Dr. Balachander Krishnan





Balachander Krishnan

Carre 4.052B

+31 53 489 2933


Balachander Krishnan was born in Chennai, India on 12th October 1976. He received his Bachelors degree in Physics from Madras University and Masters degree in Materials science from Anna University, Chennai Respectively. After His Masters degree, his interest was more towards Semiconductor Materials & devices, which led him to take up his Ph.D. on Gallium Nitride (GaN) based Metal-Oxide-Semiconductor (MOS) High-Electron-Mobility-Transistors (HEMTs) in collaboration with Nagoya Institute of Technology, Japan (http://eng.nitech.ac.jp) & Crystal Growth Centre, Anna University, India (http://www.annauniv.edu/CGC/index.php).

His Work experience includes working at IMEC (http://www2.imec.be/imec_com/imec_com_homepage.php) (Interuniversity Microelectronics Centre) at Leuven, Belgium and Philips – Miplaza (http://www.miplaza.com/photonics.html) (Cedova Photonics), Eindhoven, The Netherlands. Since November 2009, he works as senior researcher in mesa plus institute of nanotechnology (http://www.mesaplus.utwente.nl/nanolab/) under the supervision of Prof. Dr. Jurriaan Huskens (http://mnf.tnw.utwente.nl/People/academic_staff/prof_j_huskens/) in Molecular Nanofabrication Group.

The main aim of his project is the Fabrication and Process development of Nanostructured Arrays for XUV optics and Surface Acoustic Wave (SAW) device application using Nanoimprint Lithography (NIL) (http://www.mesaplus.utwente.nl/nanolab/news/nanoimprint.doc/).

The process route that will be followed for the fabrication (Direct Patterning) of Lamellar Multilayer Amplitude Grating using NIL is described as follows :

Process steps for a nanoimprint resist

The process route that will be followed for the fabrication (Reverse Patterning – Lift off) of SAW device using SFIL-R is described as follows :-