Energy & Process Technology

Energy & Process Technology

Publications Robbert van de Kruijs

T. G. S. M. Rijks and R. van de Kruijs, Magnetic Multilayers and Giant Magnetoresistance, Springer Series in Surface Sciences (Springer, Berlin), p. 96.

  • A polarized neutron reflectometry study on 60 x Fe31Co68V1/Ti75Zr25 multilayers.

R.W.E. van de Kruijs, H. Fredrikze, M.Th. Rekveldt, V.A. Ul’yanov, L.A. Akselrod, V.M. Pusenkov, N.K. Pleshanov, Physica B 267-268 (1999) 181-184

  • Polarization analysis of neutron reflectometry on non-magnetic structures deposited on a magnetic layer.

R.W.E. van de Kruijs, H. Fredrikze, M.Th. Rekveldt, Physica B 276-278 (2000) 642-643

  • Polarization analysis of neutron reflectometry on non-collinear magnetic media: polarized neutron reflectometryexperiments on a thin cobalt film.  

R.W.E. van de Kruijs, H. Fredrikze, M.Th. Rekveldt, A.A. van Well, Yu. V. Nikitenko, V.G. Syromyatnikov, Physica B 283 (2000) 189-193

  • Probing magnetic structures by neutron reflectometry: Off-specular scattering from interfaces and domains in FeCo/TiZr multilayers.

R.W.E. van de Kruijs, V.A. Ul’yanov, M.Th. Rekveldt, H. Fredrikze, N.K. Pleshanov, V.M. Pusenkov, V.G. Syromyatnikov, A.F. Schebetov, S. Langridge, Physica B 297 (2001) 180-184

  • Fast two-dimensional position-sensitive detection of neutrons in a time-of-flight reflectometer.

R.W.E. van de Kruijs, J. de Blois, Nuc. Ins. Meth. A 482 (2002) 347-354

  • Magnetic interlayer exchange coupling in epitexial Fe/Si/Fe(001) studied by Polarized Neutron Reflectometry.

R.W.E. van de Kruijs, M.Th. Rekveldt, H. Fredrikze, J.T. Kohlhepp, J.K. Ha, and W.J.M. de Jonge, Phys. Rev. B 65, 064440 (2002)

  • Calibration of a polarized neutron reflectometer

H. Fredrikze and R.W.E. van de Kruijs, Physica B 297 (2001) 143-147

  • Polarization analysis of off-specular neutron scattering from domains and rough interfaces in a FeCoV/TiZr multilayer

R.W.E. van de Kruijs, V.A. Ul'yanov, M.T. Rekveldt, H. Fredrikze, S. Langridge, N.K. Pleshanov, V.M. Pusenkov, A.F. Schebetov, V.G. Syromyatnikov, Appl Phys A 74 s1550 (2002)

  • Specular and Off-specular Reflection of Polarized Neutrons from Magnetic Thin Films and Multilayers

R.W.E. van de Kruijs, PhD Thesis, Delft University Press (2002)

  • Correlated magnetic domains and roughness at interfaces within a multilayer system

R.W.E. van de Kruijs, H. Fredrikze, M.Th. Rekveldt, V.A. Ul’yanov, N.K. Pleshanov, V.M. Pusenkov,   A.F. Schebetov, V.G. Syromyatnikov, S. Langridge, The Orange Book Dutch Neutron and Muon Science 2000-2003

  • Stress mitigation in Mo/Si multilayers for EUV lithography

Erwin Zoethout, G. Sipos, R. W. van de Kruijs, Andrey E. Yakshin, Eric Louis, Stefan Muellender, and Fred Bijkerk, Proc. SPIE 5037, 872 (2003), DOI:10.1117/12.490138

  • Progress in EUV optics lifetime expectations

B. Mertens, M. Weiss, H. Meiling, R. Klein, E. Louis, R. Kurt, M. Wedowski, H. Trenkler, B. Wolschrijn, R. Jansen, A. van de Runstraat, R. Moors, K. Spee, S. Plöger, and R. van de Kruijs, Microelectronic Engineering, Volumes 73-74, June 2004, Pages 16-22

  • Multilayer coatings for the EUVL process development tool

E. Louis, E. Zoethout, R. W. E. van de Kruijs, I. Nedelcu, A. E. Yakshin, S. A. van der Westen, T. Tsarfati, H. Enkisch, S. Muellender, and F. Bijkerk, Proc. SPIE, Vol. 5751, 1170 (2005)

  • Interface roughness in Mo/Si multilayers

Nedelcu, I., van de Kruijs, R.W.E., Yakshin, A.E., Tichelaar, F.D., Zoethout, E., Louis, E., Enkisch, H.

Mullender, S., Bijkerk, F., Thin Solid Films 515 (2006) 434-438

  • Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions

L.G.A.M. Alink, R.W.E. van de Kruijs, E. Louis, F. Bijkerk, and J. Verhoeven, Thin Solid Films Volume 510, Issues 1-2, 3 July 2006, Pages 26-31

  • Nano-size crystallites in Mo/Si multilayer optics

van de Kruijs, R.W.E., Zoethout, E., Yakshin, A.E., Nedelcu, I, Louis, E., Enkisch, H., Sipos, G., Mullender, S., Bijkerk, F., Thin Solid Films 515 (2006) 430-433

  • Multilayer optics with spectral purity layers for the EUV wavelength range

E. Louis, R. W .E. van de Kruijs, A. E. Yakshin, S. Alonso van der Westen, and F. Bijkerk, Proc. SPIE, Vol. 6151, 615139 (2006)

  • Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition

A. E. Yakshin, R. W. E. van de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, and F. Bijkerk H. Enkisch and S. Müllender, Proc. SPIE, Vol. 6517, 65170I (2007)

  • Temperature dependent nanocrystal formation in Mo/Si multilayers

Nedelcu, I.; van de Kruijs, R. W. E.; Yakshin, A. E.; Bijkerk, F.,  Physical Review B, vol. 76, Issue 24, id. 245404 (2007)

  • Spectral-purity-enhancing layer for multilayer mirrors

M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. Alonso van der Westen, F. Bijkerk, and V. Banine, Optics Letters, Vol. 33, Issue 6, pp. 560-562 (2008)

  • Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics

Nedelcu, I, van de Kruijs, R.W.E., Yakshin, A.E., von Blanckenhagen, G., Bijkerk, F., Opt. Eng.  47-6, Article number: 063801 (2008)

  • Thermally enhanced interdiffusion in Mo/Si multilayers

Nedelcu, I.; van de Kruijs, R. W. E.; Yakshin, A. E.; Bijkerk, F, Journal of Applied Physics, Volume 103, Issue 8, pp. 083549-083549-6 (2008)

  • Growth of silicon nitride films by bombarding amorphous silicon by N+ ions: MD simulation

F. Gou, M. A. Gleeson, A. W. Kleyn, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk

Accepted for publication

  • Multilayer system with protecting layer system and production method

Frederik Bijkerk, Eric Louis, Andrey E. Yakshin, Peter Cormelis Gorts, Sebastian Oestreich, Lambertus Gerhardus Albertus Michael Alink, Ir. Jan Verhoeven, Robbert Wilhelmus Elisabeth van de Kruijs

Patent US 2004/0121134 A1 (2004)

  • Reflektives Optisches Element für EUV-lithografievorrichtungen

Yakshin, A.E., van de Kruijs, R.W.E., Bijkerk, F., Louis, E., Nedelcu, I.

Patent US 60/888,144, US, EU, European Patent Office, Priority date 05/02/2007

  • A method for operating an EUV lithography apparatus, and an EUV lithography apparatus

Yakshin, A.E. van de Kruijs, R.W.E. Bijkerk, F. Louis, E.,

Patent 07000471.8-2222, European Patent Office, Priority date 10/01/2007

  • Reduction of diffusion at Mo/Si interfaces by boride barriers and boron passivation

R.W.E. van de Kruijs, S. Bruijn, A.E. Yakshin, F. Bijkerk, E. Louis, T. Tsarfati

Patent application (2008)