The research project deals with the wavefront correction of XUV beams by active mirrors for use in the latest lithography systems. The basic idea of our concept is the deposition of an active layer underneath the Multilayer Bragg reflector. The active layer consists of a ferroelectric (piezoelectric) material. The University of Twente (IMS- and XUV-group) works in close collaboration with DIFFER, Solmates, Demcon and Carl Zeiss SMT on such a system. The particular goals of my research are to investigate the effective strain in the piezo material with respect to different boundary conditions and the manipulation of the electric field to establish a smooth surface for the Multilayer Bragg reflector.