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EUV exposure facility at ASML

The XUV Optics group avails of a dedicated Extreme UV exposure facility at ASML, Veldhoven, to investigate the photo-chemistry of mirror surfaces. This UHV set-up allows surface studies under controled conditions, resulting from exposing the mirror surfaces with the high-energy EUV photons. At-wavelength characterization of mirrors is also done at the PTB soft X-ray metrology facilities (Berlin).