See Current PhD projects

Monitoring Si/Sn interaction with atomic hydrogen

Arnoud Onnink
In extreme-UV lithographic steppers, reflective optics areĀ  employed. These deteriorate over time under operating conditions as a result of surface contamination, leading to a significant decrease in output power of the system within an unacceptably short operational time. Therefore, frequent maintenance is necessary at present. In this project deposits of tin- and silicon-containing surface contaminations are studied, as well as techniques for their in-situ removal, aiming to optimize debris mitigation and cleaning strategies, thereby prolonging lifetime of the mirrors.