DART

In this project, characterisation of thin film nanostructures for various applications (e.g. semiconductor materials, extreme ultraviolet (EUV) and X-ray mirrors, and coatings for photovoltaics) will be addressed. State of the art X-ray scattering techniques offer rapid, low cost and versatile capabilities to obtain essential information about thin films and their interface structure, but unlike microscopy, measured data must be analysed using model-based approaches to solve problems that presently cannot be automated.

UT researchers and Malvern Panalytical engineers will jointly develop and test fast physics-driven and human-independent minimisation algorithms capable of solving X-ray scattering analysis tasks without requiring expert guidance and capable of providing statistical information on reconstruction.