Full programme

Key-note presentations will be given by internationally recognised experts from both academia and industry. The topics range from fundamental principles to simulation/modelling of processes, plasma sources, and various applications. The programme is:

TUESDAY - 26TH OF MAY

Time

Title

Presenter

Affiliation

12:30

Registration with coffee/tea



13:30

Opening

Susana Cardoso de Freitas

13:45

Decoding low-temperature plasmas: Models, Limits, and Opportunities

Tiago Silva & Luís Alves

15:00

Coffee break



15:30

Title to be announced

Andrei Uvarov

16:15

Advanced Plasma Etching for Photonic Integrated Circuit (PIC): III–V Semiconductor Etching, PhC etching, ALE, and Si DRIE Technologies

Tomoyuki Nonaka

17:00

Closing of day 1



WEDNESDAY - 27TH OF MAY

Time

Title

Presenter

Affiliation

08:30

Start-up with coffee/tea



09:00

Cryogenic etching: principles and applications

Thomas Tillocher

10:30

Coffee break



11:00

Lecture on sub-micron etching

To be announced


11:45

Lecture on Bosch processing

To be announced


12:30

Lunch buffet



14:00

Atomic Layer Etching: Trends and Applications

Erwin Kessels

15:30

Coffee break



15:45

Flash presentations by sponsors



17:00

Closing of day 2



17:15

Network, poster, exhibition session with walking dinner



THURSDAY - 28TH OF MAY

Time

Title

Presenter

Affiliation

08:30

Start-up with coffee/tea



09:00

title to be announced

Georg Umlauf

10:30

Coffee break



11:00

Femtosecond laser an alternative mehod for dielectric materials etching

Jassem Safioui

12:30

Lunch buffet



13:30

MacEtch fundamentals: from wet to gas etching & Metal-assisted chemical etching: a new dry etch process for high aspect ratio silicon nanostructures

Lucia Romano

14:30

Hardware development new vapour MacEtch tool

To be announced

15:15

Coffee break



15:45

To be announced

Kyrill Koekenberg

16:30

Lecture on Plasma source design

To be announced


17:30

Closing of day 3



18:00

Bus trip to Belém in Lisbon & Dinner



FRIDAY - 29TH OF MAY

Time

Title

Presenter

 Affiliation

08:30

Start-up with coffee/tea



09:00

Lecture on etching of III-V materials

To be announced


10:30

Coffee break



11:00

Lecture on a new chemical for dry etching

To be announced


11:45

Lecture on sustainability

To be announced


12:30

Closing of the event



13:00

Lunch buffet



14:00

Optional: tour around the INESC-MN facility (registration for this can be done upon arrival at the registration desk)