20(12), 12793-12798. Lee, C. J. & Boller, K. J.https://doi.org/10.1364/OE.20.012793Thermoelectric properties of Bi0.5Sb1.5Te3/C60 nanocomposites (2012)Physical review B: Condensed matter and materials physics, 86(7), 075426-1-075426-8. Blank, V. D., Buga, S. G., Kulbachinskii, V. A., Kytin, V. G., Medvedev, V., Popov, Y. M., Stepanov, P. B. & Skok, V. F.https://doi.org/10.1103/PhysRevB.86.075426

2011

Ion-enhanced growth in planar and structured Mo/Si multilayers (2011)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. van den Boogaard, T.https://doi.org/10.3990/1.9789461911209Characterization of EUV induced contamination on multilayer optics (2011)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Chen, J.https://doi.org/10.3990/1.9789053354254Reflective optical element and method for the production thereof (2011)[Patent › Patent]. Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F.Diffusion phenomena in chemically stabilized multilayer structures (2011)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Bruijn, S.https://doi.org/10.3990/1.9789491211225Atomic quantum scattering and molecular diffraction (2011)Progress in surface science, 86(9-10), 163-168. Kleijn, A.https://doi.org/10.1016/j.progsurf.2011.09.001Chemical interaction of B4C diffusion barriers with Mo/Si layered nanostructures (2011)[Other contribution › Other contribution]. Nyabero, S. L.Damage threshold of amorphous carbon mirror for 177 eV FEL radiation (2011)Nuclear instruments & methods in physics research. Section A : Accelerators, spectrometers, detectors and associated equipment, 635(1, Suppl. 11), S39-S42. Dastjani Farahani, S., Chalupsky, J., Burian, T., Chapman, H., Gleeson, A. J., Hajkoya, V., Juha, L., Jurek, M., Klinger, D., Sinn, H., Sobierajski, R., Störmer, M., Tiedtke, K., Toleikis, S., Tschentscher, T., Wabnitz, H. & Gaudin, J.https://doi.org/10.1016/j.nima.2010.10.133Decay of crystalline order and equilibration during solid-to-plasma transition induced by 20-fs microfocused 92 eV Free Electron Laser pulses (2011)Physical review letters, 106(16), 1-4. Article 164801. Galtier, E., Rosmej, F. B., Dzelzainis, T., Riley, D., Khattak, F. Y., Heimann, P., Lee, R. W., Nelson, A. J., Vinko, S. M., Whitcher, T., Wark, J. S., Tschentscher, T., Toleikis, S., Faustlin, R. R., Sobierajski, R., Jurek, M., Juha, L., Chalupsky, J., Hajkova, V., … Nagler, B.https://doi.org/10.1103/PhysRevLett.106.164801In-situ study of the diffusion-reaction mechanism in nanometer scale layered films (2011)Applied surface science, 257(7), 2707-2711. Bruijn, S., van de Kruijs, R. W. E., Yakshin, A. E. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2010.10.049Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers (2011)[Other contribution › Other contribution]. Bosgra, J., Yakshin, A. & Bijkerk, F.Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance (2011)[Other contribution › Other contribution]. Bosgra, J., van de Kruijs, R. W. E., Zoethout, E., Verhoeven, J., Yakshin, A. & Bijkerk, F.The Energy Dependence of the Ratio of Step and Terrace Reactivity for H(2) Dissociation on Stepped Platinum (2011)Angewandte Chemie (international edition), 50(22), 5174-5177. Groot, I. M. N., Kleyn, A. W. & Juurlink, L. B. F.https://doi.org/10.1002/anie.201007093The Interaction of Hyperthermal Argon Atoms with CO-covered Ru(0001): Scattering and Collision-Induced Desorption (2011)[Other contribution › Other contribution]. Gleeson, M., Ueta, H. & Kleyn, A. W.The interaction of Hyperthermal Argon Atoms with CO-covered Ru(0001): Scattering and Collision-Induced Desorption (2011)The Journal of chemical physics, 134(6), 1-10. Article 064706. Ueta, H., Gleeson, M. & Kleijn, A.https://doi.org/10.1063/1.3545974The interaction of hyperthermal nitrogen with N-covered Ag(111) (2011)The Journal of chemical physics, 135(7), 1-10. Article 074702. Ueta, H., Gleeson, M. & Kleijn, A.https://doi.org/10.1063/1.3615520TOF-OFF: A method for determining focal positions in tightly focused free-electron laser experiments by measurement of ejected ions (2011)High energy density physics, 7(4), 336-342. Iwan, B., Andreasson, J., Andrejczuk, A., Abreu, E., Bergh, M., Caleman, C., Nelson, A. J., Bajt, S., Chalupsky, J., Chapman, H. N., Fäustlin, R. R., Hájková, V., Heimann, P. A., Hjörvarsson, B., Juha, L., Klinger, D., Krzywinski, J., Nagler, B., Pálsson, G. K., … Timneanu, N.https://doi.org/10.1016/j.hedp.2011.06.008

2010

Nanoscale diffusion, compound formation and phase transitions in Mo/Si multilayer structures (2010)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. de Rooij-Lohmann, V. I. T. A.https://doi.org/10.3990/1.9789053353141ZFEL: a compact, soft X-ray FEL in the Netherlands (2010)In Free Electron Laser (FEL) Conference 2010, Malmö, Sweden (pp. 163-164). Beijers, J. P. M., Brandenburg, S., Eikema, K. S. E., Hoekstra, S., Jungmann, K., Schlathölter, T., Timmermans, R. G. E., Willmann, R., Hoekstra, R., van Loosdrecht, P. H. M., Noheda, B., Palstra, T. T. M., Rudolf, P., Luiten, O. J. & Bijkerk, F.https://www.researchgate.net/publication/228368290_ZFEL_A_COMPACT_SOFT_X-RAY_FEL_IN_THE_NETHERLANDSElectronic Structure of an XUV Photogenerated Solid-Density Aluminum Plasma (2010)Physical review letters, 104(22). Article 225001. Vinko, S. M., Zastrau, U., Mazevet, S., Andreasson, J., Bajt, S., Burian, T., Chalupsky, J., Chapman, H. N., Cihelka, J., Doria, D., Döppner, T., Düsterer, S., Dzelzainis, T., Faustlin, R. R., Fortmann, C., Förster, E., Galtier, E. J., Glenzer, S. H., Göde, S., … Wark, J.https://doi.org/10.1103/PhysRevLett.104.225001High reflectance multilayers for EUVL HVM-projection optics (2010)In Extreme Ultraviolet (EUV) Lithography. Article 76362T (Proceedings of SPIE; Vol. 7636). SPIE. Louis, E., van Hattum, E. D., Alonso van der Westen, S., Sallé, P., Grootkarzijn, K., Zoethout, E., Bijkerk, F., von Blanckenhagen, G. & Müllender, S.https://doi.org/10.1117/12.846566Nitridated B4C/La multilayer optics for 6.7nm (2010)[Contribution to conference › Poster] 10th International Conference on the Physics of X-Ray Multilayer Structures (PXRMS). Tsarfati, T., Makhotkin, I., Louis, E., van de Kruijs, R. W. E. & Bijkerk, F.http://www.rxollc.com/pxrms/advance_program.htmlEUV-multilayers on grating-like topographies (2010)In Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States (Proceedings of SPIE; Vol. 7636). SPIE. van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I. & Bijkerk, F.https://doi.org/10.1117/12.846564Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing (2010)Nuclear instruments and methods in physics research. Section B : Beam interactions with materials and atoms, 268(6), 560-567. Dobrovolskiy, S., Yakshin, A., Tichelaar, F. D., Verhoeven, J., Louis, E. & Bijkerk, F.https://doi.org/10.1016/j.nimb.2009.12.022High-resolution, high-reflective operation of lamellar multilayer amplitude gratings: identification of the single-order regime (2010)Optics express, 18(15), 16234-16242. Kozhevnikov, I. V., van der Meer, R., Bastiaens, H. M. J., Boller, K.-J. & Bijkerk, F.https://doi.org/10.1364/OE.18.016234Hydrogen interaction with EUVL-relevant optical materials (2010)Journal of surface investigation. X-ray, synchrotron and neutron techniques, 4(4), 563-566. Kuznetsov, A., van de Kruijs, R. W. E., Gleeson, M. A., Schmid, K. & Bijkerk, F.https://doi.org/10.1134/S1027451010040026Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser (2010)Optics express, 18(23), 23933-23938. Hau-Riege, S. P., London, R. A., Graf, A., Baker, S. L., Soufli, R., Sobierajski, R., Burian, T., Chalupsky, J., Juha, L., Gaudin, J., Krzywinski, J., Moeller, S., Messerschmidt, M., Bozek, J. & Bostedt, C.https://doi.org/10.1364/OE.18.023933Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method (2010)[Patent › Patent] (Submitted). Bijkerk, F., van der Wiel, W. G., van der Meer, R. & Hegeman, P. E.Molecular dynamics simulation of the effects of the samples' temperature on Ar+ interactions with SiC surface (2010)Nuclear fusion and plasma physics = Hejubian yu Denglizitiwuli, 30(4), 317-322. Sun, W.-Z., Zhao, C. L., Liu, H.-m., Zhang, J.-y., Lu, X. D., Pan, Y.-d. & Gou, F.https://www.researchgate.net/publication/289206284_Molecular_dynamics_simulation_of_the_effects_of_the_samples'_temperature_on_Ar_interactions_with_SiC_surfaceNitridation and contrast of B4C/La interfaces and multilayer optics (2010)Thin solid films, 518(24), 7249-7252. Tsarfati, T., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1016/j.tsf.2010.04.088Oppervlaktechemie van nanolaagspiegels (2010)Nederlands tijdschrift voor natuurkunde, 76(8), 8-10. Tsarfati, T., Zoethout, E., van de Kruijs, R. W. E. & Bijkerk, F.https://www.ntvn.nl/archief/pdf/29/8/Properties of broadband depth-graded multilayer mirrors for EUV optical systems (2010)Optics express, 18(7), 6957-6971. Yakshin, A. E., Kozhevnikov, I. V., Zoethout, E., Louis, E. & Bijkerk, F.https://doi.org/10.1364/OE.18.006957Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby (2010)[Patent › Patent] (In preparation). Koshelev, K. N., Bijkerk, F., Zukavishvili, G. G., Korop, E. D. & Ivanov, V. V.Reflective element for EUV lithography device (2010)[Patent › Patent] (Submitted). Yakshin, A., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I.Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge (2010)[Patent › Patent] (Submitted). Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F.Roughness evolution of Si surfaces upon Ar ion erosion (2010)Applied surface science, 256(16), 5011-5014. de Rooij-Lohmann, V. I. T. A., Kozhevnikov, I. V., Peverini, L., Ziegler, E., Cuerno, R., Bijkerk, F. & Yakshin, A.https://doi.org/10.1016/j.apsusc.2010.03.045Secondary electron yield measurements of carbon covered multilayer optics (2010)Applied surface science, 257(2), 354-361. Chen, J., Louis, E., Verhoeven, J., Harmsen, R., Lee, C. J., Lubomska, M., van Kampen, M., van Schaik, W. & Bijkerk, F.https://doi.org/10.1016/j.apsusc.2010.06.075Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposures (2010)Optics express, 18(2), 700-712. Khorsand, A. R., Sobierajski, R., Louis, E., Bruijn, S., van de Kruijs, R. W. E., Krzywinski, J., Hau-Riege, S., Gleeson, A., Gullikson, E. M. & Bijkerk, F.https://doi.org/10.1364/OE.18.000700Spot size characterization of focused non-Gaussian beams (2010)Optics express, 18(26), 27836-27845. Chalupský, J., Krzywinski, J., Juha, L., Hájková, V., Cihelka, J., Burian, T., Vyšín, L., Gaudin, J., Gleeson, A. J., Jurek, M., Khorsand, A. R., Klinger, D., Wabnitz, H., Sobierajski, R., Störmer, M., Tiedtke, K. & Toleikis, S.https://doi.org/10.1364/OE.18.027836Surface morphology of Kr+-polished amorphous Si layers (2010)Journal of vacuum science & technology A: vacuum, surfaces, and films, 28(4), 552-558. van den Boogaard, T., Louis, E., Zoethout, E., Müllender, S. & Bijkerk, F.https://doi.org/10.1116/1.3428545

2009

Coating of silicon pore optics (2009)In Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV (Proceedings of the SPIE; Vol. 7437). SPIE. Jensen, C. P., Ackermann, M., Christensen, F. E., Collon, M. J. & Krumrey, M.https://doi.org/10.1117/12.826432Surface and interface dynamics in multilayered systems (2009)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Tsarfati, T.https://doi.org/10.3990/1.9789053351970

2008

Smoothing properties of single- and multilayer coatings, a method to smoothen substrates (2008)In Emerging Lithographic Technologies XII. Article 69210R (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6921). Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F. & Müllender, S.https://doi.org/10.1117/12.772479Reflective optical element for EUV lithography devices (2008)[Patent › Patent]. Yakshin, A. E., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I.https://patents.google.com/patent/TW200835943A/Stralingsbron voor elektromagnetische straling met een golflengte in het extreem ultraviolet (XUV) golflengtegebied. (2008)[Patent › Patent]. Frederik, B., Andrey, E. Y., Mohamed, R. A. & Aart, W. K.Spectral-purity-enhancing layer for multilayer mirrors (2008)Optics letters, 33(6), 560-562. van Herpen, M. M. J. W., van de Kruijs, R. W. E., Klunder, D. J. W., Louis, E., Yakshin, A. E., Alonso van der Westen, S., Bijkerk, F. & Banine, V.https://doi.org/10.1364/OL.33.000560

2007

Interface structure and interdiffusion in Mo/Si multilayers (2007)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Nedelcu, I.

2005

Interfaces in soft X-ray multilayer mirrors (2005)[Thesis › PhD Thesis - Research external, graduation UT]. University of Twente. Kessels, M. J. H.Optical element and method for its manufacture as well as lightography apparatus and method for manufacturing a semiconductor device (2005)[Patent › Patent]. Klein, R., Stietz, F., Wedowski, M., Louis, E., Bijkerk, F., Yakshin, A. E. & Klein Roman,stietz Frank,wedowski Marco,louis Eric,bijkerk Frederik, Y. A. E.

2003

Optical broad band element and process for its production (2003)[Patent › Patent]. Yakshin, E. A., Kojevnikov, I. V., Bijkerk, F. & Louis, E.https://patents.google.com/patent/AU2003226726A1/

2001

Integrating e-mail use in design & technology lessons (2001)In New media in Technology Education: Proceedings PATT-11 Conference, March 8-13 2001 (pp. 153-168). Eindhoven University of Technology. van der Meij, H., van Graft, M. & Boersma, K.