Mini Symposium on ALD

19 March you can join the mini symposium on New Developments in Atomic Layer Deposition (ALD) for Industry, given by international experts

Date:            March 19, 2026
Time:           10:15 – 12:00 am
Location:     Technohal Auditorium, room TL 1.133 (Auditorium)

 For more information on each lecture click on the links below.

1.      “Area-Selective Deposition Processing for Integrated Circuits and Photonics in the A.I.-Era, and more” by prof. Rong Chen, Huazhong University of Science and Technology, Wuhan, China.

 2.      “Atomic Control at Commercial Scale: Advancements of ALD in HVM for Compound Semiconductor and Battery Applications” by dr. Matt Weimer and dr. Tyler Myers, Forge Nano, Thornton, CO 80241, USA