A week full of science, collaboration, and inspiration!
The first week of November, the XUV group of the University of Twente had the great opportunity to go on a study tour, visiting several outstanding institutions and companies who are all key in EUV technology: TRUMPF in Ditzingen, ZEISS Group in Oberkochen, RWTH Aachen University and Laser Material Deposition at Fraunhofer ILT and imec in Leuven.
These visits offered much more than just a glimpse into cutting-edge research and innovation; they provided in-depth scientific discussions, valuable networking opportunities, and a deeper understanding of the research and development shaping the future of EUV lithography.
We would like to express our sincere gratitude to our hosts at TRUMPF Lars Jensen, Toga Ergin, Oliver Schlosser , ZEISS Semiconductor Manufacturing Technology, RWTH Aachen University and Laser Material Deposition at Fraunhofer ILT Sascha Brose, Prof. Dr. Carlo Holly, Ahmet Aksoy, and imec Kevin Dorney, Isabel Engel (She/her), Roberto Fallica, Philippe Leray, Paul van der Heide, Ph.D., Vitaly Krasnov Lynn Beullens, for their warm hospitality, their time, and the enthusiasm they shared with us. Thank you for the fruitful discussions, inspiring lab tours, and your openness to collaboration.
Having the chance to learn directly from world-leading research and industry partners made a deep impression on all of us. Such study tours truly broaden our horizons and spark new ideas and experiments to follow up on.
We’re looking forward to continuing our collaborations and building on the great momentum from this trip.
University of Twente | MESA+ | Nano Electronic Materials Dept | TRUMPF | ZEISS Group | RWTH Aachen University |Laser Material Deposition Fraunhofer ILT | imec
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