MESA+ University of Twente
Inorganic Materials Science Group

Fabrication of Microstructures by PDMS grafting on Silicon Substrate and Reactive Ion Etching (RIE)

We are developing methods to fabricate patterned surfaces by soft lithography. Oxygen plasma treated PDMS stamps with line and pillar patterns were pressed against chemically modified silicon substrates to graft PDMS on the silicon. The adhesion between substrate and the stamp is strong enough for the mechanical fracture of the protruding PDMS features while detaching the stamp from the substrate. The grafted PDMS on silicon substrate used as an etch mask for a SF6 based Reactive Ion Etching (RIE) step to transfer the patterns to the silicon substrates.


Schematic diagram of PDMS grafting process on Silicon substrate


Left) PDMS lines grafted on Silicon substrate. Right) Pattern transferred to Silicon wafer

Several BSc and MSc assignments are possible within this project.

For more information, contact Andre ten Elshof .