On December 24th, a most prominent and valued researcher, Marko Sturm, abruptly passed away: Marko died unexpectedly at the age of 47. The University of Twente has lost a colleague of exceptional human kindness and impressive scientific impact. The news is being received with great dismay.
Marko received his MSc graduation cum laude from Prof. Brongersma at the Eindhoven University of Technology in 2001. He obtained his PhD in High-K dielectric metal oxide studies from Prof. Poelsema at the University of Twente in 2006 and completed a two-year Postdoctoral study on methanol catalysis at Prof. Freund’s group at the Fritz Haber Institute in Berlin. Having moved to the FOM Institute DIFFER in Nieuwegein in 2008, Marko initially performed explorative research on materials for photo-conversion, as part of energy-related research by Prof. Kleyn at FOM. Challenged by its complexity, Marko then chose to set up new EUV photo-chemistry research in the group of Prof. Bijkerk at DIFFER. A definite highlight of Marko’s career is the construction of an EUV-dedicated surface analysis set-up within the research premises of ASML at Veldhoven. From 2014 onwards, Marko became a senior staff member of the XUV Optics group, which relocated to Twente in the same year, continuing as part of the MESA+ Institute and the Faculty of Science & Technology. The move was essentially facilitated by Marko’s substantial experience in these specific fields.
Marko Sturm was a highly respected researcher in the XUV Optics group at Twente, with strong and lasting ties to fellow researchers at the UT, ASML, Zeiss, VDL and TRUMPF. His work on surface analysis focused on the physics/chemical interactions of energetic photons with nanoscale surfaces and thin films. Notably, Marko was a successful pioneer of in-vacuo ion-scattering at very low ion-energies (LEIS). The results were at the roots of some advanced industrial applications and exemplify the rare valorisation of scientific findings into advanced lithography. His scientific articles are written with poetic beauty and show great analytical clarity. They will constitute the basis of the ongoing and future research in the XUV group, leaving the signature of Marko’s inspiring and high-quality research.
Beyond his scientific achievements, Marko was a wonderful person to work with - kind, highly knowledgeable, honest, and always willing to help. He guided students with care, supported colleagues with thoughtful advice, and was the go-to expert for challenging questions. His resourcefulness and dedication enriched our team in countless ways.
Marko also brought people together. He was always the first to volunteer at social events, creating cheerful moments and offering encouragement that lifted the spirits of those around him. His passing is a profound loss for all of us, both professionally and personally. His knowledge, his spirit, and his friendship will be deeply missed.
Our thoughts are with Marko’s family during this difficult time. He will be remembered with deep respect and gratitude.
On behalf of the Faculty Board S&T and the XUV Optics group.
More recent news
Mon 1 Dec 2025LEIS workshop on 5th of June 2026 in Dresden
Wed 3 Sep 2025Ilias Gaffarov and Marko Sturm present at the 38th European Conference on Surface Science
Thu 11 Apr 2024Registration LEIS workshop 2024 open
Thu 14 Mar 2024LEIS Workshop 2024
Mon 13 Nov 2023Marko Sturm presents as invited speaker on the 69th AVS


