Interface science & Thin film technology

The possibility of studying the epitaxial growth of oxide materials during deposition at relatively high pressures, so-called high pressure RHEED, has significantly increased our ability to construct artificial layers and junctions.
With this technique it is possible to use building blocks of complex materials (complex means materials build of more than 2 elements) to design artificial materials. The idea is that these superstructures with atomically sharp interfaces will show new functionalities and can be applied in diverse device concepts like field effect transistors, (fast) switching devices, multiferroic magnetoelectrics and devices based on gigantic optical non-linearity effects.

In this research area, the following projects are now going on: