PDEng on EUV reticle materials by Arash EdrisiOn March 4, PDEng candidate in the Industrial Focus Group XUV Optics Arash Edrisi will defend his thesis on EUV reticle materials. Arash has been exploring new materials combinations that would accommodate the need for high absorption of EUV radiation. These will be needed to achieve adequate optical contrast while at limited thickness in order to overcome shadowing effects in the EUV imaging scheme. Doping of materials and layered configurations were successfully applied to overcome materials artefacts such as crystallization.Read more
Low Energy Ion Scattering (LEIS) workshop 2019The Industrial Focus Group XUV Optics, part of the MESA+ Institute for Nanotechnology at the University of Twente, will host the 2019 edition of the European Low Energy Ion Scattering (LEIS) workshop. We invite researchers involved in surface analysis with LEIS and related techniques to submit an abstract for this workshop and also explicitly invite people who are interested in the application of LEIS to join this workshop and exchange ideas and experiences with knowledgeable scientists in the field.Read more
