The XUV Optics group also uses external facilities, including an Extreme UV exposure facility at ASML, Veldhoven. This UHV set-up allows surface studies under controled conditions, resulting from exposing the mirror surfaces with the high-energy EUV photons. At-wavelength characterization of mirrors is done at the PTB soft X-ray metrology facilities (Berlin), while additional X-ray analysis is feasible at Malvern Panalytical.
