Oxygen Plasma Cleaner For PDMS layers

Oxygen Plasma machine for PDMS layers

SPI plasmaprep II

CR 4.052

Responsibility of Stan Maassen


SPI Plasma-Prep™ II Plasma Etcher, Cleaner and Asher

Etch-clean-ash using dry plasma chemistry with barrel-reactor isotropic etching in a plasma etcher.

SPI Plasma-Prep II, a compact, "bench-top" sized plasma etcher, which can also serve as a plasma asher or even a plasma cleaner, uses dry plasma chemistry to reveal hidden detail for SEM and TEM analysis. This room-temperature plasma etching process works selectively, gently - and is well-suited for many applications in the EM lab, including work in: life sciences, materials science, electronics, AEM, failure analysis and general electron microscopy, including asbestos sample preparation*. Additionally, it is also widely used for the cleaning before use of microscope slides, both glass and quartz, and it is also used for the cleaning of transmission cells for a variety of different types of spectroscopic instrumentation

For more information: