Nanoimprint lithography for nanophotonics in silicon
C. M. Bruinink, M. Burresi, M. J. de Boer, F. B. Segerink, H. V. Jansen, E. Berenschot, D. N. Reinhoudt, J. Huskens, L. Kuipers, Nano Letters 2008, 8, 2872-2877
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
