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Etch rate of graphene with and without protective layer in plasma environments

Etch rate of graphene with and without protective layer in plasma environments

Contact: Wesley van den Beld, w.t.e.vandenbeld@utwente.nl

Introduction

Graphene is a mechanically strong and optically transparent material suited for fabricating freestanding conductive see-through membranes for numerous applications such as filtration, sensor and optic applications. The challenge of graphene is to make it more chemical resistive, especially during plasma treatments. This could increase the lifetime of the graphene for several applications such as EUV optics, see also: https://doi.org/10.3990/1.9789036546577 and https://doi.org/10.1117/12.2280560.

Master Assignment