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- ▪ Etching
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- ▪ Lithography
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  - ▪ Maskaligner EVG 620
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  - ▪ Nano Imprint tool Imprio 55
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- ▪ Lithography benches
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  - ▪ HMDS vaporizing own design
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  - ▪ HMDS vaporizing own design
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  - ▪ Resist spinner negative resist SSE-Delta 20
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  - ▪ SU 8 coater en bake Interflow/SSE Delta 20
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- ▪ Maskfabrication
  - ▪ Mask developer BLE-Delta 36
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- ▪ Characterization Equipment
  - ▪ 4 point measurement probe own design
  - ▪ AFM Veeco
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- ▪ Sputtering / Evaporation
  - ▪ Aluminium sputtercoater Oxford 400
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  - ▪ Evaporator Balzers BAK 600
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  - ▪ Gold sputtercoater SEM Emitech
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  - ▪ HTS sputtercluster
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  - ▪ MgB2 own design
  - ▪ Nordiko - LTS
  - ▪ Perkin Elmer
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  - ▪ Sputter exp. Bi
  - ▪ Sputtercoater AJA
  - ▪ Sputtercoater own design
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  - ▪ Tantaal evaporator own design
  - ▪ Zinc Oxide sputtercoater Balzers (Lionix)
- ▪ Thermal processes
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- ▪ Wetbenches
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  - ▪ HF vapour Idonus
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  - ▪ Ultrasonic baths organic solvents Branson
- ▪ Back end processing
  - ▪ Anodic bonder EVG
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<< Mesaplus Home News Events Expertise List of equipment Using the NanoLab facilities at MESA+ Courses The new Nanolab Intranet Cleanroom Organization Sitemap Search	Sitemap ▪ News ▪ 1 feb 2012 - New Atomic Layer Deposiition cluster tool ▪ 23 jan 2012 - New SEM ▪ 5 november 2010 - OPENING LAB MESA+, KNIGHTHOOD DAVE BLANK ▪ 5 november 2010 - VIBRANTLY RED AND VIBRATION-FREE ▪ April 2010 - Stilste onderzoeksvloer voor NanoLab ▪ 6 June 2009 - Kabinet investeert 15 miljoen euro in nationale faciliteit voor nanotechnologie ▪ 5 June 2009 - Zes miljoen voor BioNanoLab ▪ Aandacht voor het nieuwe NanoLab in uitzending RTV Oost ▪ Tarief omlaag, betere benutting ▪ Nano Imprint Lithography available at MESA+ NanoLab ▪ Provincie Overijssel steekt miljoen in NanoLab ▪ Uitmuntende elektrotechniek ▪ Publications ▪ Events ▪ Technical colloquia ▪ Abstract ▪ Technical colloquia ▪ Technical colloquia ▪ Expertise ▪ List of equipment ▪ Special equipment ▪ Cluster ovenstack Tempress ▪ Clustersystem (3 reactors) own design ▪ CoMAT IMS ▪ Ion implanter IBS ▪ Laser Interference lithography own design ▪ Silox reactor own design ▪ Materials characterization ▪ FIB ▪ Philips XRD pananalitical pw1830 IMS ▪ Philips XRD X-pert IMS ▪ SEM JEOL ▪ XRD Brucker IMS ▪ XPS - PHI Quantera ▪ HR-SEM - Zeiss 1550 ▪ Analytical TEM FEI Instruments ▪ Dual-FIB FEI Instruments ▪ XRD Philips (Diffractometer) ▪ Chemical Vapour Deposition ▪ LPCVD Tempress (F-stack) ▪ LPCVD Tempress (G-stack) ▪ PECVD Lionix ▪ PECVD Oxford 133 ▪ PECVD Oxford 80 ▪ Dedicated equipment ▪ Cu-plaiting bath own design ▪ Fiber pull installation own design ▪ Glove box Braun ▪ N2 store bench own design ▪ Ozon reactor UV-stokvis ▪ Ozon reactor UVP ▪ Polymer mixer Huk ▪ Scriber own design ▪ Standard press Carver ▪ Vacuum oven Heraeus ▪ Etching ▪ DRIE Adixen DE ▪ DRIE Adixen SE ▪ DRIE Oxford 100 (Catharina) ▪ DRIE PlasmaTherm ICP etser 770 ▪ Ion Beam Etcher ▪ O2 Plasma etser Tepla 300 ▪ O2 plasma etser Tepla 300E ▪ RIBE Oxford ▪ RIE Electrotech (Lionix) ▪ RIE Elektrotech ▪ RIE etser own design ▪ RIE Oxford 100 chlorine etser ▪ RIE PlasmaTherm etser 790 ▪ Lithography ▪ Bake oven Heraeus ▪ Bake oven Heraeus ▪ Convac resist track ▪ E-beam lithography SSE-ST 22+ ▪ Filmetrics ▪ Hot embossing Obducat ▪ InfraRed bake oven ▪ Maskaligner EVG 620 ▪ Maskaligner EVG 620 with robot ▪ Maskaligner Suss ▪ Nano Imprint tool Imprio 55 ▪ Resist coater SSE-Maximus 804 ▪ UV cross linker Spectolink ▪ Lithography benches ▪ E-beam lithography FEI ▪ E-beam resist bench Arias ▪ HMDS vaporizing own design ▪ HMDS vaporizing own design ▪ HMDS vaporizing own design ▪ Nano Imprint Resist spinner SSE ▪ Polymer spinner Gyrset RC5 ▪ Positive Resist developer ▪ Resist bake ▪ Resist bake oven Binder ▪ Resist bake oven Hereaus ▪ Resist spinner negative resist SSE-Delta 20 ▪ Resist spinner positive resist SSE-Delta 10 ▪ SU 8 coater en bake Interflow/SSE Delta 20 ▪ SU 8 spinning bench Interflow ▪ Maskfabrication ▪ Mask developer BLE-Delta 36 ▪ Mask generator LBPG Heidelberg DWL200 ▪ Mask cleaning Tempress ▪ Mask developing bench GRAS ▪ Gyrset RC 8 ▪ Characterization Equipment ▪ 4 point measurement probe own design ▪ AFM Veeco ▪ AFM-STM ▪ Bond inspection camera ▪ Contact angle measurement Dataphysics OCA-2 ▪ Curve tracer prober tektronix ▪ Dust inspection lamp ▪ Ellipsometer Plasmos ▪ Ellipsometer Woollam ▪ Insitu AFM ▪ Jeol SEM Prober IMS ▪ Layer thickness measurement ▪ Micro balans Satorius ▪ Parameter analyser HP ▪ Profile measurement Dektak 3 ST ▪ Profile measurement Dektak 8 ▪ SEM JEOL ▪ SEM JEOL Lionix ▪ Wafer thickness measurement own design ▪ Microscopes ▪ Microscope ▪ Microscope Fluorescence Nikon ▪ Microscope Jenatech ▪ Microscope Leitz ▪ Microscope Leitz ▪ Microscope Olympus ▪ Microscope Olympus 2x ▪ Microscope with SIS-system Olympus ▪ Microscope with SIS-system Olympus ▪ Microscope with SIS-system Olympus ▪ Stereo microscope Olympus ▪ Sputtering / Evaporation ▪ Aluminium sputtercoater Oxford 400 ▪ Carbon Evaporator Polaron ▪ Evaporator Balzers BAK 600 ▪ Evaporator DCA ▪ Gold sputtercoater SEM Emitech ▪ Gold sputtercoater SEM Polaron ▪ HTS sputtercluster ▪ Laser depositie cluster ▪ MgB2 own design ▪ Nordiko - LTS ▪ Perkin Elmer ▪ Perkin Elmer SiO2 ▪ PLD LTRHEED MASIF ▪ Sputter exp. Bi ▪ Sputtercoater AJA ▪ Sputtercoater own design ▪ Sputtercoater TCO ▪ Sputtercoater VSW ▪ Tantaal evaporator own design ▪ Zinc Oxide sputtercoater Balzers (Lionix) ▪ Thermal processes ▪ Tempress (A-stack) ▪ Tempress (B-stack) ▪ Tempress (C-stack) ▪ Tempress (D-stack) ▪ Tempress (E-stack) ▪ Wetbenches ▪ Cleaning bench ▪ Cleaning bench Piranha Interflow ▪ Cleaning Ozon GRAS ▪ Cleaning-etching bench GRAS ▪ Cleaning-etching bench preparationroom Interflow ▪ Cleaning/etching bench Interflow ▪ Etching Pyrex Interflow ▪ HF vapour Idonus ▪ KOH etching (3 reactors) own design ▪ RCA cleaning Arias ▪ Rinser dryer Semitool ▪ Rinser dryer Semitool ▪ Ultrasonic baths organic solvents Branson ▪ Back end processing ▪ Anodic bonder EVG ▪ CMP Cleaning station ▪ CMP Mixer ▪ CMP wafer cleaning bench ▪ Dicing saw Disco ▪ Dicing saw Loadpoint ▪ Wire-bonder ▪ Wire-bonder Westbond ▪ Wire-bonder Westbond ▪ Using the NanoLab facilities at MESA+ ▪ Courses ▪ Chemistry-safety course ▪ MTE workshop ▪ Vacuum Course ▪ The new Nanolab ▪ News ▪ Nanolab uitdaging voor aannemer en installateur ▪ Bouw Carré en NanoLab officieel gestart ▪ Aandacht voor het nieuwe NanoLab in uitzending RTV Oost ▪ Forse investering infrastructuur nanotechnologie ▪ NanoLab in UT-Nieuws ▪ Provincie Overijssel steekt miljoen in NanoLab ▪ Groeispurt van nano-industrie in Twente ▪ Images NanoLab ▪ Perspective NanoLab from the south ▪ Perspective NanoLab from the west ▪ Perspective from the southern of Carré and the northern of Nanolab: Nanohof ▪ Floor map ▪ NanoLab ▪ Nanolab - Cleanroom ▪ Nanolab - LT AML CMA lab ▪ Nanolab - VSF CMA SMI lab ▪ Cleanroom ▪ Cleanroom A-section ▪ Cleanroom B-section ▪ Cleanroom C-section ▪ Cleanroom D-section ▪ Contact ▪ Contactdata ▪ Intranet Cleanroom ▪ Contact ▪ Organization