We are proud to share that the XUV Optics group of the Nano Electronic Materials department (MESA+) at the University of Twente took part in SPIE Advanced Lithography + Patterning 2026 in San Jose, California.
The conference brought together experts from academia and industry to discuss the latest developments in optical and EUV lithography, patterning technologies, and future semiconductor manufacturing solutions.
🎤 Invited presentation
Marcelo Ackermann, presenting “High-reflectance short-period multilayers for next-generation lithography and beyond EUV optics”
🖼️ Poster presentation
Ertug Simsek, presenting “Active substrate support using piezoelectric thin films”
It was a valuable opportunity to showcase our research, engage with the international lithography community, and exchange ideas on emerging challenges and innovations in the field.
We thank the organizers and all participants for the stimulating discussions and inspiring atmosphere.
#SPIE #Lithography #EUV #Photonics #Semiconductor #Research #Microfabrication
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