Henri Jansens Black Silicon X second in JMM most cited

Henri Jansens Black Silicon Method X second in JMM most cited papers.

The tenth issue of the famous publication series of Henri Jansen on DRIE has reached the second place in the JMM most cited ranking over the last two years. Published only one year ago, it now has already been cited over 14 times.

In this publication an intensive study has been performed to understand and tune deep reactive ion etch (DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and mask etch selectivity (in order of priority) using state-of-the-art dual power source DRIE equipment.

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Home News Members Research Education Publications Vacancies Intranet (members only) Sitemap Search	Henri Jansens Black Silicon X second in JMM most cited Henri Jansens Black Silicon X second in JMM most cited Henri Jansens Black Silicon Method X second in JMM most cited papers. The tenth issue of the famous publication series of Henri Jansen on DRIE has reached the second place in the JMM most cited ranking over the last two years. Published only one year ago, it now has already been cited over 14 times. In this publication an intensive study has been performed to understand and tune deep reactive ion etch (DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and mask etch selectivity (in order of priority) using state-of-the-art dual power source DRIE equipment.